Name

HOMMA, Takayuki

Official Title

Professor

Affiliation

(School of Advanced Science and Engineering)

Contact Information

Mail Address

Mail Address
t.homma@waseda.jp

URL

Web Page URL

http://www.sc.appchem.waseda.ac.jp/

Grant-in-aids for Scientific Researcher Number
80238823

Sub-affiliation

Sub-affiliation

Faculty of Science and Engineering(Graduate School of Advanced Science and Engineering)

Affiliated Institutes

非線形偏微分方程式研究所

研究所員 2010-2014

理工学総合研究センター

兼任研究員 1989-2006

グリーンデバイス研究所

研究所員 2010-2013

実践的ナノ化学G

研究所員 2007-2011

グリーンデバイス研究所

研究所員 2014-2014

ナノプロセス研究所

研究所員 2007-2014

ナノテクノロジー研究所

研究所員 2007-2014

ライフサポートイノベーション研究所

研究所員 2014-2014

ナノテクノロジー研究所

研究所員 2015-

ナノプロセス研究所

研究所員 2015-

各務記念材料技術研究所

兼任研究員 2017-2018

アンビエントロニクス研究所

研究所員 2018-

理工学術院総合研究所(理工学研究所)

兼任研究員 2006-2018

理工学術院総合研究所(理工学研究所)

兼任研究員 2018-

ライフサポートイノベーション研究所

研究所員 2015-2019

ライフサポートイノベーション研究所

研究所員 2019-

グリーンデバイス研究所

研究所員 2015-2018

Educational background・Degree

Educational background

-1992 Waseda University Graduate School, Division of Science and Engineering

Degree

Ph. D Coursework

Academic Society Joined

Chemical Socoety of Japan Vice Chair, Council of Chemical Education

The Electrochemical Society of Japan Exective Board Member

Surface Finishing Society of Japan Exective Board Member

Japan Institute of Electronics Packaging Exective Board Member

The Electrochemical Society Editorial Board Member, The Journal of The Electrochemical Society

International Society of Electrochemistry Chair, Division 5

Award

Research Award(Electrodeposition Division), The Electrochemical Society

2010/10

Best Paper Presentation Award, Interfinish

2000/09

Research Field

Keywords

Electrochemistry, Nano fabrication process, MEMS, Surface chemistry, Data storage devices

Grants-in-Aid for Scientific Research classification

Interdisciplinary science and engineering / Nano/Micro science / Nano/Microsystems

Chemistry / Applied chemistry / Functional solid state chemistry

Engineering / Electrical and electronic engineering / Electron device/Electronic equipment

Technology Seeds

Seeds Field:Nanotechnology / Materials

Research interests Career

Creation of functional nanostructures through electrochemical processes

Current Research Theme Keywords:Functional Materials,Electrochemistry

International Cooperative Research

Mechanistic analysis of Silicon surface chemistry under wet device processing conditions

Current Research Theme Keywords:Silicon device process,surface chemistry

International Cooperative Research

In-situ Analysis of Electrochemical Processes

Current Research Theme Keywords:In-situ analysis,SPM

Cooperative Research within Japan

*Creating thin films and nanostructured surfaces with novel electronic or magnetic functions

Individual research allowance

*Ex-situ and in-situ analyses of their deposition processes and deposition reaction mechanism

Individual research allowance

*Developing new methods for evaluating structural and functional properties of the nanostruc-tured surfaces

Individual research allowance

*Applying such surfaces to devices and systems

Individual research allowance

*Electrochemical study of Si surface chemistry under device processing conditions

Individual research allowance

Paper

In Situ Measurement for Diffusion-Adsorption Process of Cl− and SPS in Through-Silicon Via Using SERS Effect Produced by Cu Nanodot Arrays

M. Kunimoto, F. Yamaguchi, M. Yanagisawa, T. Homma

J. Electrochem. Soc. Peer Review Yes 166(6) p.D212 - D2172019-

Detail

Publish Classification:Research paper (scientific journal)

Analysis of the effect of surface wettability on hydrogen evolution reaction in water electrolysis using micro-patterned electrodes

T. Fujimura, W. Hikima, Y. Fukunaka, T. Homma

Electrochem. Commun. Peer Review Yes 101p.43 - 462019-

Mechanism of Electrolytic Reduction of SiO2 at Liquid Zn Cathode in Molten CaCl2

Y. Ma, A. Ido, K. Yasuda, R. Hagiwara, T. Homma, T. Nohira

J. Electochem. Soc. Peer Review Yes 166(6) p.D162 - D1672019-

Electrodeposition of Fe-Ni-Pt alloy films for heat-assisted magnetic recording media: Synthesis, structure and magnetic properties

S. Ge, Q. Lin, S. Wodarz, M. Kambe, T. Homma, G. Zangari

Electrochim. Acta Peer Review Yes 302p.92 - 1012019-

Effect of Li+ addition on growth behavior of ZnO during anodic dissolution of Zn negative electrode

T. Otani, T. Yasuda, M. Kunimoto, M. Yanagisawa, Y. Fukunaka, T. Homma

Electrochim. Acta Peer Review Yes 305p.90 - 1002019-

First-principle study of the oxidation mechanism of formaldehyde and hypophosphite for copper and nickel electroless deposition process

Y. Onabuta, M. Kunimoto, H. Nakai, T. Homma

Electrochim. Acta Peer Review Yes 307p.536 - 5422019-

Experimental Measurement of Overpotential Sources during Anodic Gas Evolution in Aqueous and Molten Salt Systems

B. Chmielowiec, T. Fujimura, T. Otani, K. Aoyama, T. Nohira, T. Homma, Y. Fukunaka, A. Allanore

J. Electrochem. Soc. Peer Review Yes 166(10) p.E323 - E3292019-

Direct observation of the diffusion behavior of an electrodeposition additive in through-silicon via using in situ surface enhanced Raman spectroscopy

Homma, Takayuki; Homma, Takayuki; Kato, Akira; Kunimoto, Masahiro; Yanagisawa, Masahiro

Electrochemistry Communications 88p.34 - 382018/03-2018/03

DOIScopus

Detail

ISSN:13882481

Outline:© 2018 In this work, the behavior of an additive designed to aid electrodeposition in through-silicon via (TSV) structures is monitored directly using surface enhanced Raman spectroscopy (SERS). A horizontal via structure with a transparent ceiling (corresponding to the side wall of the TSV) was prepared, which allowed the probe laser to reach the bottom of the structure (corresponding to the opposite side of the TSV wall). Au nanoparticles of size ~5 nm deposited on the bottom of the structure produced a SERS effect and enhanced the Raman signals of chemical species migrating nearby. The diffusion behavior of the additive inside the via structure could be monitored with high sensitivity by detecting these enhanced signals. As a case study, this direct measurement method was successfully used to follow the diffusion of a small amount of Janus Green B, a common additive for Cu electrodeposition. The diffusion coefficient of the additive determined by these measurements turned out to be different to that estimated electrochemically on flat electrodes. One of the advantages of our direct measurement setup is the ability to exclude the undesirable environmental changes that often occur in electrochemical measurements.

Fabrication of Electrodeposited FeCuPt Nanodot Arrays Toward L10Ordering

Wodarz, Siggi; Hashimoto, Shogo; Kambe, Mana; Zangari, Giovanni; Homma, Takayuki

IEEE Transactions on Magnetics 54(2) 2018/02-2018/02

DOIScopus

Detail

ISSN:00189464

Outline:© 1965-2012 IEEE. FeCuPt nanodot arrays were fabricated by electrodeposition onto a nanopore patterned substrate fabricated by electron beam lithography (EBL), for the purpose to manufacture and characterize model bit-patterned media. Addition of Cu to FePt was carried out to accelerate the phase transformation of FePt into the L1 0 -ordered phase in order to fabricate nanodot arrays with hard and uniform magnetic properties. Composition of the FeCuPt ternary alloy films was optimized by varying applied potential and CuSO 4 concentration to form single L1 0 phase (40-50 at% Pt and 25 at% Cu). Annealing at 450 °C resulted in the phase transformation from fcc to L1 0 in FeCuPt ternary alloy films, whereas FePt binary alloy films did not show a phase transformation. Perpendicular coercivities of FeCuPt and FePt were 6 and 1 kOe, respectively, annealing at 450 °C, indicating the formation of the L1 0 phase with lower annealing temperature by Cu incorporation. FeCuPt nanodot arrays with 20 nm in diameter and 35 nm in pitch were successfully fabricated with the nanopore patterned substrate fabricated by EBL. In addition, cross-sectional transmission electron microscope analysis of FeCuPt nanodot arrays showed clear stacking of the L1 0 (111) lattice in a perpendicular direction through the growth direction having a single crystal nature, whereas phase transformation was insufficient with FePt nanodot arrays. The collective results have successfully demonstrated the electrochemical fabrication of ultra-fine FePt nanodot arrays with L1 0 structure by promoting L1 0 ordering with Cu additions.

Effect of Si Addition on the Electrochemical Reduction Rate of SiO2Granules in Molten CaCl2

Zhong, Ming; Yang, Xiao; Yasuda, Kouji; Yasuda, Kouji; Homma, Takayuki; Nohira, Toshiyuki

Metallurgical and Materials Transactions B: Process Metallurgy and Materials Processing Science 49(1) p.341 - 3482018/02-2018/02

DOIScopus

Detail

ISSN:10735615

Outline:© 2017, The Minerals, Metals & Materials Society and ASM International. The effect of adding Si powder/granules on the electrochemical reduction rate of SiO 2 granules in molten CaCl 2 was investigated. Various starting materials were prepared by mixing different amounts (up to 80 mass pct) of Si powder/granules (four different sizes: <  5, 20 to 100, 100 to 250 µm, 0.5 to 1.0 mm) with SiO 2 granules, with these materials then being electrochemically reduced for 20 minutes in molten CaCl 2 at 0.6 V vs Ca 2+ /Ca and a temperature of 1123 K (850 °C). The effects of the size and amount of Si added on the reaction rates were then studied. When the size of the Si powder added is less than 5 µm, the reaction rate decreases as more Si is added. When Si with a size of 20 to 100 or 100 to 250 µm is used, the reaction rate does not change substantially with the amount added. When 0.5 to 1.0 mm Si is used, the reduction rate is the largest when 40 mass pct Si is added. The reduction rate is influenced by the reaction surface and the diffusion of O 2− ions in the mixture.

Formation of Si thin films by electrodeposition in ionic liquids for solar cell applications

Y. Tsuyuki, H. Takai, Y. Fukunaka, T. Homma

Jpn. J. Appl. Phys. (57) p.08RB11 2018-

Analysis of Cathodic Reaction Process of SiCl4 during Si Electrodeposition in Ionic Liquids

Y. Tsuyuki, T. Fujimura, M. Kunimoto, Y. Fukunaka, P. Pianetta, T. Homma

J. Electrochem. Soc. (164(14)) p.D994 - D9982018-

Spectroscopic and Computational Analyses of Liquid-Liquid Interfacial Reaction Mechanism of Boric Acid Esterification with 2,2,4-Trimethyl-1,3-Pentanediol in Boron Extraction Processes

M. Kunimoto, D. Bothe, R. Tamura, T. Oyanagi, Y. Fukunaka, H. Nakai, T. Homma

J. Phys. Chem. C (122) p.10423 - 104292018-

Direct observation of the diffusion behavior of an electrodeposition additive in through-silicon via using in situ surface enhanced Raman spectroscopy

T. Homma, A. Kato, M. Kunimoto, M. Yanagisawa

Electrochem. Commun. (88) p.34 - 382018-

Surface enhanced Raman spectroscopy measurement of surface pH at the electrode during Ni electrodeposition reaction

T. Homma, M. Kunimoto, M. Sasaki, T. Hanai, M. Yanagisawa

J. Appl. Electrochem. (48) p.561 - 5672018-

Surface enhanced Raman spectroscopy measurement of surface pH at the electrode during Ni electrodeposition reaction

Homma, Takayuki; Homma, Takayuki; Kunimoto, Masahiro; Sasaki, Moe; Hanai, Tomoya; Yanagisawa, Masahiro

Journal of Applied Electrochemistry p.1 - 72017/12-2017/12

DOIScopus

Detail

ISSN:0021891X

Outline:© 2017 Springer Science+Business Media B.V., part of Springer Nature Abstract: In this work, we developed a precise approach to analyze local proton concentration at the solid/liquid interface of electrodes, i.e. “surface pH”, during electrochemical reactions. For this, surface enhanced Raman spectroscopy (SERS) was applied to analyze pH-dependent structural changes of the –COOH group of p-mercaptobenzoic acid (p-MBA) modified onto Au nanoparticles (NPs) on the substrate close to a working electrode. Measurements using this system identified deprotonation of –COOH of p-MBA. Since preliminary experiments and density functional theory calculations suggest that the pKa of p-MBA attached to Au NPs is close to that in bulk solution, the SERS results indicate pH increase due to proton consumption by the cathodic overpotential of the working electrode. As an example, we applied this system to surface pH monitoring in electrodeposition process of Ni in an acidic bath, which indicated the validity of our method for precise detection of pH changes at electrode interfaces in situ. Graphical Abstract: [Figure not available: see fulltext.]

Depth profiling of APTES self-assembled monolayers using surface-enhanced confocal Raman microspectroscopy

Sun, Yingying; Yanagisawa, Masahiro; Kunimoto, Masahiro; Nakamura, Masatoshi; Homma, Takayuki; Homma, Takayuki

Spectrochimica Acta - Part A: Molecular and Biomolecular Spectroscopy 184p.1 - 62017/09-2017/09

DOIScopus

Detail

ISSN:13861425

Outline:© 2017 Elsevier B.V. The internal structure of self-assembled monolayers (SAMs) such as 3-aminopropyltriethoxysilane (APTES) fabricated on a glass substrate is difficult to characterize and analyze at nanometer level. In this study, we employed surface-enhanced Raman spectroscopy (SERS) to study the internal molecular structure of APTES SAMs. The sample APTES SAMs were deposited with Ag nanoparticles to enhance the Raman signal and to obtain subtler structure information, which were supported by density functional theory calculations. In addition, in order to carry out high-resolution analysis, especially for vertical direction, a fine piezo electric positioner was used to control the depth scanning with a step of 0.1 nm. We measured and distinguished the vertical Raman intensity variations of specific groups in APTES, such as Ag/NH 2 , CH 2 , and Si[sbnd]O, with high resolution. The interfacial bond at the two interfaces of Ag-APTES and APTES-SiO 2 was identified. Moreover, APTES molecule orientation was demonstrated to be inhomogeneous from frequency shift.

Effect of lead and tin additives on surface morphology evolution of electrodeposited zinc

Otani, Tomohiro; Fukunaka, Yasuhiro; Homma, Takayuki; Homma, Takayuki; Homma, Takayuki

Electrochimica Acta 242p.364 - 3722017/07-2017/07

DOIScopus

Detail

ISSN:00134686

Outline:© 2017 Elsevier Ltd Effects of Pb and Sn additives on electrodeposition of Zn were investigated for the applications in Zn secondary battery, focused on their roles on morphological evolution. Similarly to well-known effect of Pb addition to smoothly electrodeposit Zn film surface, Sn also exhibited to suppress the formation of mossy structures, which were highly filamentous Zn electrodeposits to cause frequently battery failure. Pb significantly shifted deposition potential of Zn to negative value at concentration less than 1.0 mmol dm −3 , while Sn showed no substantial effect even at 50 mmol dm −3 . The morphological evolution analysis demonstrated that the addition of 1.0 mmol dm −3 Pb significantly altered nucleation behavior of Zn at initial stages of deposition; stacking of layer-like structures (microsteps) were altered to discrete and uniform nuclei of Zn preferentially oriented to (002) direction. In contrast, with Sn additive, morphological features at the initial stage of deposition were similar to that without additive. However, microsteps evolution was gradually suppressed and relatively strong (002) texture of electrodeposited Zn was mitigated by Sn addition. These results suggested that the beneficial roles of Pb and Sn addition on Zn morphological evolution were ascribed to different reasons; Pb diminished the active growth sites of Zn surface by suppressing the deposition reaction of Zn, while Sn suppressed microsteps evolution by different texture evolution of Zn.

Thickness control of 3-dimensional mesoporous silica ultrathin films by wet-etching

Kobayashi, Maho; Susuki, Kyoka; Otani, Tomohiro; Enomoto, Shinpei; Otsuji, Haruo; Kuroda, Yoshiyuki; Wada, Hiroaki; Shimojima, Atsushi; Homma, Takayuki; Homma, Takayuki; Kuroda, Kazuyuki; Kuroda, Kazuyuki

Nanoscale 9(24) p.8321 - 83292017/06-2017/06

DOIScopus

Detail

ISSN:20403364

Outline:© 2017 The Royal Society of Chemistry. The thickness of 3-dimensional (3D) mesoporous silica ultrathin films was controlled at a single-nanometer scale by wet-etching. A drop casting method with an aqueous etchant of ammonium fluoride was effective in etching the surfaces of films in the direction perpendicular to their substrates. The decrease in the film thickness depends on the interface tension of etching solutions. The wettability of thin films also influences the etching. CoPt nanodots were electrodeposited within ultrathin silica films on Ru substrates to form CoPt nanodot patterns.

Structural control of ultra-fine CoPt nanodot arrays via electrodeposition process

Wodarz, Siggi; Hasegawa, Takashi; Ishio, Shunji; Homma, Takayuki

Journal of Magnetism and Magnetic Materials 430p.52 - 582017/05-2017/05

DOIScopus

Detail

ISSN:03048853

Outline:© 2017 Elsevier B.V. CoPt nanodot arrays were fabricated by combining electrodeposition and electron beam lithography (EBL) for the use of bit-patterned media (BPM). To achieve precise control of deposition uniformity and coercivity of the CoPt nanodot arrays, their crystal structure and magnetic properties were controlled by controlling the diffusion state of metal ions from the initial deposition stage with the application of bath agitation. Following bath agitation, the composition gradient of the CoPt alloy with thickness was mitigated to have a near-ideal alloy composition of Co:Pt =80:20, which induces epitaxial-like growth from Ru substrate, thus resulting in the improvement of the crystal orientation of the hcp (002) structure from its initial deposition stages. Furthermore, the cross-sectional transmission electron microscope (TEM) analysis of the nanodots deposited with bath agitation showed CoPt growth along its c-axis oriented in the perpendicular direction, having uniform lattice fringes on the hcp (002) plane from the Ru underlayer interface, which is a significant factor to induce perpendicular magnetic anisotropy. Magnetic characterization of the CoPt nanodot arrays showed increase in the perpendicular coercivity and squareness of the hysteresis loops from 2.0 kOe and 0.64 (without agitation) to 4.0 kOe and 0.87 with bath agitation. Based on the detailed characterization of nanodot arrays, the precise crystal structure control of the nanodot arrays with ultra-high recording density by electrochemical process was successfully demonstrated.

Determination of copper nanoparticle size distributions with total reflection X-ray fluorescence spectroscopy

Singh, Andy; Luening, Katharina; Brennan, Sean; Homma, Takayuki; Kubo, Nobuhiro; Nowak, Stanisław H.; Pianetta, Piero

Journal of Synchrotron Radiation 24(1) p.283 - 2872017/01-2017/01

DOIScopus

Detail

ISSN:09090495

Outline:© 2017 International Union of Crystallography.Total reflection X-ray fluorescence (TXRF) analysis is extensively used by the semiconductor industry for measuring trace metal contamination on silicon surfaces. In addition to determining the quantity of impurities on a surface, TXRF can reveal information about the vertical distribution of contaminants by measuring the fluorescence signal as a function of the angle of incidence. In this study, two samples were intentionally contaminated with copper in non-deoxygenated and deoxygenated ultrapure water (UPW) resulting in impurity profiles that were either atomically dispersed in a thin film or particle-like, respectively. The concentration profile of the samples immersed into deoxygenated UPW was calculated using a theoretical concentration profile representative of particles, yielding a mean particle height of 16.1 nm. However, the resulting theoretical profile suggested that a distribution of particle heights exists on the surface. The fit of the angular distribution data was further refined by minimizing the residual error of a least-squares fit employing a model with a Gaussian distribution of particle heights about the mean height. The presence of a height distribution was also confirmed with atomic force microscopy measurements.

Thermal stability of single-layer graphene subjected to confocal laser heating investigated by using in situ anti-stokes and stokes Raman spectroscopy

Sun, Yingying; Yanagisawa, Masahiro; Homma, Takayuki; Homma, Takayuki

Electrochemistry 85(4) p.195 - 1982017/01-2017/01

DOIScopus

Detail

ISSN:13443542

Outline:© The Electrochemical Society of Japan, All rights reserved.The thermal stability of graphene has a close relationship with defect generation, thermal oxidation, which in turn have a significant bearing on its properties and applications. This report discusses the effect of confocal laser heating on the structure of single-layer graphene (SLG) on the basal plane and the edge. The thermal stability of SLG basal plane and edge was demonstrated to be different by using in situ anti-Stokes and Stokes Raman spectroscopy. The basal plane was found to be unstable above 500°C, while the edge could not endure even 220°C. The variation in the intensity of D, G, and 2D peaks and the intensity ratios of I(D)/I(G) and I(2D)/I(G) indicated that the thermal instability started with defect generation at the basal plane. The initial point defects at edge were partially eliminated at low temperature and generated again at temperatures above 220°C.

Electrolytic Production of Silicon Using Liquid Zinc Alloy in Molten CaCl2

K. Yasuda, T. Shimano, R. Hagiwara, T. Homma, T. Nohira

J. Electrochem. Soc. (164) p.H5049 - H50562017-

Depth profiling of APTES self-assembled monolayers using surface-enhanced confocal Raman microspectroscopy

Y. Sun, M. Yanagisawa, M. Kunimoto, M. Nakamura, T. Homma

Spectrochim. Acta (Part A) p.431062017-

Analysis of Cathodic Reaction Process of SiCl4 during Si Electrodeposition in Ionic Liquids

Y. Tsuyuki, T. Fujimura, M. Kunimoto, Y. Fukunaka, P. Pianetta, T. Homma

J. Electrochem. Soc. (164) p.D994 - 9982017-

Fabrication of Channel Type Mixing Devices for Efficient Solvent Extraction for High Purity Silica Production

Y. V. Akash, M. Mimura, Y. Kunimoto, Y. Fukunaka, T. Homma

ECS Trans. (80) p.1441 - 14462017-

Thickness Control of 3-Dimensional Mesoporous Silica Ultrathin Films by Wet-Etching

M. Kobayashi, K. Susuki, T. Otani, S. Enomoto, H. Otsuji, Y. Kuroda, H. Wada, A. Shimojima, T. Homma, K. Kuroda

Nanoscale (9) p.8321 - 83292017-

Effect of lead and tin additives on surface morphology evolution of electrodeposited zinc

T. Otani, Y. Fukunaka, T. Homma

Electrochim. Acta (242) p.364 - 3722017-

Thermal Stability of Single-layer Graphene Subjected to Confocal Laser Heating Investigated by Using in situ Anti-Stokes and Stokes Raman Spectroscopy

Y. Sun, M. Yanagisawa, T. Homma

Electrochemistry (85) p.195 - 1982017-

Structural control of ultra-fine CoPt nanodot arrays via electrodeposition process

S. Wodarz, T. Hasegawa. S. Ishio, T. Homma

J. Mag. Mag. Mat. (430) p.52 - 582017-

Determination of copper nanoparticle size distributions with total reflection X-ray fluorescence spectroscopy

Singh, Andy;Luening, Katharina;Brennan, Sean;Homma, Takayuki;Kubo, Nobuhiro;Nowak, Stanislaw H.;Pianetta, Piero

JOURNAL OF SYNCHROTRON RADIATION 24p.283 - 2872017-2017

DOIWoS

Detail

ISSN:1600-5775

Thermal Stability of Single-layer Graphene Subjected to Confocal Laser Heating Investigated by Using in situ Anti-Stokes and Stokes Raman Spectroscopy

SUN Yingying;YANAGISAWA Masahiro;HOMMA Takayuki

Electrochemistry 85(4) p.195 - 1982017-2017

CiNii

Detail

ISSN:1344-3542

Outline:The thermal stability of graphene has a close relationship with defect generation, thermal oxidation, which in turn have a significant bearing on its properties and applications. This report discusses the effect of confocal laser heating on the structure of single-layer graphene (SLG) on the basal plane and the edge. The thermal stability of SLG basal plane and edge was demonstrated to be different by using in situ anti-Stokes and Stokes Raman spectroscopy. The basal plane was found to be unstable above 500°C, while the edge could not endure even 220°C. The variation in the intensity of D, G, and 2D peaks and the intensity ratios of I(D)/I(G) and I(2D)/I(G) indicated that the thermal instability started with defect generation at the basal plane. The initial point defects at edge were partially eliminated at low temperature and generated again at temperatures above 220°C.

Simultaneous Measurement of Kinetic Mechanical Properties and Chemical Structure:Tribological Analysis (2)

Yanagisawa Masahiro;Saito Mikiko;Kunimoto Masahiro;Homma Takayuku

Abstract of annual meeting of the Surface Science of Japan 37(0) 2017-2017

CiNii

Transmission-type plasmonic sensor for surface-enhanced Raman spectroscopy

Yanagisawa, Masahiro; Saito, Mikiko; Kunimoto, Masahiro; Homma, Takayuki

Applied Physics Express 9(12) 2016/12-2016/12

DOIScopus

Detail

ISSN:18820778

Outline:© 2016 The Japan Society of Applied Physics.We present a novel optical device for the analysis of chemical surface properties utilizing surface-enhanced Raman scattering. The device, a transmission-type plasmonic sensor (TPS), offers the advantages of high sensitivity, nondestructive sample characterization, simple setup, and low-cost fabrication. The TPS is composed of Ag nanoparticles (NPs) deposited on a convex quartz glass substrate. The enhanced Raman spectrum is acquired by focusing a laser beam perpendicular to the sample surface through the substrate. The laser beam generates plasmon polarization in droplet-shaped Ag NPs at the sensor/sample interface. Our results indicate the potential of the device as a versatile surface-analytical tool.

Transmission-type plasmonic sensor for surface-enhanced Raman spectroscopy

Yanagisawa Masahiro;Saito Mikiko;Kunimoto Masahiro;Homma Takayuki

Appl. Phys. Express 9(12) 2016/11-2016/11

CiNii

Detail

ISSN:1882-0778

Outline:We present a novel optical device for the analysis of chemical surface properties utilizing surface-enhanced Raman scattering. The device, a transmission-type plasmonic sensor (TPS), offers the advantages of high sensitivity, nondestructive sample characterization, simple setup, and low-cost fabrication. The TPS is composed of Ag nanoparticles (NPs) deposited on a convex quartz glass substrate. The enhanced Raman spectrum is acquired by focusing a laser beam perpendicular to the sample surface through the substrate. The laser beam generates plasmon polarization in droplet-shaped Ag NPs at the sensor/sample interface. Our results indicate the potential of the device as a versatile surface-analytical tool.

Study of Multilayer X-ray Absorbers to Improve Detection Efficiency of TES X-ray Microcalorimeter Arrays

Hayashi, T.; Nagayoshi, K.; Muramatsu, H.; Yamasaki, N. Y.; Mitsuda, K.; Saito, M.; Homma, T.; Hara, T.; Noda, H.

Journal of Low Temperature Physics 184(1-2) p.257 - 2622016/07-2016/07

DOIScopus

Detail

ISSN:00222291

Outline:© 2016, The Author(s).We report the fabrication and evaluation of the Cu/Bi bilayer absorber with electrodeposition. We designed the Cu/Bi absorber to satisfy the requirements for scanning transmission electron microscope (STEM). The residual resistivity ratios of films of Cu and Bi with electrodeposition was 5.91 ± 0.49 and 2.06 ± 0.33 , respectively; these values are sufficient for the requirements of STEM. We found that the Cu/Bi bilayer absorber TES microcalorimeter experienced a pulse-shape variation and we considered that these variations were caused by the quality of the contact surface between the absorber and TES. In addition, we examined the structure of the absorber using focus ion beam analysis and STEM. The results suggest that an oxidation between the Cu and seed layer, in which the layer is an electrode for electrodeposition, yielded variations. Moreover, thermal simulation suggests that the thermal conduction between the absorber and TES caused variations. The results of this study will improve the process of Bi electrodeposition.

Morphological evolution of mossy structures during the electrodeposition of zinc from an alkaline zincate solution

Otani, Tomohiro; Nagata, Masato; Fukunaka, Yasuhiro; Homma, Takayuki; Homma, Takayuki; Homma, Takayuki

Electrochimica Acta 206p.366 - 3732016/07-2016/07

DOIScopus

Detail

ISSN:00134686

Outline:© 2016 Elsevier Ltd. All rights reserved.The morphological evolution of zinc during electrodeposition from an alkaline zincate solution, i.e., corresponding to charging operation in secondary zinc batteries, was investigated. The initiation and propagation of mossy structures were particularly focused; mossy structures represent one of the undesired, irregular morphologies at low cathodic overpotential. Scanning electron microscopy observations showed that mossy structures formed transiently from layer-like morphology followed by the formation of protrusions with a size of submicrometers. These protrusions still exhibited layer-like features in the initial stage. In addition to this transition behavior, the propagation of mossy structures was monitored in situ by optical microscopy. At -5.0 mA cm-2, mossy structures formed successively and propagated, while there was no clear change in layer-like morphology during deposition outside these characteristic structures. At -20 mA cm-2, the layer-like growth proceeded for longer duration and the population of the mossy structures apparently decreased. However, they continuously increased in size followed by successive formation of mossy structures once initiated. From these results, growth mode of zinc at low cathodic overpotential transiently changed from layer-like growth to mossy structure evolution accompanied with dynamic variations in local current density.

Theoretical Study on the Formation Mechanism of Amino Acid-Cu(II) Complexes on an Enantio-Sensing Device Interface

Kunimoto, Masahiro; Sadaoka, Yusuke; Nakanishi, Takuya; Osaka, Tetsuya; Osaka, Tetsuya; Homma, Takayuki; Homma, Takayuki

Journal of Physical Chemistry C 120(29) p.15722 - 157282016/07-2016/07

DOIScopus

Detail

ISSN:19327447

Outline:© 2016 American Chemical Society.Theoretical analyses of l-alanine (l-Ala)- and l-homocysteine (l-Hcy)-Cu(II) complexes in basic, neutral, and acidic solutions were carried out using density functional theory to investigate the pH dependence of the formation mechanism of amino acid-Cu(II) complexes. The calculated complex formation energies indicate that the amino acid-Cu(II) complexes were expected to form in basic and neutral solutions but not in acidic solutions. The factors that determine the stability of these complexes are the coordination ability of each amino acid and the significance of intramolecular interactions among ligands within the complexes. As predicted from the molecular structure, in neutral solutions, the coordination ability of amino acid becomes lower than that in basic solutions because of the inert structure of the protonated amino group, -NH3+ however, the coordination ability originating from the -COO- group is estimated to be sufficient for stabilizing the entire complex system. Moreover, two H2O molecules coordinate with the central Cu2+ ion from the equatorial direction and interact with the coordinating amino acids, providing additional stability within the complex. In contrast, in acidic solutions, the complex does not have either sufficient coordination ability of amino acids or effective intramolecular interactions within the complex.

Analysis and Control of the Initial Electrodeposition Stages of Co-Pt Nanodot Arrays

Wodarz, Siggi; Abe, Junya; Homma, Takayuki

Electrochimica Acta 197p.330 - 3352016/04-2016/04

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Detail

ISSN:00134686

Outline:© 2015 Elsevier Ltd. All rights reserved.We have fabricated Co-Pt nanodot arrays by combining electrodeposition with electron beam lithography (EBL) for applications in ultra-high density magnetic recording media, such as bit-patterned media (BPM). In this work, we analyzed the initial nucleation and growth of Co-Pt inside nanopores to achieve nanodot arrays with high deposition uniformity, as well as magnetic properties. At -900 mV (vs. Ag/AgCl), multiple nuclei of 2.0-3.0 nm in size were randomly distributed, even in nanopores with a 10 nm diameter, which could result in a lack of uniformity in the magnetic properties. The number of nuclei was then reduced by applying a less negative potential (>-700 mV vs. Ag/AgCl) to deposit a single nucleus inside each nanopore. As a result, a single grain of 5.0-10 nm in size was successfully deposited inside the nanopore, which could induce uniform magnetic properties in each nanodot. In addition, at less negative potentials, the coercivity of the Co-Pt films increased, which was induced by the epitaxial-like growth of Co-Pt from the Ru substrate. Cross-sectional TEM analysis suggested that Co-Pt deposited with a less negative potential was single crystalline with uniform hcp lattice fringes in the direction perpendicular to the Ru interface, indicating the formation of highly uniform nanodot arrays with high perpendicular magnetic anisotropy.

Estimated phase transition and melting temperature of APTES self-assembled monolayer using surface-enhanced anti-stokes and stokes Raman scattering

Sun, Yingying; Yanagisawa, Masahiro; Kunimoto, Masahiro; Nakamura, Masatoshi; Homma, Takayuki; Homma, Takayuki

Applied Surface Science 363p.572 - 5772016/02-2016/02

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Detail

ISSN:01694332

Outline:© 2015 Elsevier B.V. All rights reserved.A structure's temperature can be determined from the Raman spectrum using the frequency and the ratio of the intensities of the anti-Stokes and Stokes signals (the Ias/Is ratio). In this study, we apply this approach and an equation relating the temperature, Raman frequency, and Ias/Is ratio to in-situ estimation of the phase change point of a (3-aminopropyl)triethoxysilane self-assembled monolayer (APTES SAM). Ag nanoparticles were deposited on APTES to enhance the Raman signals. A time-resolved measurement mode was used to monitor the variation in the Raman spectra in situ. Moreover, the structural change in APTES SAM (from ordered to disordered structure) under heating was discussed in detail, and the phase change point (around 118 °C) was calculated.

The Role of Granule Size on the Kinetics of Electrochemical Reduction of SiO2 Granules in Molten CaCl2

Yang, Xiao; Yasuda, Kouji; Yasuda, Kouji; Nohira, Toshiyuki; Hagiwara, Rika; Homma, Takayuki

Metallurgical and Materials Transactions B: Process Metallurgy and Materials Processing Science 47(1) p.788 - 7972016/02-2016/02

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Detail

ISSN:10735615

Outline:© 2015, The Minerals, Metals & Materials Society and ASM International.As a fundamental study to develop a new process for producing solar-grade silicon, the effect of granule size on the kinetics of the electrochemical reduction of SiO2 granules in molten CaCl2 was investigated. SiO2 granules with different size ranges were electrolyzed in molten CaCl2 at 1123 K (850 °C). The reduction kinetics was evaluated on the basis of the growth rate of the reduced Si layer and the behavior of the current during electrolysis. The results indicated that finer SiO2 granules are more favorable for a high reduction rate because the contact resistance between the bottom Si plate and the reduced Si particles is small and the diffusion of O2− ions in CaCl2 inside the porous Si shell is easy. Electrolysis using SiO2 granules less than 0.1 mm in size maintained a current density of no less than 0.4 A cm−2 within 20 minutes, indicating that the electrochemical reduction of fine SiO2 granules in molten CaCl2 has the potential of becoming a high-yield production process for solar-grade silicon.

Silicon electrodeposition in water-soluble KF-KCl molten salt: Optimization of electrolysis conditions at 923 K

Yasuda, Kouji; Yasuda, Kouji; Maeda, Kazuma; Nohira, Toshiyuki; Hagiwara, Rika; Homma, Takayuki

Journal of the Electrochemical Society 163(3) p.D95 - D992016/01-2016/01

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Detail

ISSN:00134651

Outline:© 2015 The Electrochemical Society.To establish a new Si-electrodeposition process, the optimum conditions for obtaining adherent, compact, and smooth Si films using molten KF-KCl-K2SiF6 were investigated at 923 K. Galvanostatic electrolysis was conducted on a Ag substrate in eutectic KF-KCl (45:55 mol%) with various current densities (10-500 mA cm-2) and K2SiF6 concentrations (0.5-5.0 mol%). Cross-sectional scanning electron microscopy (SEM) of the deposits revealed that compact and smooth Si films form at intermediate K2SiF6 concentrations and current densities. The relationship between the deposition conditions and Si morphology is discussed in terms of the electrodeposition mechanism.

A new electrolytic production process of silicon using liquid Zn alloy cathode in molten salt

Nohira, Toshiyuki; Ido, Akifumi; Shimao, Takeyuki; Yang, Xiao; Yasuda, Kouji; Yasuda, Kouji; Hagiwara, Rika; Homma, Takayuki

ECS Transactions 75(15) p.17 - 332016/01-2016/01

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ISSN:19385862

Outline:Electrolytic production process for solar-grade Si utilizing liquid Si-Zn alloy cathode in molten CaCl2 has been proposed. Toward the establishment of the process, the behavior of liquid Zn metal was investigated in molten CaCl2 at 1123 K. The evaporation of Zn metal was largely suppressed by an immersion into molten salt, which enables the use of Zn electrode in spite of the high vapor pressure of Zn. The cyclic voltammetry suggested the reduction of SiO2 at 1.45 V vs. Ca2+/Ca on a Zn cathode. After the potentiostatic electrolysis at 0.9 V, Si particles with diameters of 2-30 μm were precipitated in the solidified Zn matrix by the slow cooling process of the produced liquid Si-Zn alloy. The alloying rate between solid Si and liquid Zn was measured as 4.56 μm s-1, and it linearly decreased with the Si content in liquid Zn phase.

Electrodeposition of Si film from water-soluble KF-KCl molten salt and feasibility of SiCl4 as a Si source

Yasuda, Kouji; Yasuda, Kouji; Saeki, Kazumi; Maeda, Kazuma; Nohira, Toshiyuki; Hagiwara, Rika; Homma, Takayuki

ECS Transactions 75(15) p.593 - 6012016/01-2016/01

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Detail

ISSN:19385862

Outline:Toward an establishment of a new production method of solar cell substrates, electrodeposition of Si was investigated in molten KF-KCl (eutectic composition, 45:55 mol%) after the introduction of SiCl4. Gaseous SiCl4 was directly introduced into the molten salt at 1023 K by a vapor transport method using Ar carrier gas. The dissolution ratio of SiCl4 exceeded 80% even with the use of a simple tube for the bubbling. Galvanostatic electrolysis was conducted at 923 K on a Ag substrate at 155 mA cm-2 for 20 min in molten KF-KCl after the dissolution of 2.30 mol% SiCl4. Although compact Si layer was formed, the smoothness was lower compared to that obtained from the melt after the addition of K2SiF6. The anionic molar fraction is probably one of the factors affecting the morphology of deposit.

Depth profile analysis of chemical structures around lubricant/overcoat interface using plasmonic sensor

Yanagisawa, M.; Kunimoto, M.; Homma, T.

ASME 2016 Conference on Information Storage and Processing Systems, ISPS 2016 2016/01-2016/01

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Detail

Outline:© Copyright 2016 by ASME.A chemical depth profile in lubricant films, carbon films, and their interfaces is an informative parameter for hard disk media because molecular features of lubricants bonded to a surface of carbon overcoats (COCs), which usually consist of a nitrogen doped layer, are important to achieve high tribological performance. However, it was difficult to analyze their interfaces with high depth resolution because thickness of lubricant films and COC films are so thin, i.e. 1.5nm and 2nm, respectively. We have developed new method using plasmonic sensors, which has measurement capability for chemical structures with depth resolution of 0.1nm by surface-enhanced Raman spectroscopy (SERS). We examined the lubricant film composed of perfluorinated polyether (PFPE) with phosphazene derivative (A2OH) on a diamond-like carbon (DLC) film. The result shows that the functional group is adsorbed on the DLC surface, where lower shift in the wave number of phenyl group is observed. The depth profile of the intensity ratio of D-peak to G-peak shows the maximum at around the surface of the DLC film. A variety of organic components in the DLC films, fabricated by a chemical vapor deposition (CVD), were observed in it. Besides, the depth profiles shows that organic materials, involving methyl, ethyl, or ethylene groups, Co(OH)x exist in the film.

Life estimation of carbon overcoat on magnetic media for heatassisted magnetic recording using novel Raman spectroscopy

Yanagisawa, M.; Kunimoto, M.; Homma, T.

ASME 2016 Conference on Information Storage and Processing Systems, ISPS 2016 2016/01-2016/01

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Outline:© Copyright 2016 by ASME.A heat-assisted magnetic recording (HAMR) is expected for a future high density recording of a hard disk drive. However, a carbon overcoat (COC) composed of diamond-like carbon (DLC) or a lubricant film is possibly damaged when a magnetic medium, i.e. CoPt alloy, is heated at around Curie temperature (Tc) of 600K by a near-field HAMR head. We carried out HAMR simulation experiments by using newly developed Raman spectroscopic systems, composed of plasmonic sensors for surface-enhanced Raman scattering (SERS), a pulsed laser heating, and an in-situ temperature measurement with an intensity ratio of anti-Stokes/Stokes lines. It was found that the heated temperature of the COC is higher than that of the magnetic film, i.e., 580°C and 366°C, respectively. Intensity changes of G-band peak in Raman spectra for DLC films were observed during the pulsed laser heating. The Raman intensity was exponentially decreased by oxidation in air, where time constants were calculated as a parameter of a pulse width. Degradation life of the DLC film can be estimated from a critical pulse width, where the time constant is extrapolated to zero. The estimated pulse width for no degradation was 250μs at the heating temperature of 580°C. The result shows no damage can be estimated in DLC films for HAMR because the effective irradiation time is 5ns and the accumulated irradiation time is 0.5ms in HAMR operations.

Transmission-type plasmonic sensor for surface-enhanced Raman spectroscopy

M. Yanagisawa, M. Saito, M. Kunimoto, T. Homma

Appl. Phys. Express (9) p.1220022016-

Study of Multilayer X-ray Absorbers to Improve Detection Efficiency of TES X-ray microcalorimeter Arrays

T. Hayashi, K. Nagayoshi, H. Muramatsu, N. Yamasaki, K. Misuda, M. Saito, T. Homma, T. Hara, H. Noda

J. Low Temp. Phys. (184) p.257 - 2622016-

The Role of Granule Size on the Kinetics of Electrochemical Reduction of SiO2 Granules in Molten CaCl2

X. Yang, K. Yasuda, T. Nohira, R. Hagiwara, T. Homma

Metallurgical and Mat. Trans. B (47) p.788 - 7972016-

Depth profile analysis of chemical structures around lubricant/overcoat interface using plasmonic sensor

M. Yanagisawa, M. Kunimoto, T. Homma

ASME 2016 Conference on Information Storage and Processing Systems ISPS 2016 2016-

Life estimation of carbon overcoat on magnetic media for heatassisted magnetic recording using novel Raman spectroscopy

M. Yanagisawa, M. Kunimoto, T. Homma

ASME 2016 Conference on Information Storage and Processing Systems ISPS 2016 2016-

Electrodeposition of Si film from water-soluble KF-KCl molten salt and feasibility of SiCl4 as a Si source

K. Yasuda, K. Saeki, K. Maeda, T. Nohira, R. Hagiwara, T. Homma

ECS Trans. (75) p.593 - 6012016-

A new electrolytic production process of silicon using liquid Zn alloy cathode in molten salt

T. Nohira, A. Ido, T. Shimano, X. Yang, K. Yasuda, R. Hagiwara, T. Homma

ECS Trans. (75) p.17 - 332016-

Electrodeposition of ZnO from Acetate Bath for Thermoelectric Devices

H. Matsuo, K. Yoshitoku, D. Furuyama, M. Saito, T. Homma

ECS Trans. (75) p.143 - 1482016-

Silicon Electrodeposition in Water-Soluble KF?KCl Molten Salt: Optimization of Electrolysis Conditions at 923 K

K. Yasuda, K. Saeki, K. Maeda, T. Nohira, R. Hagiwara, T. Homma

J. Electrochem. Soc. (163) p.D95 - D992016-

Theoretical study on the formation mechanism of amino acid-Cu(II) complexes on an enantio-sensing device interface

M. Kunimoto, Y. Sadaoka, T. Nakanishi, T. Osaka, T. Homma

J. Phys. Chem. C (120) p.15722 - 157282016-

Analysis and Control of the Initial Electrodeposition Stages of Co-Pt Nanodot Arrays

S. Wodarz, J. Abe, T. Homma

Electrochim. Acta (197) p.330 - 3352016-

Morphological evolution of mossy structures during the electrodeposition of zinc from an alkaline zincate solution

T. Otani, M. Nagata, Y. Fukunaka, T. Homma

Electrochim. Acta (206) p.366 - 3732016-

Transmission-type plasmonic sensor for surface-enhanced Raman spectroscopy

Yanagisawa, Masahiro;Saito, Mikiko;Kunimoto, Masahiro;Homma, Takayuki

APPLIED PHYSICS EXPRESS 9(12) 2016-2016

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ISSN:1882-0778

Simultaneous measurement of kinetic mechanical properties and chemical structure: Tribology (1)

Yanagisawa Masahiro;Saito Mikiko;Kunimoto Masahiro;Homma Takayuki

Abstract of annual meeting of the Surface Science of Japan 36(0) 2016-2016

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Chemical Analysis of Buried Interface Using SERS Sensors

YANAGISAWA Masahiro;HOMMA Takayuki

Hyomen Kagaku 37(9) p.435 - 4402016-2016

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Detail

ISSN:0388-5321

Outline:

New technique for analyzing buried interface has developed based on surface-enhanced Raman scattering spectroscopy. It consists of plasmonic sensors and spectrometer equipped with high precision mechanisms. Performance of the system involves in-situ measurement of interfaces, i.e. liquid/solid or solid/solid, with high sensitivity and high depth resolution on a variety of samples. Additional functions are in-situ temperature measurement by anti-Stokes/Stokes ratio, simultaneous acquisition with laser heating, time-resolved measurement, and pulsed laser Raman spectroscopy. A depth profile of layered ultra-thin films, i.e. diamond-like carbon (DLC) or highly oriented pyrolytic graphite (HOPG), was analyzed in atomic scale resolution at solid/solid interface. Molecular configuration and bonding feature of liquid organic molecules, i.e. lubricants for magnetic disks or reducing agents for a plating, were analyzed at liquid/solid interface. Oxidation process or decomposition process of ultra-thin DLC films was analyzed for a variety of DLC films. Spectral change with irradiation time by pulsed laser heating exhibited a kinetic change of molecular structures in a chemical reaction with in-situ heating temperature measurement.

Electrochemical quartz crystal microbalance, X-ray photoelectron spectroscopy, and Raman spectroscopy analysis of SiCl4 reduction in ionic liquids

Tsuyuki, Yasuhiro; Pham Huynh, Tram Anh; Komadina, Jason; Fukunaka, Yasuhiro; Fukunaka, Yasuhiro; Homma, Takayuki; Homma, Takayuki; Homma, Takayuki

Electrochimica Acta 183p.49 - 552015/11-2015/11

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Detail

ISSN:00134686

Outline:© 2015 Elsevier Ltd. All rights reserved.The reaction mechanism of Si electrodeposition in the ionic liquid trimethyl-n-hexylammonium bis(trifluoromethylsulfonyl) imide (TMHATFSI) with SiCl4 was investigated using an electrochemical quartz crystal microbalance (EQCM) and X-ray photoelectron spectroscopy (XPS). The deposited films were further characterized by Raman spectroscopy. The EQCM method measured the frequency change in situ during electrodeposition, whereas XPS provided the Si mass concentration in the electrodeposited films. By combining these results, the mass change due to SiCl4 reduction was estimated. Then, the current efficiency for Si electrodeposition at various potentials was evaluated. The calculated current efficiency was almost 100% when it was assumed that SiCl4 reduction progressed by four-electron electroreduction. The XPS and Raman results showed that the deposited films were composed primarily of amorphous Si with Si-Si bonds. Crystalline Si thin films were obtained after annealing in an Ar gas stream.

High purity silicon materials prepared through wet-chemical and electrochemical approaches

Homma, Takayuki; Homma, Takayuki; Homma, Takayuki; Matsuo, Nobufumi; Yang, Xiao; Yang, Xiao; Yasuda, Kouji; Yasuda, Kouji; Fukunaka, Yasuhiro; Fukunaka, Yasuhiro; Nohira, Toshiyuki; Nohira, Toshiyuki

Electrochimica Acta 179p.512 - 5182015/10-2015/10

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ISSN:00134686

Outline:© 2015 Elsevier Ltd. All rights reserved. A new approach to produce high purity solar grade silicon (SOG-Si) using wet-chemical and electrochemical processes was proposed. First, diatomaceous earth was used as a source of silica and wet-chemical purification by acid leaching and solvent extraction processes were applied for eliminating heavy metal and light element such as boron, respectively. In particular, the solvent extraction using channel flow reactor demonstrated extremely high efficiency for eliminating boron to 7N (99.99999%) level purity. Secondly, the high-purity silica was reduced to silicon by the direct electrolysis method using molten CaCl2 as an electrolyte and Si plate as cathode. We proposed the continuous electrolysis system by feeding silica granules to the Si cathode set at the bottom of the cell. It was confirmed that the reduction proceeded steadily to form crystalline Si with a sufficient reduction rate. We also attempted electrodeposition of Si films and have developed a process using KF-KCl + K2SiF6 molten salt, from which uniform layer of Si with a thickness larger than 100 μm could be formed.

Silicon electrodeposition in water-soluble KF-KCl molten salt: Investigations on the reduction of Si(IV) ions

Maeda, Kazuma; Yasuda, Kouji; Yasuda, Kouji; Nohira, Toshiyuki; Hagiwara, Rika; Homma, Takayuki

Journal of the Electrochemical Society 162(9) p.D444 - D4482015/06-2015/06

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ISSN:00134651

Outline:© 2015 The Electrochemical Society. All rights reserved. A new method for electroplating Si using a water-soluble KF-KCl molten salt electrolyte and high-purity gaseous SiCl4 has been proposed. To gain a fundamental understanding of the process, the electrodeposition of Si from Si(IV) complex ions on a Ag electrode in a molten KF-KCl-K2SiF6 system was investigated by cyclic voltammetry at 923 K. The reduction of Si(IV) ions to metallic Si was observed as a single 4-electron wave, which is explained by an EqEr (quasireversible-reversible electron transfer reactions) mechanism. The diffusion coefficient of the Si(IV) ions in the electrolyte was determined to be 3.2 × 10-5 cm2 s-1 at 923 K by chronoamperometry.

Kinetic Characteristics of Electrochemical Reduction of SiO2 Granules in Molten CaCl2

X. Yang K.Yasuda T. Nohira R. Hagiwara T. Homma

J. Electrochem. Soc. (161) p.D3116 - D31192015-

Reaction Behavior of Stratified SiO2 Granules during Electrochemical Reduction in Molten CaCl2

X. Yang, K.Yasuda, T. Nohira, R. Hagiwara, T. Homma

Metallurgical and Mat. Trans. B (45) p.1337 - 13442015-

Trap-state passivation of titania nanotubes by electrochemical doping for enhanced photoelectrochemical performance

L. Tsui, M. Saito, T. Homma, G. Zangari

J. Mat. Chem. A (3) p.360 - 3672015-

Electrochemical quartz crystal microbalance, X-ray photoelectron spectroscopy, and Raman spectroscopy analysis of SiCl4 reduction in ionic liquids

Y. Tsuyuki, A. H Pham, J. Komadina, Y. Fukunaka, T. Homma

Electrochim. Acta (183) p.49 - 552015-

Fabrication of FePt and CoPt Magnetic Nanodot Arrays by Electrodeposition Process

T. Homma, S. Wodarz, D. Nishiie, T. Otani, S. Ge, G. Zangari

ECS Trans. (64) p.431092015-

Characterization of Electrodeposited Co-Pt Nanodot Array at Initial Deposition Stage

S. Wodarz, T. Otani, H. Hagiwara, T. Homma

ECS Trans. (64) p.99 - 1052015-

Elimination of Boron from Soluble Silica Via Solvent Extraction with 2,2,4-Trimethyl-1,3-Pentanediol Using a Multistage Flow-Type Reactor

N. Matsuo, T. Ishihara, T. Oyanagi, K. Nakajima, M. Kunimoto, Y. Fukunaka, T. Homma

ECS Trans. (64) p.91 - 972015-

Electrochemical Processes for the Fabrication of Functional Micro/nano Structures and Devices: Mechanistic Understanding and Process Development

T. Homma

Electrochemistry (83) p.680 - 6872015-

Estimated Phase Transition and Melting Temperature of APTES Self-Assembled Monolayer Using Surface-Enhanced Anti-Stokes and Stokes Raman Scattering

Y. Sun, M. Yanagisawa, M. Kunimoto, M. Nakamura, T. Homma

Appl. Surf. Sci. (363) p.572 - 5772015-

Trap-state passivation of titania nanotubes by electrochemical doping for enhanced photoelectrochemical performance

Tsui, Lok-kun;Saito, Mikiko;Homma, Takayuki;Zangari, Giovanni

JOURNAL OF MATERIALS CHEMISTRY A 3(1) p.360 - 3672015-2015

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ISSN:2050-7488

Fabrication of Pi-structured Bi-Te thermoelectric micro-device by electrodeposition

Uda, Kazuho;Seki, Yuta;Saito, Mikiko;Sonobe, Yoshiaki;Hsieh, Yu-Chin;Takahashi, Hidefumi;Terasaki, Ichiro;Homma, Takayuki

ELECTROCHIMICA ACTA 153p.515 - 5222015-2015

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ISSN:0013-4686

Silicon Electrodeposition in Water-Soluble KF-KCl Molten Salt: Investigations on the Reduction of Si(IV) Ions

Maeda, Kazuma;Yasuda, Kouji;Nohira, Toshiyuki;Hagiwara, Rika;Homma, Takayuki

JOURNAL OF THE ELECTROCHEMICAL SOCIETY 162(9) p.D444 - D4482015-2015

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ISSN:0013-4651

Electrochemical Processes for the Fabrication of Functional Micro–nano Structures and Devices: Mechanistic Understanding and Process Development

HOMMA Takayuki

Electrochemistry 83(9) p.680 - 6872015-2015

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ISSN:1344-3542

Outline:Electrochemical approaches for the fabrication of functional micro–nano structures and devices were comprehensively described primarily on the basis of the results obtained from previous studies conducted by the author's group with the aim of demonstrating the potential for achieving further precise controllability. First, a theoretical study was conducted for investigating the processes, mainly focusing upon electroless deposition to present an approach for analyzing its reaction mechanism from the molecular level. These approaches could be powerful tools for elucidating the overall process and could contribute toward achieving the precise design of processes. Second, some experimental approaches for achieving the precise control of micro–nano fabrication of functional structures, such as maskless and electroless fabrication of metal nano-patterns, lateral enhanced electrodeposition to form ultrathin layers, as well as the nanostructures for various devices by through-mask electrochemical deposition, were introduced to demonstrate high capability of the processes for nanoscale fabrication in various applications.

Electrochemical quartz crystal microbalance, X-ray photoelectron spectroscopy, and Raman spectroscopy analysis of SiCl4 reduction in ionic liquids

Tsuyuki, Yasuhiro; Pham Huynh, Tram Anh; Komadina, Jason; Fukunaka, Yasuhiro; Fukunaka, Yasuhiro; Homma, Takayuki; Homma, Takayuki; Homma, Takayuki

Electrochimica Acta 2014/11-2014/11

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ISSN:00134686

Outline:© 2015. The reaction mechanism of Si electrodeposition in the ionic liquid trimethyl-n-hexylammonium bis(trifluoromethylsulfonyl) imide (TMHATFSI) with SiCl4 was investigated using an electrochemical quartz crystal microbalance (EQCM) and X-ray photoelectron spectroscopy (XPS). The deposited films were further characterized by Raman spectroscopy. The EQCM method measured the frequency change in situ during electrodeposition, whereas XPS provided the Si mass concentration in the electrodeposited films. By combining these results, the mass change due to SiCl4 reduction was estimated. Then, the current efficiency for Si electrodeposition at various potentials was evaluated. The calculated current efficiency was almost 100% when it was assumed that SiCl4 reduction progressed by four-electron electroreduction. The XPS and Raman results showed that the deposited films were composed primarily of amorphous Si with Si-Si bonds. Crystalline Si thin films were obtained after annealing in an Ar gas stream.

Boron extraction with 2-ethyl-1,3-hexanediol using a microchannel device for high-purity source of solar-grade silicon

Matsuo, Nobufumi; Matsui, Yuki; Fukunaka, Yasuhiro; Fukunaka, Yasuhiro; Homma, Takayuki; Homma, Takayuki; Homma, Takayuki

Journal of the Electrochemical Society 161(5) p.E93 - E962014/01-2014/01

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ISSN:00134651

Outline:A novel approach toward the purification of silica and removal of boron impurities via solvent extraction with 2-ethyl-1,3-hexanediol using a microchannel device is presented. The microchannel, fabricated on Si substrates using lithographic techniques, had 100 μm width, 100 μm depth, and 10 mm length. Amorphous silica spiked with a trace amount of boric acid and refined diatomaceous earth used as silica feedstock were purified. Residual boron content was determined by inductively coupled argon plasma atomic emission spectrometry. Following extraction using a microchannel device, the residual boron content was less than 1.0 ppm for the former silica feedstock and than 2.5 ppm for the latter one, and the contact reaction period was 0.03 seconds for both type of silica feedstock. These are lower and significantly shorter due to much shorter diffusion distance and much larger specific interfacial area as compared to those observed when using a conventional separatory funnel, for both types of silica feedstock. Hence, it is suggested that microchannel devices can be utilized as an attractive approach toward the production of high-purity silica as a source for solar-grade silicon. © 2014 The Electrochemical Society. All rights reserved.

Kinetic Characteristics of Electrochemical Reduction of SiO2 Granules in Molten CaCl2

X. Yang, K. Yasuda, T. Nohira, R. Hagiwara, T. Homma

J. Electrochem. Soc. (161 (7)) p.D3116 - D31192014-

Boron Extraction with 2-Ethyl-1,3-hexanediol Using a Microchannel Device for High-Purity Source of Solar-Grade Silicon

Matsuo, Nobufumi;Matsui, Yuki;Fukunaka, Yasuhiro;Homma, Takayuki

JOURNAL OF THE ELECTROCHEMICAL SOCIETY 161(5) p.E93 - E962014-2014

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ISSN:0013-4651

Kinetic Characteristics of Electrochemical Reduction of SiO2 Granules in Molten CaCl2

Yang, Xiao;Yasuda, Kouji;Nohira, Toshiyuki;Hagiwara, Rika;Homma, Takayuki

JOURNAL OF THE ELECTROCHEMICAL SOCIETY 161(7) p.D3116 - D31192014-2014

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ISSN:0013-4651

Reaction Behavior of Stratified SiO2 Granules during Electrochemical Reduction in Molten CaCl2

Yang, Xiao;Yasuda, Kouji;Nohira, Toshiyuki;Hagiwara, Rika;Homma, Takayuki

METALLURGICAL AND MATERIALS TRANSACTIONS B-PROCESS METALLURGY AND MATERIALS PROCESSING SCIENCE 45(4) p.1337 - 13442014-2014

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ISSN:1073-5615

Foreword

Walter Hassel, Achim; Homma, Takayuki

Electrochimica Acta 1132013/12-2013/12

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ISSN:00134686

Theoretical analysis of the influence of surface defects on the reactivity of hypophosphite ions

Kunimoto, Masahiro; Otomo, Akira; Takahashi, Nana; Nakai, Hiromi; Homma, Takayuki

Electrochimica Acta 113p.785 - 7912013/12-2013/12

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ISSN:00134686

Outline:To elucidate the influence of surface defects, such as steps, on the oxidation of a reducing agent that is used in the electroless deposition process, we theoretically analyzed the reaction behavior of hypophosphite ion around the defect using density functional theory calculations. The reason why we chose the hypophosphite ion is that it is a typical reducing agent and reacts through a universal reaction mechanism. In this analysis, we focused on the dehydrogenation reaction, which is the rate-determining step in the oxidation pathway. Pd and Cu surfaces were chosen as the metal surfaces, because they exhibit completely different catalytic activity from each other, both experimentally and theoretically. Our calculations showed that the surface defect stabilized the final state of dehydrogenation on both Pd and Cu surfaces, which indicates that the defect accelerates the oxidation of the hypophosphite ion. In the final state of dehydrogenation, dissociated hydrogen adsorbs on the hollow site, which appears on the slope of the defect. More detailed analyses of the final state indicate that the stabilization effect by the surface defect originates from the highly efficient interactions between the dissociated hydrogen and the slope. The molecular orbital structure on this slope is distorted, which leads to high electron density around the slope that enables the highly efficient interactions between the hydrogen and the slope. © 2013 Elsevier Ltd.

Characterization and analysis of deposition behavior of ultra-high density ferromagnetic nanodot arrays fabricated by electrochemical processes

WODARZ Siggi;MANIWA Yuta;HAGIWARA Hiroki;OTANI Tomohiro;NISHIIE Daiki;ZANGARI Giovanni;HOMMA Takayuki

IEICE technical report. Magnetic recording 113(297) p.7 - 102013/11-2013/11

CiNii

Detail

ISSN:0913-5685

Outline:We fabricated hcp-Co_<80>Pt_<20> and L1_0-FePt thin films and nanodot arrays onto hcp-Ru (002) / Si substrate by electrodeposition and lithography processes. The effect of applied potential and diameter of the nanodot on deposition behavior of Co-Pt was analyzed in order to control the deposition of Co-Pt. By using electron beam lithography, nanodot patterns with 10 nm diameter and 18 nm pitch were uniformly fabricated. It was suggested that the particle size of Co-Pt could be controlled by the applied potential, and in the case of relatively positive applied potential of -400 mV and -500 mV vs Ag / AgCl, progressive nucleation preferentially occurred to increase the size of each Co-Pt particle. The phase transformation from fcc-Fe-Pt to L1_0 Fe-Pt was observed by annealing at 650℃, and Fe-Pt films with perpendicular coercivity of 9.0 kOe and 9.8 kOe with a thickness of 10 nm and 25 nm were obtained. In addition, Fe-Pt nanodot arrays having a pitch and a diameter of 100 nm and 35 nm were successfully fabricated by UV-nanoimprint lithography.

Nanoindentation analysis for mechanical properties of electroless NiP imprinting mold replicated from self-assembled-monolayer modified master mold

Lin, Cheng Ping; Saito, Mikiko; Homma, Takayuki; Homma, Takayuki

Japanese Journal of Applied Physics 52(11 PART 1) 2013/11-2013/11

DOIScopus

Detail

ISSN:00214922

Outline:A NiP imprinting mold with patterns, whose size is from nanometer to submicrometer (170, 500, and 1000nm diameter), was fabricated by electroless deposition of NiP on a 3-aminopropyltriethoxysilane (APTES) modified master mold. The NiP deposit as a replicate mold was then detached from the master mold. The initial NiP deposition in patterns of the master mold was investigated; moreover, nanoindentation was successfully performed on a single NiP pattern for investigating the hardness. The NiP had a similar grain size in different sizes of patterns of the master mold during the initial deposition, as well as the same hardness of the NiP patterns (approximately 12 GPa) was observed. These results indicated that the initial NiP deposition and hardness of NiP were not size dependent above 170 nm. The surface morphology of the NiP detached from the master mold and NiP pattern of different sizes were investigated as well. © 2013 The Japan Society of Applied Physics.

Fabrication of electroless NiP nanoimprinting mold by replication of uv-treated and self-assembled-monolayer-modified cyclo-olefin polymer nanopatterns

Lin, Cheng Ping; Saito, Mikiko; Homma, Takayuki; Homma, Takayuki

Electrochemistry 81(9) p.678 - 6812013/09-2013/09

DOIScopus

Detail

ISSN:13443542

Outline:An electroless NiP imprinting mold was fabricated through replication of a cyclo-olefin polymer (COP) master mold. The NiP was electrolessly deposited on a nanopatterned COP master mold, pretreated by ultraviolet (UV) irradiation prior to modification with 3-aminopropyltriethoxysilane (APTES). The NiP deposit as a "replicate" was then detached from the COP master mold. Additionally, by optimizing the UV irradiation period, APTES could be formed on the COP master mold for electroless deposition without disturbing the nanopattern geometry of the COP master mold. The water contact angle and surface morphology of the COP surface, and the adhesion strength between deposited NiP and the COP surface were investigated. © 2013 The Electrochemical Society of Japan, All rights reserved.

Raman and DFT study of the reaction of hydrazine and hypophosphite on a Cu surface in the electroless deposition process

Jiang, Bin; Wodarz, Siggi; Kunimoto, Masahiro; Yanagisawa, Masahiro; Homma, Takayuki; Homma, Takayuki

Electrochemistry 81(9) p.674 - 6772013/09-2013/09

DOIScopus

Detail

ISSN:13443542

Outline:Oxidation of the reductants is a dominant factor in the electroless deposition process. In order to obtain fundamental knowledge about the reaction mechanism of reductant oxidation for more precise control of the solid-liquid interface in this process, we have attempted to characterize the behavior of reductants adsorbed on Cu surface by using plasmon antenna enhanced Raman scattering. The concentric-patterned antenna coated with Cu, which consisted of a dimple array with single hole or a single hole with coaxial dimples, was designed by Finite Difference Time Domain (FDTD) calculation to enhance the electric field by focusing surface plasmons. By using this antenna and comparing the spectra to the results of Density Functional Theory (DFT) calculations, Raman peaks of adsorbed reductants on Cu were identified. Furthermore, we examined the conformation of adsorbed reductants by DFT calculation of the adsorption model of reductants on fcc-Cu(111) surface. As a result, the nature of reductant adsorption on Cu surface has been investigated from a computational point of view and an experimental point of view, and such in-situ characterization will be useful for analysis of a variety of systems at solid-liquid interface. © 2013 The Electrochemical Society of Japan, All rights reserved.

Effect of thiourea on oxidation of hypophosphite ions on Ni surface investigated by raman spectroscopy and DFT calculation

Jiang, Bin; Kunimoto, Masahiro; Yanagisawa, Masahiro; Homma, Takayuki; Homma, Takayuki

Journal of the Electrochemical Society 160(9) p.D366 - D3712013/08-2013/08

DOIScopus

Detail

ISSN:00134651

Outline:Thiourea is well known and widely used additive for controlling the rate of electroless Ni deposition, and it is known to show complicated behavior in acidic/alkaline electroless deposition baths. To understand this, several experiments and theoretical calculations were performed. In the experiments, the adsorption of thiourea and the reducing agent (i.e., hypophosphite ions) on a Ni surface was characterized with a high-selectivity component at a right angle down to the sub-monolayer level using surface-enhanced Raman spectroscopy. By comparing the results with those obtained from the theoretical calculation, co-adsorption of thiourea and hypophosphite ions on the Ni surface was confirmed. Moreover, the acceleration or suppression effects of thiourea on the oxidation of hypophosphite ions on a Ni surface in acidic/alkaline bath were analyzed from the experimental and computational perspectives. Accordingly, an explanation that unifies both the acceleration and suppression mechanisms of thiourea in terms of its own fundamental characteristics is proposed; this will be one of the most important processes for industrial applications of electroless Ni deposition. © 2013 The Electrochemical Society. All rights reserved.

Characterization and analysis of deposition process of ultra-high density magnetic nanodot arrays fabricated by electrochemical processes

Wodarz Siggi;Maniwa Yuta;Hagiwara Hiroki;Homma Takayuki

IEICE technical report. Magnetic recording 113(127) p.13 - 172013/07-2013/07

CiNii

Detail

ISSN:0913-5685

Outline:We have been fabricating ferromagnetic nanodot arrays for bit patterned media (BPM) by using lithography techniques and electrochemical processes. In this research, we attemped to fabricate hcp-Co-Pt(002) and L10-Fe-Pt thin films and nanodot arrays with high coercivity. Nano-patterns were formed by electron beam lithography (EBL) and Co-Pt and Fe-Pt were electrodeposited into the nano-patterns. For obtaining Co-Pt thin films and nanodot arrays with high perpendicular coercivities, we applied hcp-Ru(002) intermediate layer on Si substrate. As a result, the magnetic properties and the crystallinities of Co-Pt thin films and nanodot arrays were improved by using Ru(002) layer, and Co-Pt nanodot arrays with 10 nm diameters and 18 nm pitches were observed. Investigation of initial deposition suggested that the particle size of Co-Pt can be controlled by changing the applied potential. The phase transformation from fcc-Fe-Pt to L1_0-Fe-Pt was verified by annealing, and the coercivities of Fe-Pt were improved.

Analysis of hydrazine on a Cu surface with nanoscale resolution using surface enhanced Raman spectroscopy

Jiang, Bin; Ouchi, Takanari; Shimano, Naofumi; Otomo, Akira; Kunimoto, Masahiro; Yanagisawa, Masahiro; Homma, Takayuki; Homma, Takayuki

Electrochimica Acta 100p.317 - 3202013/06-2013/06

DOIScopus

Detail

ISSN:00134686

Outline:This paper described characterization of hydrazine adsorption on Cu surface with high-selectivity of component at right angle down to single molecular level using a plasmonic antenna enhancing Raman scattering. The antenna deposited by Cu with concentric pattern was designed by Finite Difference Time Domain (FDTD) calculation to enhance the electric field by focusing surface plasmon. By using this antenna, Raman peaks of adsorbed hydrazine on Cu was provided at 385 cm-1. Furthermore, these peaks were only observed at 1-2 nm from the antenna surface which meant that this approach had a potential to define the structure of adsorbed hydrazine just only on the plasmon antenna. The structure of adsorbed hydrazine was gauche-conformation. This data corresponded to the Density Functional Theory (DFT) of adsorption model of hydrazine on fcc-Cu (1 1 1) surface. These results suggest that this method creates a wide range of spin-off effects to the characterization of solid-liquid interface. © 2012 Elsevier Ltd.

Acceleration effect of thiourea on the oxidation reaction of hypophosphite ion on Ni surface

Kunimoto, Masahiro; Endo, Kazuaki; Nakai, Hiromi; Homma, Takayuki

Electrochimica Acta 100p.311 - 3162013/06-2013/06

DOIScopus

Detail

ISSN:00134686

Outline:The acceleration effect of thiourea on an electroless Ni deposition reaction was analyzed through experimental and theoretical approaches. In the experimental approach, the entire deposition process was physically separated into the anodic and the cathodic reactions by preparing two cells connected by a salt bridge. The cells contained either a bath without metal (Ni) ions or a bath without a reducing agent (hypophosphite ions). The current flowing between the two separated baths increased when thiourea was added only to the anodic reaction bath, which indicated that the acceleration effect of thiourea was mainly on the anodic reaction of the hypophosphite ions. Based on this experimental result, in the theoretical calculation approach, a co-adsorption system consisting of thiourea, hypophosphite, and a Ni metal surface was analyzed using density functional theory. Among all the elementary steps of a hypophosphite reaction, thiourea primarily should promote the adsorption step owing to the following two factors. One was the molecular interaction between thiourea and the hypophosphite ion. The other was the restructuring of the electronic states of the Ni surface owing to the adsorption of thiourea, which enhanced the interaction between hypophosphite and its adsorption site on the Ni surface. © 2012 Elsevier Ltd.

Foreword

Moffat, Thomas P.; Hagiwara, Rika; Homma, Takayuki; Fukunaka, Yasuhiro

Electrochimica Acta 100p.212 - 2132013/06-2013/06

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ISSN:00134686

Electrochemical quartz crystal microbalance study of Si electrodeposition in ionic liquid

Komadina, J.; Komadina, J.; Akiyoshi, T.; Ishibashi, Y.; Fukunaka, Y.; Fukunaka, Y.; Fukunaka, Y.; Homma, T.; Homma, T.

Electrochimica Acta 100p.236 - 2412013/06-2013/06

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Detail

ISSN:00134686

Outline:The electrodeposition of silicon from silicon tetrachloride in the hydrophobic room temperature ionic liquid trimethyl-n-hexyl ammonium bis-(trifluoromethylsulfonyl) imide was investigated by cyclic voltammetry and chronoamperometry. In situ electrochemical quartz crystal microbalance (EQCM) impedance spectroscopy was used to estimate the mass of films during deposition. The charge efficiency estimated from EQCM measurements is ∼190-250% for four-electron silicon reduction. However, compositional analysis by XPS shows that the EQCM current efficiency estimates are artificially high due to ionic liquid inclusion in the films. Taking the mass concentration of impurities into account, the best-case estimate of current efficiency is found to be approximately 130% for constant potential deposition, suggesting silicon may not have been completely reduced at the potentials investigated, or a chemical reaction step occurs. We also consider that the EQCM analysis may include too many deviations from assumptions for accurate estimation of mass with the conditions studied. © 2012 Elsevier Ltd.

Fabrication of nanogap electrodes by enhancing lateral growth of Au electrodeposition for electrical property measurement of organic nanowires

Kobayashi, Chiaki; Wakayama, Yutaka; Shirai, Yasuhiro; Homma, Takayuki

Electrochemistry 81(4) p.236 - 2382013/04-2013/04

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Detail

ISSN:13443542

Outline:We demonstrated fabrication of nanogap electrodes with flat and thin Au films by using laterally enhanced growth of Au electrodeposition and applied the electrodes for electrical measurement of poly(3-methylthiophene) (P3MT) nanowires. The Au electrodeposition was performed on microgap electrodes following an organic modification process on an insulator surface of the microgap electrodes. Then, P3MT nanowires were aligned between the nanogap electrodes for transistor property measurement. The result suggested that the fabricated nanogap electrodes were suitable to apply for electrical properties measurement of such organic nanowires because of small difference in height between top of the electrodes and the insulator surface. © The Electrochemical Society of Japan, All rights reserved.

Electrochemical quartz crystal microbalance study of Si electrodeposition in ionic liquid

J. Komadina, T. Akiyoshi, Y. Ishibashi, Y. Fukunaka, T. Homma

Electrochim. Acta (100) p.236 - 2412013-

Theoretical analysis of the influence of surface defects on the reactivity of hypophosphite ions

M. Kunimoto, A. Otomo, N. Takahashi, H. Nakai, T. Homma

Electrochim. Acta (113) p.785 - 7912013-

Effect of Thiourea on Oxidation of Hypophosphite Ions on Ni Surface Investigated by Raman Spectroscopy and DFT Calculation

B. Jiang, M. Kunimoto, M. Yanagisawa, T. Homma

J. Electrochem. Soc. (160 (9)) p.D366 - D3712013-

Photocurrent Conversion in Anodized TiO2 Nanotube Arrays: Effect of the Water Content in Anodizing Solution

L-K. Tsui, T. Homma, G. Zangari

J. Phys. Chem. C (117) p.6979 - 69892013-

Acceleration effect of thiourea on the oxidation reaction of hypophosphite ion on Ni surface

M. Kunimoto, K. Endo, H. Nakai, T. Homma

Electrochim. Acta (100) p.311 - 3162013-

Fabrication of Nanogap Electrodes by Enhancing Lateral Growth of Au Electrodeposition for Electrical Property Measurement of Organic Nanowires

Kobayashi, Chiaki;Wakayama, Yutaka;Shirai, Yasuhiro;Homma, Takayuki

ELECTROCHEMISTRY 81(4) p.236 - 2382013-2013

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Detail

ISSN:1344-3542

Photocurrent Conversion in Anodized TiO2 Nanotube Arrays: Effect of the Water Content in Anodizing Solutions

Tsui, Lok-kun;Homma, Takayuki;Zangari, Giovanni

JOURNAL OF PHYSICAL CHEMISTRY C 117(14) p.6979 - 69892013-2013

DOIWoS

Detail

ISSN:1932-7447

Special Section: RENEWABLE ENERGY AND MATERIALS TAILORING Foreword

Moffat, Thomas P.;Hagiwara, Rika;Homma, Takayuki;Fukunaka, Yasuhiro

ELECTROCHIMICA ACTA 100p.212 - 2132013-2013

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Detail

ISSN:0013-4686

Acceleration effect of thiourea on the oxidation reaction of hypophosphite ion on Ni surface

Kunimoto, Masahiro;Endo, Kazuaki;Nakai, Hiromi;Homma, Takayuki

ELECTROCHIMICA ACTA 100p.311 - 3162013-2013

DOIWoS

Detail

ISSN:0013-4686

Analysis of hydrazine on a Cu surface with nanoscale resolution using surface enhanced Raman spectroscopy

Jiang, Bin;Ouchi, Takanari;Shimano, Naofumi;Otomo, Akira;Kunimoto, Masahiro;Yanagisawa, Masahiro;Homma, Takayuki

ELECTROCHIMICA ACTA 100p.317 - 3202013-2013

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Detail

ISSN:0013-4686

Electrolytic Reduction of SiO2 Granules in Molten CaCl2

Toba, Tetsuya;Yasuda, Kouji;Nohira, Toshiyuki;Yang, Xiao;Hagiwara, Rika;Ichitsubo, Koki;Masuda, Kenta;Homma, Takayuki

ELECTROCHEMISTRY 81(7) p.559 - 5652013-2013

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Detail

ISSN:1344-3542

Raman and DFT Study of the Reaction of Hydrazine and Hypophosphite on a Cu Surface in the Electroless Deposition Process

Jiang, Bin;Wodarz, Siggi;Kunimoto, Masahiro;Yanagisawa, Masahiro;Homma, Takayuki

ELECTROCHEMISTRY 81(9) p.674 - 6772013-2013

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Detail

ISSN:1344-3542

Fabrication of Electroless NiP Nanoimprinting Mold by Replication of UV-treated and Self-assembled-monolayer-modified Cyclo-olefin Polymer Nanopatterns

Lin, Cheng Ping;Saito, Mikiko;Homma, Takayuki

ELECTROCHEMISTRY 81(9) p.678 - 6812013-2013

DOIWoS

Detail

ISSN:1344-3542

Effect of Thiourea on Oxidation of Hypophosphite Ions on Ni Surface Investigated by Raman Spectroscopy and DFT Calculation

Jiang, Bin;Kunimoto, Masahiro;Yanagisawa, Masahiro;Homma, Takayuki

JOURNAL OF THE ELECTROCHEMICAL SOCIETY 160(9) p.D366 - D3712013-2013

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Detail

ISSN:0013-4651

Nanoindentation Analysis for Mechanical Properties of Electroless NiP Imprinting Mold Replicated from Self-Assembled-Monolayer Modified Master Mold

Lin, Cheng Ping;Saito, Mikiko;Homma, Takayuki

JAPANESE JOURNAL OF APPLIED PHYSICS 52(11) 2013-2013

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Detail

ISSN:0021-4922

Special Section: ELECTROCHEMICAL MICRO & NANO-SYSTEMS TECHNOLOGY Selection of papers from the 9th International Symposium (EMNT 2012) 15-17 August 2012, Linz, Austria Foreword

Hassel, Achim Walter;Homma, Takayuki

ELECTROCHIMICA ACTA 113p.719 - 7192013-2013

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Detail

ISSN:0013-4686

Theoretical analysis of the influence of surface defects on the reactivity of hypophosphite ions

Kunimoto, Masahiro;Otomo, Akira;Takahashi, Nana;Nakai, Hiromi;Homma, Takayuki

ELECTROCHIMICA ACTA 113p.785 - 7912013-2013

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Detail

ISSN:0013-4686

Measurement Technology for Hard Disk Interface:Application of Plasmonic Sensor : A Challenge to Sub-nanometer Scale

YANAGISAWA Masahiro;SAITO Mikiko;HOMMA Takayuki

112(294) p.1 - 42012/11-2012/11

CiNii

Measurement Technology for Hard Disk Interface : Application of Plasmonic Sensor-A Challenge to Sub-nanometer Scale-

YANAGISAWA Masahiro;SAITO Mikiko;HOMMA Takayuki

IEICE technical report. Magnetic recording 112(294) p.1 - 42012/11-2012/11

CiNii

Detail

ISSN:0913-5685

Outline:Chemical structure of ultra-thin lubricant film/DLC overcoat for 4Tbpsi and more was measured with plasmonic sensor and surface-enhanced Raman scattering spectroscopy. Depth profile of the chemical structure for the film system was also measured with a depth resolution of 0.1nm.

Initial catalyzation analysis of electroless NiP nanoimprinting mold replicated from self-assembled monolayer modified nanopatterns

Lin, Cheng Ping; Saito, Mikiko; Homma, Takayuki; Homma, Takayuki

Electrochimica Acta 82p.75 - 812012/11-2012/11

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Detail

ISSN:00134686

Outline:A nanoimprint lithography mold was fabricated through electroless deposition combined with self-assembled monolayer (SAM) modification. To copy nanopatterns as "replicates", NiP was electrolessly deposited on a nanopatterned master mold (made of SiO 2/Si), whose surface was modified with 3-[2-(2-aminoethylamino)ethylamino]propyltrimethoxysilane (TAS). NiP deposits were then manually detached from the mold. SAM improves Pd catalyst coverage for electroless deposition, further improving the morphology of the electroless deposition of NiP on the nanopatterned master mold and controlling the adhesion strength between electroless deposited NiP and the nanopatterned master mold to a level appropriate for smooth detachment. The initial catalyzation process and mechanical properties (such as, the hardness and adhesion strength of the SiO 2 substrate) of electroless deposited NiP were also systematically investigated. © 2012 Elsevier Ltd.

Electrochemical potential measurement and finite element structure analysis of Si wafer surface under mechanical stress

Sakata, Kaoruho; Homma, Takayuki

Electrochemistry Communications 25(1) p.144 - 1462012/11-2012/11

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Detail

ISSN:13882481

Outline:Mechanical stress was applied to a Si single crystal wafer to evaluate the changes in its surface properties arising from the lattice strain induced by mechanical stress. The stress was applied quantitatively to the wafer in order to investigate the correlation between the degree of strain and the electrochemical properties of its surface. Finite element method (FEM) structural analysis was used to estimate the degree of strain on the surface, and the open circuit potential was measured in order to investigate the surface electrochemical properties. The analysis suggested that the surface of the wafer was under tensile strain, and the open circuit potential shifted toward the negative direction with the strain. This indicates that mechanical stress applied to a Si surface can change its electronic properties by changing the surface crystal structure. © 2012 Elsevier B.V.

Laterally enhanced growth of electrodeposited Au to form ultrathin films on nonconductive surfaces

Kobayashi, Chiaki; Saito, Mikiko; Homma, Takayuki; Homma, Takayuki

Electrochimica Acta 74p.235 - 2432012/07-2012/07

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Detail

ISSN:00134686

Outline:We investigated the laterally enhanced growth of electrodeposited Au for fabricating nanogap electrodes. To enhance the lateral growth, we carried out electrodeposition over patterned electrodes onto a SiO 2 surface modified with self-assembled monolayers (SAMs) or dendrimers with amine groups. The morphology and thickness of the Au films were controlled by adjusting deposition conditions such as duration, applied potential, and Au ion concentration in the bath. To investigate the mechanism of the laterally enhanced growth, the surface states of SAM- or dendrimer-modified SiO 2 were analyzed by X-ray photoelectron spectroscopy (XPS). The XPS results indicate the existence of organic molecules and Au ions on the SiO 2 surface, which suggests that laterally enhanced growth is induced by the Au ions coordinated on the amine groups of the organic molecules. To further analyze the mechanism of the laterally enhanced growth, we investigated the relationship between the morphology of the laterally enhanced growth of Au and the amount of Au ions on organic molecules. The laterally enhanced growth of Au is expected to be useful for fabricating thin film nanogap electrodes. © 2012 Elsevier Ltd.

Electrochemical fabrication processes for functional micro and nano scale structures

HOMMA Takayuki

81(5) p.406 - 4092012/05-2012/05

CiNii

Detail

ISSN:03698009

Steps Going Forward

HOMMA Takayuki

63(5) 2012/05-2012/05

CiNii

Detail

ISSN:09151869

Theoretical analysis of adsorption structure of hydrated hypophosphite Ion on Pd (111) surface

Kunimoto, Masahiro; Seki, Kenji; Nakai, Hiromi; Homma, Takayuki

Electrochemistry 80(4) p.222 - 2252012/04-2012/04

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Detail

ISSN:13443542

Outline:The influence of water molecules on the reaction behavior of hypophosphite ion, which acts as a reducing agent for electroless deposition, on metal surfaces was elucidated by calculating the adsorption structure of hydrated hypophosphite ion on a Pd surface using Monte-Carlo simulation and density functional theory calculations. Through geometrical optimization, the most favorable structure of the hydrated hypophosphite ion was obtained, in which six water molecules interact with the oxygen of hypophosphite ion and no water interacts with the hydrogen of hypophosphite ion. Further calculations indicated that the hydrated hypophosphite ion adsorbed on the Pd surface via hvdroaen. © The Electrochemical Society of Japan,.

Theoretical analysis of catalytic activity of metal surfaces on reaction of hypophosphite ion

Kunimoto, Masahiro; Nakai, Hiromi; Homma, Takayuki

Electrochemistry 80(3) p.126 - 1312012/03-2012/03

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Detail

ISSN:13443542

Outline:To elucidate the mechanism of catalytic activity of metal surfaces on the reaction of hypophosphite ions, which act as a reducing agent for electroless deposition, molecular orbital interactions between hypophosphite ions and metal surfaces were analyzed using density functional theory. Pd (111) and Cu (111) were chosen as the surfaces with high and low catalytic activity, respectively. The electronic states of adsorption systems were analyzed using the Mulliken population analysis. The position of the d-band plays a key role in determining the catalytic activity on P-H bond cleavage of hypophosphite. The Pd surface has a d-band near the Fermi level and contains a vacancy; this enables the donation and back-donation effect to occur on the adsorbed hypophosphite and promotes P-H bond cleavage. On the other hand, the Cu surface has a d-band in the deep energy area and contains no vacancy; the donation and back-donation effect is not induced and P-H bond cleavage is not promoted. This difference in the degree of promotion of P-H cleavage is responsible for the difference in the catalytic activity on P-H cleavage and dehydrogenation of hypophosphite ions, which in turn explains the difference in the catalytic activity during the entire hypophosphite oxidation process. © The Electrochemical Society of Japan. All rights reserved.

Electrochemical potential measurement and finite element structure analysis of Si wafer surface under mechanical stress

K. Sakata, T. Homma

Electrochem. Commun. (25) p.144 - 1462012-

Initial catalyzation analysis of electroless NiP nanoimprinting mold replicated from self-assembled monolayer modified nanopatterns

C-P. Lin, M. Saito, T. Homma

Electrochim. Acta (82) p.75 - 812012-

Laterally enhanced growth of electrodeposited Au to form ultrathin films on nonconductive surfaces

C. Kobayashi, M. Saito, T. Homma

Electrochim. Acta (74) p.235 - 2432012-

Theoretical Analysis of Adsorption Structure of Hydrated Hypophosphite Ion on Pd (111) Surface

M. Kunimoto, K. Seki, H. Nakai, T. Homma

Electrochemistry (80(4)) p.222 - 2252012-

Theoretical Analysis of Catalytic Activity of Metal Surfaces on Reaction of Hypophosphite Ion

Kunimoto, Masahiro;Nakai, Hiromi;Homma, Takayuki

ELECTROCHEMISTRY 80(3) p.126 - 1312012-2012

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Detail

ISSN:1344-3542

Theoretical Analysis of Adsorption Structure of Hydrated Hypophosphite Ion on Pd (111) Surface

Kunimoto, Masahiro;Seki, Kenji;Nakai, Hiromi;Homma, Takayuki

ELECTROCHEMISTRY 80(4) p.222 - 2252012-2012

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Detail

ISSN:1344-3542

Laterally enhanced growth of electrodeposited Au to form ultrathin films on nonconductive surfaces

Kobayashi, Chiaki;Saito, Mikiko;Homma, Takayuki

ELECTROCHIMICA ACTA 74p.235 - 2432012-2012

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Detail

ISSN:0013-4686

Initial catalyzation analysis of electroless NiP nanoimprinting mold replicated from self-assembled monolayer modified nanopatterns

Lin, Cheng Ping;Saito, Mikiko;Homma, Takayuki

ELECTROCHIMICA ACTA 82p.75 - 812012-2012

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Detail

ISSN:0013-4686

Electrochemical potential measurement and finite element structure analysis of Si wafer surface under mechanical stress

Sakata, Kaoruho;Homma, Takayuki

ELECTROCHEMISTRY COMMUNICATIONS 25p.144 - 1462012-2012

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Detail

ISSN:1388-2481

State-of-the-art Plating Technologies : Processes and Perspective

HOMMA Takayuki

Journal of the Japan Society of Precision Engineering 78(12) p.1021 - 10242012-2012

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Detail

ISSN:0912-0289

Quantum Chemical Analysis of Electroless Deposition Processes

KUNIMOTO Masahiro;HOMMA Takayuki

Jitsumu Hyomen Gijutsu 62(12) p.657 - 6622011/12-2011/12

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Detail

ISSN:09151869

CoNiP electroless deposition process for fabricating ferromagnetic nanodot arrays

Ouchi, Takanari; Shimano, Naofumi; Homma, Takayuki

Electrochimica Acta 56(26) p.9575 - 95802011/11-2011/11

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Detail

ISSN:00134686

Outline:An electroless deposition process for fabricating CoNiP nanodot arrays (less than 50 nm in height) with high magnetic coercivities was investigated. To fabricate such nanostructures, we improved the crystallinity of the CoNiP deposits in the initial deposition stage by applying an fcc-Cu(1 1 1) underlayer with low lattice mismatch to hcp-Co(0 0 0 2), and an autocatalytic electroless deposition process at the Cu surface was carried out by using dual reducing agents, H2PO2 - and N2H4. CoNiP films demonstrated high perpendicular magnetic coercivities in the initial deposition stage since the highly crystalline hcp(0 0 0 2) CoNiP layers were grown parallel to the Cu underlayers. Nanopatterned substrates were formed by UV-nanoimprint lithography. CoNiP was electroless deposited on the nanopatterned substrates. As a result, CoNiP was deposited selectively from the bottom of the nanopores with few defects in a large area. Perpendicular coercivities higher than 3000 Oe were obtained for nanodots even with heights of 50 nm. Thus, an electroless deposition process that can be used to form nanostructures with high crystallinities in the initial stage without any anomalous deposition was demonstrated. © 2011 Elsevier Ltd. All rights reserved.

S165011 Molecular structure analysis on magnetic disk surface with plasmonic sensor

YANAGISAWA Masahiro;SAITO Mikiko;HOMMA Takayuki

Mechanical Engineering Congress, Japan 2011p."S165011 - 1"-"S165011-5"2011/09-2011/09

CiNii

Detail

Outline:Ultra-thin DLC films and lubricant films are requested for high density magnetic recording. It was difficult for Raman spectroscopy to measure their molecular structures because of its low sensitivity. Newly-developed plasmonic sensor successfully acquired Raman spectrum of DLC films or lubricant/DLC interfaces with sub-nanometer thickness. Crystal structure of ultra-thin DLC films were slightly changed compared with that of thick films. Specifically, a graphite-like structure increases with decreasing thickness. It was found that organic and inorganic contaminations exist on a magnetic layer or a magnetic layer/DLC interface. According to the Raman spectrum analysis, a feature of adsorbed lubricant molecules of lubricant on the DLC film was confirmed.

Density functional theory analysis of reaction mechanism of hypophosphite ions on metal surfaces

Kunimoto, Masahiro; Shimada, Takuya; Odagiri, Shuichi; Nakai, Hiromi; Homma, Takayuki

Journal of the Electrochemical Society 158(9) p.D585 - D5892011/08-2011/08

DOIScopus

Detail

ISSN:00134651

Outline:The elementary steps of the reactions of hypophosphite ions with Cu, Ni, and Pd were calculated theoretically using Density Functional Theory (DFT) to demonstrate the reaction mechanism and gain insight at the molecular level. The elementary steps of these reactions are adsorption, dehydrogenation, and oxidation (hydroxyl base attack). In the adsorption step, hypophosphite ions adsorb onto each surface spontaneously with stabilities in the order of Ni (111) > Pd (111) > Cu (111). In the dehydrogenation step, hypophosphite ions dehydrogenate on Ni (111) and Pd (111) with small reaction barriers, whereas they react on Cu (111) with a large reaction barrier. The large reaction barrier on Cu (111) is not compensated for by the adsorption energy on the surface. In the oxidation step, dehydrogenated anions on each metal surface react spontaneously with the hydroxyl base. The reaction barriers on each metal surface in this step are not so significant compared to the adsorption energies on each surface, suggesting that a reaction barrier of hypophosphite ion oxidation should exist in the dehydrogenation step and only be observed for Cu (111). This proposition elucidates the experimental catalytic behaviors of metal surfaces in the electroless deposition process using hypophosphite ions. © 2011 The Electrochemical Society.

Density functional theory analysis for orbital interaction between hypophosphite ions and metal surfaces

Kunimoto, Masahiro; Nakai, Hiromi; Homma, Takayuki

Journal of the Electrochemical Society 158(10) p.D626 - D6332011/08-2011/08

DOIScopus

Detail

ISSN:00134651

Outline:In order to elucidate the reactivity difference of hypophosphite ions used as reducing agents for electroless deposition on different metal surfaces, such as Pd and Cu, electronic structures of the activation states of hypophosphite ion oxidation on these surfaces were intensively analyzed by using Density Functional Theory (DFT). In the calculation, we focused on the dehydrogenation reaction which should be a rate-determining step in the elementary reaction steps. From the calculation results, a particular orbital interaction between the hypophosphite ion and the metal surface was observed. On Pd (111), the s-orbital of H in the hypophosphite ion interacts singly with the d- or p-orbital of Pd (111). This interaction induces an anti-bonding interaction between H and P in the hypophosphite ion, which is responsible for P-H cleavage. On the other hand, on Cu (111), the s-orbital of H and the s-orbital of P in a hypophosphite ion interact simultaneously with the p-orbital of Cu (111). This interaction barely induces an anti-bonding interaction between H and P in the hypophosphite ion. Such a difference in orbital interaction structures should be related to P-H cleavage activity and the reactivity difference of hypophosphite ion on each metal surface. © 2011 The Electrochemical Society.

Theoretical Analysis of Catalytic Activity of Metal Surfaces on Reaction of Hypophosphite Ion

M. Kunimoto, H. Nakai, T. Homma

Electrochemistry (80(3)) p.126 - 1312011-

Density Functional Theory Analysis for Orbital Interaction between Hypophosphite Ions and Metal Surfaces

M. Kunimoto, H. Nakai, T. Homma

J. Electrochem. Soc. (158(10)) p.D626 - D6332011-

Density Functional Theory Analysis of Reaction Mechanism of Hypophosphite Ions on Metal Surface

M. Kunimoto, T. Shimada, S. Odagiri, H. Nakai, T. Homma

J. Electrochem. Soc. (158(9)) p.D585 - D5892011-

Potential-Dependent Surface Morphology and Microtexture Evolution of Electrodeposited Copper Films

M. C. Lafouresse, Y. Fukunaka, T. Homma, S. Honjo, S. Kikuchi, W. Schwarzacher

Electrochem. Solid-State Lett. (14(7)) p.D77 - D792011-

CoNiP electroless deposition process for fabricating ferromagnetic nanodot arrays

T. Ouchi, T. Homma

Electrochim. Acta (56) p.9575 - 95802011-

Density Functional Theory Analysis of Reaction Mechanism of Hypophosphite Ions on Metal Surfaces

Kunimoto, Masahiro;Shimada, Takuya;Odagiri, Shuichi;Nakai, Hiromi;Homma, Takayuki

JOURNAL OF THE ELECTROCHEMICAL SOCIETY 158(9) p.D585 - D5892011-2011

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Detail

ISSN:0013-4651

Density Functional Theory Analysis for Orbital Interaction between Hypophosphite Ions and Metal Surfaces

Kunimoto, Masahiro;Nakai, Hiromi;Homma, Takayuki

JOURNAL OF THE ELECTROCHEMICAL SOCIETY 158(10) p.D626 - D6332011-2011

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Detail

ISSN:0013-4651

CoNiP electroless deposition process for fabricating ferromagnetic nanodot arrays

Ouchi, Takanari;Shimano, Naofumi;Homma, Takayuki

ELECTROCHIMICA ACTA 56(26) p.9575 - 95802011-2011

DOIWoS

Detail

ISSN:0013-4686

Fabrication of magnetic nanodot array using electrochemical deposition processes

Ouchi, Takanari; Arikawa, Yuki; Konishi, Yohei; Homma, Takayuki

Electrochimica Acta 55(27) p.8081 - 80862010/11-2010/11

DOIScopus

Detail

ISSN:00134686

Outline:We investigated fabrication processes of magnetic nanodot arrays for the ultra-high density magnetic recording media by using an electrodeposition. A CoZrNb underlayer was sputter-deposited on a glass disk substrate as a soft magnetic underlayer (SUL). Nano-patterns were formed on the substrate by UV-nanoimprint lithography (UV-NIL) and CoPt was electrodeposited into the nano-patterns. For obtaining uniform CoPt nanodot arrays with high perpendicular coercivities, we applied thin Cu intermediate layer on CoZrNb SUL and minimized its thickness. As a result, we obtained CoPt nanodot arrays with 150-nm diameter, 300-nm pitches, and 20-nm heights, which have uniform structures, on the substrates with the construction of Cu (1-2 nm)/CoZrNb (100 nm)/Cr (5 nm)/glass disk. The perpendicular coercivity of the CoPt nanodot arrays was as high as 5.4 kOe. From these results, we showed that the Cu intermediate layer with even 1-2 nm thick considerably improved the deposition condition on the substrates with CoZrNb SUL to successfully fabricate CoPt nanodot arrays with the diameter and pitches of 80 nm and 160 nm with sufficient uniformity. © 2010 Elsevier Ltd. All rights reserved.

Influence of Specific Si Resistance on the Morphology of Zn Films Formed by Reacting Al-Si Alloy with Zincate Solution

SAITO Mikiko;MAEGAWA Takeyuki;HOMMA Takayuki

Jitsumu Hyomen Gijutsu 61(6) p.447 - 4512010/06-2010/06

CiNii

Detail

ISSN:09151869

Outline:The electrochemical behavior of Al-Si alloy films in zincate solution was investigated to elucidate the effects of zincate pretreatment on the Zn morphology and subsequent electroless NiP deposition, which is used for under bump metallization (UBM) in integrated circuit (IC) chip packaging. To investigate the electrochemical behavior of the Al-Si films during the zincate pretreatment, the immersion potential and the surface morphology during Zn and NiP deposition were evaluated using Al-Si electrodes that had been fabricated onto two types of Si substrates with different specific resistances. A heterogeneous point was observed for samples fabricated onto Si substrates with high specific resistance (45-95 Ωm), but no such point was observed on samples fabricated onto Si substrates with low specific resistance (0.00001-0.00002 Ωm). This result suggests that the morphology of the deposits was affected considerably by the specific resistance of the Si substrate.

Electrochemical fabrication and characterization of CoPt bit patterned media: Towards a wetchemical, large-scale fabrication

Ouchi, Takanari; Ouchi, Takanari; Arikawa, Yuki; Kuno, Taisuke; Mizuno, Jun; Shoji, Shuichi; Shoji, Shuichi; Shoji, Shuichi; Homma, Takayuki; Homma, Takayuki; Homma, Takayuki

IEEE Transactions on Magnetics 46(6) p.2224 - 22272010/06-2010/06

DOIScopus

Detail

ISSN:00189464

Outline:This paper describes the fabrication process of CoPt nandot arrays on a glass disk substrate with a CoZrNb underlayer as a soft magnetic underlayer (SUL) by using an electrochemical process, and also the analysis on the magnetic properties of these fabricated CoPt nanodot arrays. We formed nano-patterned substrates by UV-nanoimprint lithography (UV-NIL) on the glass disk substrate. CoPt was electrodeposited into the nano-patterned substrates optimizing the electrodeposition condition and bath composition as well as a Cu intermediate layer. The construction of the nanodot arrays were CoPt nanodot arrays (20 nm)/Cu (<5 nm)/CoZrNb (100 nm)/Cr (5 nm)/Glass disk. Magnetic signals were clearly observed on the dc magnetized state and multi domain were observed in each nanodot on the ac magnetized state by magnetic force microscopy (MFM). The perpendicular coercivity of the CoPt nanodot arrays was 430 kA/m. These results showed electrochemical process can be used for the manufacture of magnetic recording media. © 2006 IEEE.

Electrochemical etching process to tune the diameter of arrayed deep pores by controlling carrier collection at a semiconductor-electrolyte interface

Sato, Hirotaka; Yamaguchi, Takuya; Isobe, Tetsuhiko; Shoji, Shuichi; Homma, Takayuki

Electrochemistry Communications 12(6) p.765 - 7682010/06-2010/06

DOIScopus

Detail

ISSN:13882481

Outline:An approach to control the diameter of high-aspect-ratio pores formed into a silicon wafer by an electrochemical etching process is reported. Hole (h +) was involved in the etching reaction and the collection of the h+ was the key factor. Artificial micro-cavities were fabricated on the silicon surface prior to the etching. The depth of the space charge region (SCR), Schottky barrier on the silicon-electrolyte interface, was adjusted regarding the depth of the micro-cavities by applied overpotential and specific resistance of the silicon wafer. The collection of h+ at the tip of the cavity site was widely controlled by the adjusted SCR. Consequently the electrochemically etched domain at the cavity site was actively tuned, and then high-aspect-ratio pore with the controlled diameter was formed. The diameter was tuned by the SCR depth which was controlled by the overpotential and the specific resistance. The diameter tuning mechanism worked under the mask-free condition. © 2010 Elsevier B.V. All rights reserved.

Synchrotron Radiation-induced Total Reflection X-ray Fluorescence Analysis

F. Meirer, A. Singh, G. Pepponi, C. Streli, T. Homma, P. Pianetta

Trends in Analytical Chemistry 29(6) p.479 - 4962010-

In Situ Observation of Dendrite Growth of Electrodeposited Li Metal

K. Nishikawa, T. Mori, T. Nishid, Y. Fukunaka, M. Rosso, T. Homma

J. Electrochem. Soc. 157(11) p.A1212 - A12172010-

Al-Si合金膜表面のジンケート処理に対する下地Si基板の影響

齋藤美紀子,前川武之,本間敬之

表面技術 61(6) p.447 - 4512010-

Transient mass transfer rate of Cu2+ ion caused by copper electrodeposition with alternating electrolytic current

S. Kawai, M. Ogawa, K. Ishibashi, Y. Kondo, T. Matsuoka, T. Homma, Y. Fukunaka, S. Kida

Electrochim. Acta 55(12) p.3987 - 39942010-

Electrochemical Etching Process to Tune the Diameter of Arrayed Deep Pores by Controlling Carrier Collection at a Semiconductor-Electrolyte Interface

H. Sato, T. Yamaguchi, T. Isobe, S. Shoji, T. Homma

Electrochem. Comm. 12p.765 - 7682010-

Microstructure Formation within Films of Silicon using Electrochemical Anodization

J. B. Ratchford, M. Saito, T. Homma

Trans, Mat. Res. Soc. 35(1) p.69 - 722010-

Fabrication of Magnetic Nanodot Array using Electrochemical Deposition Processes

T. Ouchi, Y. Arikawa, Y. Konishi, T. Homma

Electrochim. Acta 55p.8081 - 80862010-

Magnetization Reversal Process of Hard/Soft Nanocomposite Structures Formed by Ion Irradiation

M. Aniya, A. Shimada, Y. Sonobe, K. Sato, T. Shima, K. Takanashi, S. J. Greaves, T. Ouchi, T. Homma

IEEE Trans. Magn. 46p.2132 - 21352010-

Electrochemical Fabrication and Characterization of CoPt Bit Patterned Media: towards a Wet Chemical, Large-Scale Fabrication

T. Ouchi, Y. Arikawa, T. Kuno, J. Mizuno, S. Shoji, T. Homma

IEEE Trans. Magn. 46p.2224 - 22272010-

Fabrication of Nanogap Electrodes using Electrodeposition Process

C. Kobayashi, S. Yoshida, M. Saito, Y. Wakayama, T. Homma

Electrochem. Soc. Trans. 25(41) p.29 - 402010-

High Perpendicular Coercivity Electroless Cobalt Alloy Films with 25 nm Thicknesses

T. Ouchi, Y. Arikawa, T. Kuno, T. Homma

Electrochem. Soc. Trans. 25(41) p.125 - 1342010-

Effect of Tl-codeposition on Au Electrodeposition from Non-Cyanide Bath

M. Saito, K. Inoue, K. Shiokawa, T. Homma

Electrochem. Soc. Trans. 25(34) p.87 - 922010-

Electrochemical Fabrication and Characterization of CoPt Bit Patterned Media: Towards a Wetchemical, Large-Scale Fabrication

Ouchi, Takanari;Arikawa, Yuki;Kuno, Taisuke;Mizuno, Jun;Shoji, Shuichi;Homma, Takayuki

IEEE TRANSACTIONS ON MAGNETICS 46(6) p.2224 - 22272010-2010

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ISSN:0018-9464

Electrochemical etching process to tune the diameter of arrayed deep pores by controlling carrier collection at a semiconductor-electrolyte interface

Sato, Hirotaka;Yamaguchi, Takuya;Isobe, Tetsuhiko;Shoji, Shuichi;Homma, Takayuki

ELECTROCHEMISTRY COMMUNICATIONS 12(6) p.765 - 7682010-2010

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Detail

ISSN:1388-2481

In Situ Observation of Dendrite Growth of Electrodeposited Li Metal

Nishikawa, Kei;Mori, Takeshi;Nishida, Tetsuo;Fukunaka, Yasuhiro;Rosso, Michel;Homma, Takayuki

JOURNAL OF THE ELECTROCHEMICAL SOCIETY 157(11) p.A1212 - A12172010-2010

DOIWoS

Detail

ISSN:0013-4651

Fabrication of magnetic nanodot array using electrochemical deposition processes

Ouchi, Takanari;Arikawa, Yuki;Konishi, Yohei;Homma, Takayuki

ELECTROCHIMICA ACTA 55(27) p.8081 - 80862010-2010

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Detail

ISSN:0013-4686

Magnetic Properties of Patterned CGC Perpendicular Films With Soft Magnetic Fillings

M. Aniya, A. Mitra, A. Shimada, Y. Sonobe, T. Ouchi, S. J. Greaves,T. Homma

IEEE Trans. Magn. 45p.3539 - 35422009-

Effect of Cu Seed Layers on the Properties of Electroplated Sn-Cu Films

M. Saito, H. Sasaki, K. Katou, T. Toba, T. Homma

J. Electrochem. Soc. 156p.E86 - E902009-

Preparation of Electrodeposited Pt Nano Patterned Electrode using UV-Nano Imprinting Lithography

M. Saito, J. Mizuno, H. Nishikubo, H. Fujiwara, T. Homma

Electrochem. Soc. Trans. 16(25) p.131 - 1362009-

Electrochemical Evaluation and Finite Element Structural Analysis of Si Wafer Surface under Mechanical Stress

K. Sakata, T. Homma

Electrochem. Soc. Trans. 16(40) p.79 - 842009-

Electrochemical Fabrication of CoPt Nanodot Arrays on Glass Disks by UV Nanoimprint Lithography

T. Ouchi, Y. Arikawa, J. Mizuno S. Shoji, T. Homma

Electrochem. Soc. Trans. 16(45) p.79 - 842009-

Fabrication of Catalyst-Functionalized Three-Dimensional Micromesh Structures

S. Keino, H. Sato, T. Homma, S. Shoji

Jpn. J. Appl. Phys. 47p.5204 - 52072008-

Nanoscopic and Electrochemical characterization of Defects and Strain at Si Wafer Surfaces

T. Homma, K. Sakata, N. Kubo

Proc. Adv. Sci. Tech. Si Mat. 5p.32 - 362008-

Fabrication of CoPt Magnetic Nanodot Arrays by Electrodeposition Process

T. Ouchi, Y. Arikawa, T. Homma

J. Magn. Magn. Mater. 320p.3104 - 31072008-

Self-aligned Formation of Nano-holes to Arrayed Micro Glass Tubes

H. Sato, T. Yamaguchi, T. Isobe, T. Homma, S. Shoji

Electrochim. Acta 53p.200 - 2042007-

Fabrication of Metallic Nanopatterns Using the Vacuum Type UV-NIL Equipment

M. Fukuhara, J. Mizuno, M. Saito, T. Homma, S. Shoji

IEEJ Transactions on Electrical and Electronic Engineering 2p.307 - 3122007-

Density Functional Theory Study on the Reaction Mechanism of Reductants for Electroless Ag Deposition Process

T. Shimada, H. Nakai, T. Homma

J. Electrochem. Soc. 154p.D273 - D2762007-

Molecular Orbital Study on the Oxidation Mechanism of Hydrazine and Hydroxylamine as Reducing Agents for Electroless Deposition Process

T. Shimada, A. Tamaki, H. Nakai, T. Homma

Electrochemistry 75p.45 - 492007-

Fabrication of Magnetic Nanodot Arrays for Patterned Magnetic Recording Media

H. Sato, T. Homma

J. Nanosci. Nanotech 7p.225 - 2312006-

Evaluation of 256-pixel TES Microcalorimeter Arrays with Electrodeposited Bi Absorbers

U. Morita, Y. Yamakawa, T. Fujimori, Y. Ishisaki, T. Ohashi, Y. Takei, K. Yoshida, T. Yoshino, K. Mitsuda, N. Yamasaki, R. Fujimoto, H. Sato, Y. Minoura, N. Takahashi, T. Homma, S. Shoji, Y. Kuroda, M. Onishi

Nuclear Instruments and Methods in Physics Research A 559p.539 - 5412006-

Electrochemical Formation of Intermediate Layer for Co/Pd Multilayered Media

J. Kawaji, K. Kimura, T. Asahi, T. Homma, T. Osaka

J. Mag. Mag. Mat. 303p.e128 - e1322006-

Adsorption of Organic Molecules by Photochemical Reaction on Cl:Si(111) and H:Si(111) Evaluated by HREELS

K. Nishiyama, Y. Tanaka, H. Harada, T. Yamada, D. Niwa, T. Inoue, T. Homma, T. Osaka, I. Taniguchi

Surf. Sci. 600p.1965 - 19722006-

Fabrication of High-Aspect-Ratio Arrayed Structures Using Si Electrochemical Etching

H. Sato, T. Homma

Sci. Tech. of Adv. Mater. 7p.468 - 4742006-

Nucleation and Growth of Copper Nanoparticles on Silicon Surfaces

A. Singh, K. Luening, S. Brennan, T. Homma, N. Kubo, P. Pianetta

Physica Scripta T115p.714 - 7162005-

Surface Conductivity in Methyl- Monolayer/Si Heterojunction Structure in the Presence of Water

D. Niwa, K. Omichi, N. Motohashi, T. Homma, T. Osaka

Chem.Lett. 342005-

Deposition Behavior of Ni on Si(100) Surfaces in an Aqueous Alkaline Solution

D. Niwa, T. Homma, T. Osaka

J. Electrochem.Soc. 152p.C52 - C592005-

Electrochemical formation process of Si macropore and metal filling for high aspect ratio metal microstructure using single electrolyte system

H. Sato, T. Homma, K. Mori, T. Osaka, S. Shoji

Electrochemistry 73p.2752005-

Picoliter volume glass tube array fabricated by Si electrochemical etching process

H. Sato, T. Homma, K. Mori, T. Osaka, S. Shoji

Electrochim. Acta 51p.844 - 8482005-

Area Selective Formation of Magnetic Nanodot Arrays on Si Wafer by Electroless Deposition

J. Kawaji, F. Kitaizumi, H. Oikawa, D. Niwa, T. Homma, T. Osaka

J. Magn. Magn. Matter 287p.245 - 2492005-

Characterization of strained Si wafer surface by density functional theory analysis

K. Sakata, T. Homma, H. Nakai, T. Osaka

Electrochim. Acta 51p.1000 - 10032005-

Electrochemical analysis of zincate treatments for Al and Al alloy films

M. Saito, T. Maegawa, T. Homma

Electrochim. Acta 51p.1017 - 10202005-

Microstructure of a Co/Pd multilayered perpendicular recording medium with Pd seeds prepared by electrochemical process

M. Tanaka, J. Kawaji, K. Kimura, T. Asahi, T. Homma, S. Matsunuma, T. Osaka

J. Magn. Magn. Matter. 287p.188 - 1922005-

High efficiency electrochemical immuno sensors using 3D comb electrodes

N. Honda, M. Inaba, T. Katagiri, S. Shoji, H. Sato, T. Homma, T. Osaka, M. Saito, J. Mizuno, Y. Wada

Biosens. Bioelectronics 20(11) p.2306 - 23092005-

Fabrication of patterned nanostructures with various metal species on Si wafer surfaces by maskless and electroless process

N. Kubo, T. Homma, Y. Hondo, T. Osaka

Electrochim. Acta 51p.834 - 8372005-

Preparation and characterization of electroplated amorphous gold?nickel alloy film for electrical contact applications

N. Togasaki, Y. Okinaka, T. Hommaa, T. Osaka

Electrochim. Acta 51p.882 - 8872005-

Area-selective formation of macropore array by anisotropic electrochemical etching on n-Si (100) surface in aqueous HF solution

T. Homma, H. Sato, K. Mori, T. Osaka, S. Shoji

J. Phys. Chem. B 109p.57242005-

Density functional theory study on the oxidation mechanisms of aldehydes as reductants for electroless Cu deposition process

T. Shimada, K. Sakata, T. Homma, H. Nakai, T. Osaka

Electrochim. Acta 51p.906 - 9152005-

Nucleation and Growth of Copper Nanoparticles on Silicon Surfaces

A. Singh, K. Luening, S. Brennan, T. Homma, N. Kubo, P. Pianetta

Physica Scripta T115p.714 - 7162005-

Surface Conductivity in Methyl- Monolayer/Si Heterojunction Structure in the Presence of Water

D. Niwa, K. Omichi, N. Motohashi, T. Homma, T. Osaka

Chem.Lett. 342005-

Deposition Behavior of Ni on Si(100) Surfaces in an Aqueous Alkaline Solution

D. Niwa, T. Homma, T. Osaka

J. Electrochem.Soc. 152p.C52 - C592005-

Electrochemical formation process of Si macropore and metal filling for high aspect ratio metal microstructure using single electrolyte system

H. Sato, T. Homma, K. Mori, T. Osaka, S. Shoji

Electrochemistry 73p.2752005-

Picoliter volume glass tube array fabricated by Si electrochemical etching process

H. Sato, T. Homma, K. Mori, T. Osaka, S. Shoji

Electrochim. Acta 51p.844 - 8482005-

Area Selective Formation of Magnetic Nanodot Arrays on Si Wafer by Electroless Deposition

J. Kawaji, F. Kitaizumi, H. Oikawa, D. Niwa, T. Homma, T. Osaka

J. Magn. Magn. Matter. 287p.245 - 2492005-

Characterization of strained Si wafer surface by density functional theory analysis

K. Sakata, T. Homma, H. Nakai, T. Osaka

Electrochim. Acta 51p.1000 - 10032005-

Electrochemical analysis of zincate treatments for Al and Al alloy films

M. Saito, T. Maegawa, T. Homma

Electrochim. Acta 51p.1017 - 10202005-

Microstructure of a Co/Pd multilayered perpendicular recording medium with Pd seeds prepared by electrochemical process

M. Tanaka, J. Kawaji, K. Kimura, T. Asahi, T. Homma, S. Matsunuma, T. Osaka

J. Magn. Magn. Matter. 287p.188 - 1922005-

High efficiency electrochemical immuno sensors using 3D comb electrodes

N. Honda, M. Inaba, T. Katagiri, S. Shoji, H. Sato, T. Homma, T. Osaka, M. Saito, J. Mizuno, Y. Wada

Biosens. Bioelectronics 20(11) p.2306 - 23092005-

Fabrication of patterned nanostructures with various metal species on Si wafer surfaces by maskless and electroless process

N. Kubo, T. Homma, Y. Hondo, T. Osaka

Electrochim. Acta 51p.834 - 8372005-

Preparation and characterization of electroplated amorphous gold?nickel alloy film for electrical contact applications

N. Togasaki, Y. Okinaka, T. Hommaa, T. Osaka

Electrochim. Acta 51p.882 - 8872005-

Area-selective formation of macropore array by anisotropic electrochemical etching on n-Si (100) surface in aqueous HF solution

T. Homma, H. Sato, K. Mori, T. Osaka, S. Shoji

J. Phys. Chem. B 109p.57242005-

Density functional theory study on the oxidation mechanisms of aldehydes as reductants for electroless Cu deposition process

T. Shimada, K. Sakata, T. Homma, H. Nakai, T. Osaka

Electrochim. Acta 51p.906 - 9152005-

微小流路を用いた無電解析出プロセスによる複合金属ナノ粒子の作製

佐藤裕崇, 大日向陽, 本間敬之, 逢坂哲彌

表面技術 55(12) p.966 - 9672004/12-

Deposition Mechanism of Ni on Si(100) Surfaces in Aqueous Alkaline Solution

D. Niwa, T. Homma, T. Osaka

J. Phys. Chem. B 108(28) p.9900 - 99042004-

Fabrication of Organic Monolayer Modified Ion-Sensitive Field Effect Transistors with High Chemical Durability

D. Niwa, T. Homma, T. Osaka

Jpn. J. Appl. Phys. 43(1A/B) p.L105 - L1072004-

Formation of Micro and Nanoscale Patterns of Monolayer Templates for Position Selective Immobilization of Oligonucleotide using Ultraviolet and Electron Beam Lithography

D. Niwa, T. Homma, T. Osaka

Chem. Lett. 33(2) p.176 - 1772004-

Electrochemical Behavior of Methyl- and Butyl- Terminated Si(111) in Aqueous Solution

D. Niwa, T. Inoue, H. Fukunaga, T. Akasaka, T. Yamada, T. Homma, T. Osaka

Chem. Lett. 33(3) p.284 - 2852004-

Formation of Molecular Templates for Fabricating On-Chip Biosensing Devices

D. Niwa, Y. Yamada, T. Homma, T. Osaka

J. Phys. Chem. B 108(10) p.3240 - 32452004-

High Sensitive X-ray Microcalorimeter Using Bi-Au Microabsorber for Imaging Applications

H. Kudo, T. Arakawa, S. Ohtsuka, T. Izumi, S. Shoji, H. Sato, H. Kobayashi, K. Mori, T. Homma, T. Osaka, N. Iyomoto, R. Fujimoto, K. Mitsuda

Jpn. J. Appl. Phys. 43(3) p.1190 - 11952004-

Development of Bi Electrodeposition Process for Fabricating Microabsorber Array for High Sensitive X-ray Imaging Sensor

H. Sato, H. Kobayashi, H. Kudo, T. Izumi, T. Homma, T. Osaka, S. Shoji, Y. Ishisaki, R. Fujimoto, K. Mitsuda

Electrochemistry 72(6) p.424 - 4262004-

Formation of Pd Nanocluster Seeds by Electrochemical Process for Control of Magnetic Properties in Co/Pd Multilayered Film

J. Kawaji, M. Tanaka, K. Kimura, T. Asahi, T. Homma, T. Osaka

IEEE Trans. Magn. 40(4) p.2473 - 24752004-

TES Microcalorimeter Development for Future Japanese X-ray Astronomy Missions

R. Fujimoto, K. Mitsuda, Y. Yamasaki, N. Iyomoto, T. Oshima, Y. Takei, K. Futamoto, T. Ichitsubo, T. Fujimori, K. Yoshida, Y. Ishisaki, U. Morita, T. Koga, K. Shinozaki, K. Sato, N. Takai, H. Kudo, H. Sato, T. Arakawa, H. Kobayashi, K. Mori, T. Homma, S. Shoji

Nucl. Inst. & Methods in Phys. Res. A 520(1) p.431 - 4342004-

Fabrication of Multi-pixel TES Microcalorimeters with an Electrodeposited Sn Absorber and Bi Absorber

T. Arakawa, H. Kudo, H. Sato, H. Kobayashi, T. Izumi, S. Ohtsuka, K. Mori, S. Shoji, T. Osaka, T. Homma, K. Mitsuda, N. Yamasaki, R. Fujimoto, N. Iyomoto, Y. Ishisaki, U. Morita, T. Koga

Nucl. Inst. & Methods in Phys. Res. A 520(1) p.456 - 4592004-

Ab Initio Molecular Orbital Study of the Electron Emission Mechanism of TiCl3 as a Reductant for an Electroless Deposition Process

T. Shimada, I. Komatsu, T. Homma, H. Nakai, T. Osaka

Electrochemistry 72(6) p.462 - 4652004-

Performance Analyse's of TES Microcalorimeters with Mushroom Shaped X-ray Absorbers Made of Sn or Bi

Y. Ishisaki, U. Morita, T. Koga, K. Shinozaki, K. Sato, N. Takai, T. Ohashi, T. Arakawa, H. Kudo, H. Sato, H. Kobayashi, T. Izumi, S. Ohtsuka, K. Mori, T. Homma, S. Shoji, T. Osaka, K. Mitsuda, R. Fujimoto, N. Iyomoto

Nucl. Inst. & Methods in Phys. Res. A 520(1) p.452 - 4552004-

Deposition Mechanism of Ni on Si(100) Surfaces in Aqueous Alkaline Solution

D. Niwa, T. Homma, T. Osaka

J. Phys. Chem. B 108(28) p.9900 - 99042004-

Fabrication of Organic Monolayer Modified Ion-Sensitive Field Effect Transistors with High Chemical Durability

D. Niwa, T. Homma, T. Osaka

Jpn. J. Appl. Phys. 43(1A/B) p.L105 - L1072004-

Formation of Micro and Nanoscale Patterns of Monolayer Templates for Position Selective Immobilization of Oligonucleotide using Ultraviolet and Electron Beam Lithography

D. Niwa, T. Homma, T. Osaka

Chem. Lett. 33(2) p.176 - 1772004-

Electrochemical Behavior of Methyl- and Butyl- Terminated Si(111) in Aqueous Solution

D. Niwa, T. Inoue, H. Fukunaga, T. Akasaka, T. Yamada, T. Homma, T. Osaka

Chem. Lett. 33(3) p.284 - 2852004-

Formation of Molecular Templates for Fabricating On-Chip Biosensing Devices

D. Niwa, Y. Yamada, T. Homma, T. Osaka

J. Phys. Chem. B 108(10) p.3240 - 32452004-

High Sensitive X-ray Microcalorimeter Using Bi-Au Microabsorber for Imaging Applications

H. Kudo, T. Arakawa, S. Ohtsuka, T. Izumi, S. Shoji, H. Sato, H. Kobayashi, K. Mori, T. Homma, T. Osaka, N. Iyomoto, R. Fujimoto, K. Mitsuda

Jpn. J. Appl. Phys. 43(3) p.1190 - 11952004-

Development of Bi Electrodeposition Process for Fabricating Microabsorber Array for High Sensitive X-ray Imaging Sensor

H. Sato, H. Kobayashi, H. Kudo, T. Izumi, T. Homma, T. Osaka, S. Shoji, Y. Ishisaki, R. Fujimoto, K. Mitsuda

Electrochemistry 72(6) p.424 - 4262004-

Formation of Pd Nanocluster Seeds by Electrochemical Process for Control of Magnetic Properties in Co/Pd Multilayered Film

J. Kawaji, M. Tanaka, K. Kimura, T. Asahi, T. Homma, T. Osaka

IEEE Trans. Magn. 40(4) p.2473 - 24752004-

TES Microcalorimeter Development for Future Japanese X-ray Astronomy Missions

R. Fujimoto, K. Mitsuda, Y. Yamasaki, N. Iyomoto, T. Oshima, Y. Takei, K. Futamoto, T. Ichitsubo, T. Fujimori, K. Yoshida, Y. Ishisaki, U. Morita, T. Koga, K. Shinozaki, K. Sato, N. Takai, H. Kudo, H. Sato, T. Arakawa, H. Kobayashi, K. Mori, T. Homma, S. Shoji

Nucl. Inst. & Methods in Phys. Res. A 520(1) p.431 - 4342004-

Fabrication of Multi-pixel TES Microcalorimeters with an Electrodeposited Sn Absorber and Bi Absorber

T. Arakawa, H. Kudo, H. Sato, H. Kobayashi, T. Izumi, S. Ohtsuka, K. Mori, S. Shoji, T. Osaka, T. Homma, K. Mitsuda, N. Yamasaki, R. Fujimoto, N. Iyomoto, Y. Ishisaki, U. Morita, T. Koga

Nucl. Inst. & Methods in Phys. Res. A 520(1) p.456 - 4592004-

Ab Initio Molecular Orbital Study of the Electron Emission Mechanism of TiCl3 as a Reductant for an Electroless Deposition Process

T. Shimada, I. Komatsu, T. Homma, H. Nakai, T. Osaka

Electrochemistry 72(6) p.462 - 4652004-

Performance Analyse's of TES Microcalorimeters with Mushroom Shaped X-ray Absorbers Made of Sn or Bi

Y. Ishisaki, U. Morita, T. Koga, K. Shinozaki, K. Sato, N. Takai, T. Ohashi, T. Arakawa, H. Kudo, H. Sato, H. Kobayashi, T. Izumi, S. Ohtsuka, K. Mori, T. Homma, S. Shoji, T. Osaka, K. Mitsuda, R. Fujimoto, N. Iyomoto

Nucl. Inst. & Methods in Phys. Res. A 520(1) p.452 - 4552004-

Survey of the Metal Nucleation Processes on Silicon Surfaces in Fluoride Solutions: From Dilute HF to Concentrated NH4F Solutions

M. Chemla, T. Homma, V. Bertagna, R. Erre, N. Kubo, T. Osaka

J. Electroanal. Chem. 559(1) p.111 - 1232003-

Molecular Orbital Study on the Reaction Process of Dimethylamine Borane as a Reductant for Electroless Deposition

T. Homma, A. Tamaki, H. Nakai, T. Osaka

J. Electroanal. Chem. 559(1) p.131 - 1362003-

Sn Electrodeposition Process for Fabricating Microabsorber Arrays for an X-ray Microcalorimeter

T. Homma, H. Sato, H. Kobayashi, T. Arakawa, H. Kudo, T. Osaka, S. Shoji, Y. Ishisaki, T. Oshima, N. Iyomoto, R. Fujimoto, K. Mitsuda

J. Electroanal. Chem. 559(1) p.143 - 1482003-

Maskless and Electroless Fabrication of Patterned Metal Nanostructures on Silicon Wafers by Controlling Local Surface Activities

T. Homma, N. Kubo, T. Osaka

Electrochim. Acta 48(20) p.3115 - 31222003-

無電解めっき法による磁性ナノドットアレイの作製

川治 純,朝日 透,田中睦美,木村公治,本間敬之,逢坂哲彌

信学技報 MR2003(28) p.7 - 112003-

電気化学的手法を用いた垂直二層膜媒体用下地層の作製

川治 純,北泉太士,本間敬之,逢坂哲彌

信学技報 MR2003(1) p.1 - 52003-

Survey of the Metal Nucleation Processes on Silicon Surfaces in Fluoride Solutions: From Dilute HF to Concentrated NH4F Solutions

M. Chemla, T. Homma, V. Bertagna, R. Erre, N. Kubo, T. Osaka

J. Electroanal. Chem. 559(1) p.111 - 1232003-

Molecular Orbital Study on the Reaction Process of Dimethylamine Borane as a Reductant for Electroless Deposition

T. Homma, A. Tamaki, H. Nakai, T. Osaka

J. Electroanal. Chem. 559(1) p.131 - 1362003-

Sn Electrodeposition Process for Fabricating Microabsorber Arrays for an X-ray Microcalorimeter

T. Homma, H. Sato, H. Kobayashi, T. Arakawa, H. Kudo, T. Osaka, S. Shoji, Y. Ishisaki, T. Oshima, N. Iyomoto, R. Fujimoto, K. Mitsuda

J. Electroanal. Chem. 559(1) p.143 - 1482003-

Maskless and Electroless Fabrication of Patterned Metal Nanostructures on Silicon Wafers by Controlling Local Surface Activities

T. Homma, N. Kubo, T. Osaka

Electrochim. Acta 48(20) p.3115 - 31222003-

Substrate(Ni)-Catalyzed Electroless Gold Deposition from a Noncyanide Bath Containing Thiosulfate and Sulfite: Part II Deposit Characteristics and Substrate Effects

J. Sato, M. Kato, H. Otani, T. Homma, Y. Okinaka, T. Osaka, O. Yoshioka

J. Electrochem. Soc 149(3) p.C168 - C1712002-

Substrate(Ni)-Catalyzed Electroless Gold Deposition from a Noncyanide Bath Containing Thiosulfate and Sulfite: Part I Reaction Mechanism

M. Kato, J. Sato, H. Otani, T. Homma, Y. Okinaka, T. Osaka, O. Yoshioka

J. Electrochem. Soc 149(3) p.C164 - C1672002-

Substrate(Ni)-Catalyzed Electroless Gold Deposition from a Noncyanide Bath Containing Thiosulfate and Sulfite: Part II Deposit Characteristics and Substrate Effects

J. Sato, M. Kato, H. Otani, T. Homma, Y. Okinaka, T. Osaka, O. Yoshioka

J. Electrochem. Soc 149(3) p.C168 - C1712002-

Substrate(Ni)-Catalyzed Electroless Gold Deposition from a Noncyanide Bath Containing Thiosulfate and Sulfite: Part I Reaction Mechanism

M. Kato, J. Sato, H. Otani, T. Homma, Y. Okinaka, T. Osaka, O. Yoshioka

J. Electrochem. Soc 149(3) p.C164 - C1672002-

Ab initio molecular orbital study of the oxidation mechanism of hypophosphite ion as a reductant for an electroless deposition process

H. Nakai, T. Homma, I. Komatsu, T. Osaka

J. Phys. Chem. B 105(9) p.1701 - 17042001-

Molecular Orbital Study on the Reaction Mechanisms of Electroless Deposition Processes

T. Homma, I. Komatsu, A. Tamaki, H. Nakai, T. Osaka

Electrochimica Acta 47(1) p.47 - 532001-

CoCrPtTa and CoPd Perpendicular Magnetic Recording Media with Amorphous Underlayers

T. Onoue, T. Asahi, K. Kuramochi, J. Kawaji, T. Homma, T. Osaka

IEEE Trans. Magn. 37(4) p.1592 - 15942001-

Improvement of Signal to Noise Ratio for Co/Pd Multilayer Perpendicular Magnetic Recording Media by Addition of an Underlayer

T. Onoue, T. Asahi, K. Kuramochi, J. Kawaji, T. Homma, T. Osaka

J. Magn. Magn. Matter 235(1) p.40 - 442001-

Mechanism of Sulfur Inclusion in Soft Gold Electrodeposited from the Thiosulfate-Sulfite Bath

T. Osaka, M. Kato, J. Sato, K. Yoshizawa, T. Homma, Y. Okinaka, O. Yoshioka

J. Electrochem. Soc 148(10) p.C659 - C6622001-

アモルファスSi中間層を用いた垂直面内複合型媒体の作製

森田善幸,尾上貴弘,朝日 透,本間敬之,逢坂哲彌

日本応用磁気学会誌 25(4) p.619 - 6222001-

無電解析出法による傾斜機能磁性薄膜の作製

本間敬之,逢坂哲彌,佐藤裕崇

表面科学 22(6) p.350 - 3562001-

Ab initio molecular orbital study of the oxidation mechanism of hypophosphite ion as a reductant for an electroless deposition process

H. Nakai, T. Homma, I. Komatsu, T. Osaka

J. Phys. Chem. B 105(9) p.1701 - 17042001-

Molecular Orbital Study on the Reaction Mechanisms of Electroless Deposition Processes

T. Homma, I. Komatsu, A. Tamaki, H. Nakai, T. Osaka

Electrochimica Acta 47(1) p.47 - 532001-

CoCrPtTa and CoPd Perpendicular Magnetic Recording Media with Amorphous Underlayers

T. Onoue, T. Asahi, K. Kuramochi, J. Kawaji, T. Homma, T. Osaka

IEEE Trans. Magn. 37(4) p.1592 - 15942001-

Improvement of Signal to Noise Ratio for Co/Pd Multilayer Perpendicular Magnetic Recording Media by Addition of an Underlayer

T. Onoue, T. Asahi, K. Kuramochi, J. Kawaji, T. Homma, T. Osaka

J. Magn. Magn. Matter 235(1) p.40 - 442001-

Mechanism of Sulfur Inclusion in Soft Gold Electrodeposited from the Thiosulfate-Sulfite Bath

T. Osaka, M. Kato, J. Sato, K. Yoshizawa, T. Homma, Y. Okinaka, O. Yoshioka

J. Electrochem. Soc 148(10) p.C659 - C6622001-

Evaluation of Substrate (Ni)-Catalyzed Electroless Gold Plating Process

T. Osaka, T. Misato, J. Sato, H. Akiya, T. Homma, M. Kato, Y. Okinaka, O. Yoshioka

J. Electrochem. Soc. 147(3) p.1059 - 10642000/03-

Evaluation of Substrate (Ni)-Catalyzed Electroless Gold Plating Process

T. Osaka, T. Misato, J. Sato, H. Akiya, T. Homma, M. Kato, Y. Okinaka, O. Yoshioka

J. Electrochem. Soc. 147(3) p.1059 - 10642000/03-

Microstructural Study on the Functionally Graded Magnetic Thin Films Prepared by Electroless Deposition

T. Homma, Y. Kita, T. Osaka

J. Electrochem. Soc. 147(1) p.160 - 1632000/01-

Microstructural Study on the Functionally Graded Magnetic Thin Films Prepared by Electroless Deposition

T. Homma, Y. Kita, T. Osaka

J. Electrochem. Soc. 147(1) p.160 - 1632000/01-

Electrochemical Studies on the Deposition Process of Electroless CoNiP Films with Graded Magnetic Properties

T. Homma, Y. Kita, T. Osaka

J. Electrochem. Soc. 147(11) p.4138 - 41412000-

Ge下地層を有する垂直単層磁気記録媒体の作製

森田善幸,倉持健太郎,尾上貴弘,朝日 透,本間敬之,逢坂哲彌

日本応用磁気学会誌 24(4) p.223 - 2262000-

リングヘッド/垂直単層磁気記録媒体系におけるトラック端部磁化状態の解析

平山貴邦,尾上貴弘,朝日 透,本間敬之,法橋滋郎,逢坂哲彌

日本応用磁気学会誌 24(4) p.271 - 2742000-

Electrochemical Studies on the Deposition Process of Electroless CoNiP Films with Graded Magnetic Properties

T. Homma, Y. Kita, T. Osaka

J. Electrochem. Soc. 147(11) p.4138 - 41412000-

Pd/Sn混合触媒を用いた銅ダイレクトプレーティングにおける導体化過程の解析

飯塚 淳,中本剛輔,内藤和久,奥野和義,本間敬之,逢坂哲彌

表面技術 50(10) p.915 - 9221999/10-

Effect of Deposition Site Condition on the Initial Growth Process of Electroless CoNiP Films

K. Itakura, T. Homma, T. Osaka

Electrochim. Acta 44(7) p.3707 - 37111999/07-

Effect of Deposition Site Condition on the Initial Growth Process of Electroless CoNiP Films

K. Itakura, T. Homma, T. Osaka

Electrochim. Acta 44(7) p.3707 - 37111999/07-

めっき析出過程の基礎解析

本間敬之

表面技術 50(5) p.395 - 3991999/05-

スパッタ法により作製した垂直面内複合型媒体のノイズ特性

尾上貴弘,滝澤敦尚,平山貴邦,池田 真,本間敬之,法橋滋郎,逢坂哲彌,酒井浩志,吉川利彦

日本応用磁気学会誌 23(4) p.977 - 9801999/04-

Ab Initio Molecular Orbital Study on the Oxidation Mechanism for Dimethylamine Borane as a Reductant for an Electroless Deposition Process

T. Homma, H. Nakai, M. Onishi, T. Osaka

J. Phys.Chem. B 103(10) p.1774 - 17781999-

Ab Initio Molecular Orbital Study on the Oxidation Mechanism for Dimethylamine Borane as a Reductant for an Electroless Deposition Process

T. Homma, H. Nakai, M. Onishi, T. Osaka

J. Phys.Chem. B 103(10) p.1774 - 17781999-

無電解CoNiP傾斜機能磁性薄膜の断面構造解析

喜多洋介,本間敬之,逢坂哲彌

表面技術 49(12) p.1358 - 13591998/12-

電気化学的手法による磁気的機能傾斜薄膜の作製

本間敬之,喜多洋介,逢坂哲彌

日本金属学会誌 62(11) p.1025 - 10301998/11-

Nucleation of Trace Copper on the H-Si(111) Surface in Aqueous Fluoride Solutions

T. Homma, C.P.Wade, C.E.D.Chidsey

J. Phys.Chem. B 102(41) p.7919 - 79221998/10-

Nucleation of Trace Copper on the H-Si(111) Surface in Aqueous Fluoride Solutions

T. Homma, C.P.Wade, C.E.D.Chidsey

J. Phys.Chem. B 102(41) p.7919 - 79221998/10-

表面技術便覧

本間敬之

日刊工業新聞 p.1613 - 16221998/02-

Gradient Control of Magnetic Properties in Electroless Deposited CoNiP Films

T. Homma, M.Suzuki, T.Osaka

J.Electrochem.Soc. 145(1) p.134 - 1381998/01-

Gradient Control of Magnetic Properties in Electroless Deposited CoNiP Films

T. Homma, M.Suzuki, T.Osaka

J.Electrochem.Soc. 145(1) p.134 - 1381998/01-

Tapping Mode Atomic Force Microscopy Analysis of the Growth Process of Electroless Nickel-Phosphorus Films on Nonconducting Surfaces

T. Homma, M. Tanabe, K. Itakura, T. Osaka

J.Electrochem.Soc. 144(12) p.4123 - 41271997/12-

Tapping Mode Atomic Force Microscopy Analysis of the Growth Process of Electroless Nickel-Phosphorus Films on Nonconducting Surfaces

T. Homma, M. Tanabe, K. Itakura, T. Osaka

J.Electrochem.Soc. 144(12) p.4123 - 41271997/12-

Compositional Inhomogeneity in Electroless- Deposited CoNiP Films studied By Spin-Echo 59 Co Nuclear Magnetic Resonance

T. Homma, Y. Sezai, T. Osaka, Y. Maeda, D. M. Donnet

J.Magn.Magn.Mater 177(6) p.314 - 3201997/10-

Electrodeposition of Soft Gold From a Thiosulfate-Sulfite Bath for Electronics Applications

T. Osaka, A. Kodera, T. Misato, T. Homma, Y. Okinaka

J.Electrochem.Soc. 144(10) p.3462 - 34691997/10-

Compositional Inhomogeneity in Electroless- Deposited CoNiP Films studied By Spin-Echo 59 Co Nuclear Magnetic Resonance

T. Homma, Y. Sezai, T. Osaka, Y. Maeda, D. M. Donnet

J.Magn.Magn.Mater 177(6) p.314 - 3201997/10-

Electrodeposition of Soft Gold From a Thiosulfate-Sulfite Bath for Electronics Applications

T. Osaka, A. Kodera, T. Misato, T. Homma, Y. Okinaka

J.Electrochem.Soc. 144(10) p.3462 - 34691997/10-

Noise Properties of an Electroless-deposited CoNiReP Perpendicular Magnetic Prcording Medium and a Perpendicular / Longitudinal Composite Medium

J. Hokkyo, T. Osaka, T. Homma, T. Onoue, N. Miyamoto

J.Magn.Soc.Jpn. 21(S2) p.525 - 5281997/09-

Noise Properties of an Electroless-deposited CoNiReP Perpendicular Magnetic Prcording Medium and a Perpendicular / Longitudinal Composite Medium

J. Hokkyo, T. Osaka, T. Homma, T. Onoue, N. Miyamoto

J.Magn.Soc.Jpn. 21(S2) p.525 - 5281997/09-

A Study on Gowth Processes of CoNiP Perpendicular Magnetic Anisotropy Films Electroless-Deposited at Room Temperature

T. Homma, Y. Sezai, T. Osaka

Electrochim. Acta 42(20) p.3041 - 30471997/07-

A Study on Gowth Processes of CoNiP Perpendicular Magnetic Anisotropy Films Electroless-Deposited at Room Temperature

T. Homma, Y. Sezai, T. Osaka

Electrochim.Acta. 42(20) p.3041 - 30471997/07-

垂直面内複合型媒体の記録再生特性

黒川義昭,本間敬之,逢坂哲彌

日本応用磁気学会誌 21(6) p.977 - 9821997/06-

CoCrTa/Cr磁性薄膜におけるSi基板前処理効果の検討

逢坂哲彌,本間敬之,黒川義昭,田口智一,瀧澤敦尚

日本応用磁気学会誌 21(4) p.213 - 2161997/04-

リングヘッド-垂直面内複合型媒体系におけるスペーシングの影響

黒川義昭,長崎 顕,本間敬之,逢坂哲彌

日本応用磁気学会誌 21(S1) p.163 - 1681997/04-

In Situ Observation of Lithium Deposition Processes in Solid Polymer and Gel Electrolytes

T. Osaka, T. Homma, T. Momma, H. Yarimizu

J. Electroanal. Chem. 421(1) p.153 - 1581997-

In Situ Observation of Lithium Deposition Processes in Solid Polymer and Gel Electrolytes

T. Osaka, T. Homma, T. Momma, H. Yarimizu

J. Electroanal. Chem. 421(1) p.153 - 1581997-

Effect of Perpendicular Layer Thickness on Read/Write Characteristics of Perpendicular/Longitudinal Composite Media Using Ring-Type Head

Y. Kurokawa, A. Nagasaki, T. Homma, T. Osaka

IEEE Trans.Magn 32(6) p.3810 - 38121996/11-

Effect of Perpendicular Layer Thickness on Read/Write Characteristics of Perpendicular/Longitudinal Composite Media Using Ring-Type Head

Y. Kurokawa, A. Nagasaki, T. Homma, T. Osaka

IEEE Trans.Magn 32(6) p.3810 - 38121996/11-

高速銅電析によるプリント配線板用銅箔のモルフォロジーに及ぼす塩素イオンとにかわの相乗作用

逢坂哲彌,榊原彰良,田村圭有,本間敬之,沖中 裕

回路実装学会誌 11(7) p.494 - 4991996/07-

CoCrTa/Cr磁性薄膜のSi(100)基板上への成膜における基板前処理効果

逢坂哲彌,本間敬之,黒川義昭,田口智一

電気化学および工業物理化学 64(7) p.850 - 8511996/07-

Magnetic Force Microscopy Analysis of Micromagnetization Mode of Double-Layered Perpendicular Magnetic Recording Media

T.Homma, Y.Kurokawa, T.Nakamura, T.Osaka, I.Otsuka

J.Vac.Sci.Technol B 14(2) p.1184 - 11871996/04-

リングヘッド/垂直面内複合型媒体系のピークシフト特性

黒川義昭,長崎 顕,本間敬之,逢坂哲彌

日本応用磁気学会誌 20(2) p.141 - 1441996/04-

Magnetic Force Microscopy Analysis of Micromagnetization Mode of Double-Layered Perpendicular Magnetic Recording Media

T.Homma, Y.Kurokawa, T.Nakamura, T.Osaka, I.Otsuka

J.Vac.Sci.Technol B 14(2) p.1184 - 11871996/04-

Correlation between Magnetic Properties and Phase-Separated Microstructure of Electroless CoNiP Perpendicular Magnetic Recording Media

T. Homma, T. Osaka, Y. Yamazaki, T. Namikawa

Scripta Metallurgica et Materialia 33(10) p.1569 - 15731995/11-

Effects of Head Parameters on Read/Write Characteristics of Perpendicular/Longitudinal Composite Media

Y. Kurokawa, A. Nagasaki, T. Homma, T. Osaka

IEEE Trans. Magn. 31(6) p.3102 - 31041995/11-

Correlation between Magnetic Properties and Phase-Separated Microstructure of Electroless CoNiP Perpendicular Magnetic Recording Media

T. Homma, T. Osaka, Y. Yamazaki, T. Namikawa

Scripta Metallurgica et Materialia 33(10) p.1569 - 15731995/11-

Effects of Head Parameters on Read/Write Characteristics of Perpendicular/Longitudinal Composite Media

Y. Kurokawa, A. Nagasaki, T. Homma, T. Osaka

IEEE Trans. Magn. 31(6) p.3102 - 31041995/11-

走査トンネル顕微鏡による銀電析過程の観察

中村高士,本間敬之,逢坂哲彌

表面技術 46(10) p.956 - 9591995/10-

Electrochemically Deposited Thin Films for Magnetic Recording Devices

T. Osaka, T. Homma

Interface 4(2) p.421995/04-

機能性薄膜材料の評価(1)磁性薄膜材料

本間敬之

電気化学および工業物理化学/電気化学協会 63(4) 1995/04-

Electrochemically Deposited Thin Films for Magnetic Recording Devices

T. Osaka, T. Homma

Interface 4(2) p.421995/04-

Raman Microscopy and Scanning Surface Potential Microscopy Analysis of Nanoscale Defects on Si Wafer Surfaces

T. Homma, M. Kato, N. Kubo, K. Sakata, N. Kubo, M. Yanagisawa

J. Electrochem. Soc. 156p.H475 - H478

Estimation of Redox Potential of Strained Si by Density Functional Theory Calculation

K. Sakata, S. Ishizaki, H. Nakai, T. Homma

J. Phys. Chem. C 112p.3104 - 3107

Characterization of the Surface Layer on Strained Si Wafer by Electrochemical Methods

K. Sakata, M. Kato, N. Kubo, T. Senda, K. Izunome, T. Homma

J. Phys. Chem. C 112p.3785 - 3788

Books And Publication

Electrocrystallizationin Nanotechnology

G. Staikov, Ed.,

Wiley-VCH2007-

実験化学講座 24 表面・界面

谷口 功,山田太郎編

丸善2007/01-

実験化学講座 27 機能性材料

逢坂哲彌,本間敬之編

丸善2004/09-

表面処理工学—基礎と応用

表面技術協会編

日刊工業新聞社2000/02-

Lecture And Oral

電解・無電解めっきの基礎(Ⅱ)-反応メカニズムの理論的解析と機能特性・ナノ構造制御

本間敬之

表面処理基礎講座(Ⅱ)Invitation Yes2018/11/19

Detail

Venue:東京

Process Development and Analysis of Si Electrodeposition in Ionic Liquid

T. Homma ,Y. Tsuyuki ,M. Kunimoto ,Y. Fukunaka ,P. Pianetta

ECS and SMEQ Joint International Meeting (AiMES2018)Invitation Yes2018/10/03

Detail

Venue:Cancun

In-situ SERS Analysis of SEI Formation at Graphite Electrode in Li Ion Battery using Manipulated Plasmonic Sensor Element

M. Kunimoto ,M. Yanagisawa ,T. Homma

ECS and SMEQ Joint International Meeting (AiMES2018)2018/10/03

Detail

Venue:Cancun

First-Principles Study of Catalytic Activity of Cu, Ni and Pd Surface for Formaldehyde and Hypophosphite As Reducing Agents in Electroless Deposition

Y. Onabuta ,M. Kunimoto ,K. Nakai ,T. Homma

ECS and SMEQ Joint International Meeting (AiMES2018)2018/10/02

Detail

Venue:Cancun

Purification of Diatomaceous Earth using Leaching and Liquid-Liquid Extraction Processes to Produce High Purity Silica for Solar-Grade Silicon

Yelchur Venkata Akash ,Collen Takaza ,M. Mimura ,M. Kunimoto ,Y. Fukunaka ,T. Homma

ECS and SMEQ Joint International Meeting (AiMES2018)2018/10/02

Detail

Venue:Cancun

Observation and classification of microorganisms using multi-modal surface-enhanced Raman microscopy

M. Bertz ,M. Yanagisawa ,M. Kunimoto ,T. Homma

The 3rd International Symposium on Creation of Life Innovation Materials for Interdisciplinary and International Researcher Development (iLIM-3)Invitation Yes2018/09/25

Detail

Venue:Tokyo

プラズモンセンサを利用したSERS測定によるLiイオン二次電池負極SEIの解析の試み

國本雅宏 ,柳沢雅広 ,本間敬之

2018年電気化学秋季大会2018/09/25

Detail

Venue:石川

電極表面形態に着目したZn負極アノード溶解とZnO形成過程の解析

大谷智博 ,工藤亮介 ,福中康博 ,本間敬之

2018年電気化学秋季大会2018/09/25

Detail

Venue:石川

無電解析出における還元剤酸化反応過程に対する溶媒効果の第⼀原理計算解析

女部田勇介 ,國本雅宏 ,中井浩巳 ,本間敬之

表面技術協会 第138回講演大会2018/09/13

Detail

Venue:北海道

Znアノード反応におけるZnO析出過程のin situラマン分光法による解析

安田哲也 ,大谷智博 ,國本雅宏 ,柳沢雅広 ,本間敬之

表面技術協会 第138回講演大会2018/09/13

Detail

Venue:北海道

Review: Modeling Study on Gravitational Effects to Electrochemical Interfacial Phenomena during Charging/Discharging Operation with Cu-Electrodes Symmetry Cell

Y. Fukunaka ,M. Kunimoto ,S. Wodarz ,T. Homma

70th Annual Meeting of the International Society of ElectrochemistryInvitation Yes2018/09/04

Detail

Venue:Bologna

Electrochemical Fabrication of Micro/nano Structured Plasmonic Sensors for Surface Enhanced Raman Scattering Analysis

T. Homma ,M. Kunimoto ,M. Bertz ,M. Saito ,M. Yanagisawa

69th Annual Meeting of the International Society of ElectrochemistryInvitation Yes2018/09/03

Detail

Venue:Bologna

Developing plasmonic sensors for surface enhanced Raman scattering microscopy for in situ analysis of electrochemical processes

T. Homma ,M. Bertz ,M. Kunimoto ,M. Saito ,M. Yanagisawa

The 12th International Symposium on Electrochemical Micro & Nano System Technologies (EMNT2018)Invitation Yes2018/08/31

Detail

Venue:Milano

Analysis of Hydrogen Gas Evolution Phenomena on Micro-Patterned Ni Electrode during Alkaline Water Electrolysis

T. Fujimura ,W. Hikima ,Y. Fukunaka ,T. Homma

The 12th International Symposium on Electrochemical Micro & Nano System Technologies (EMNT2018)2018/08/29

Detail

Venue:Milano

電析FePtCuのL10規則化促進に向けた微細構造制御

堤優也 ,神戸茉奈 ,Giovanni Zangari ,本間敬之

IEICE 磁気記録・ストレージ研究会(MRIS)2018/07/06

Detail

Venue:東京

Electrochemical micro/nano fabrication processes – Process development and mechanistic understanding –

T. Homma

11th International Workshop on Engineering of Functional Interfaces (EnFI 2018)Invitation Yes2018/07/02

Detail

Venue:Wittenberg

電解・無電解めっきの基礎

本間敬之

表面処理基礎講座(I)Invitation Yes2018/06/26

Detail

Venue:東京

Observation and Classification of Microorganisms Using Multi-Modal Surface-Enhanced Raman Microscopy Based on Plasmonic Sensors

M. Bertz ,M. Yanagisawa ,M. Kunimoto ,T. Homma

10th International Symposium on Organic Molecular Electronics (ISOME 2018)2018/05/31

Detail

Venue:Saga

Analysis of ZnO Growth Process and Effect of Li+ Additive on Zn Negative Electrode

T. Otani ,M. Nagata ,Y. Fukunaka ,T. Homma

14 th International Fischer Symposium2018/05/28

Detail

Venue:Seeon

理論化学計算とマイクロ空間計測による界面反応解析の実例

國本雅宏

電気化学界面シミュレーションコンソーシアムInvitation Yes2018/05/22

Detail

Venue:東京

Electrodeposition in Li in Non-Aqueous Solution

Y. Fukunaka ,T. Homma ,T. Nishida ,K. Nishikawa

233 rd Meetnigs of the Electrochemical Society (233 rd ECS Meeting)Invitation Yes2018/05/15

Detail

Venue:Seattle

Molecular-Level Analysis of Surface Species for Electrochemical Deposition Processes Using Density Functional Theory Calculations and Surface Enhanced Raman Microscopy with Plasmonic Sensors

T. Homma ,M. Kunimoto ,M. Bertz ,M. Yanagisawa

233 rd Meetnigs of the Electrochemical Society (233 rd ECS Meeting)Invitation Yes2018/05/15

Detail

Venue:Seattle

Development of Silica Microlens Array Sensor for in situ SERS Analysis of Electrode Reaction Processes

A. Hayashi ,Y. Sato ,M. Kunimoto ,M. Yanagisawa ,T. Homma

22nd Topical Meeting of the International Society of Electrochemistry2018/04/18

Detail

Venue:Tokyo

Analysis of Electrodeposition Process of L1 0 -Ordered FePtCu Nanodot Arrays

M. Kambe ,S. Wodarz ,S. Hashimoto ,G. Zangari ,T. Homma

22nd Topical Meeting of the International Society of Electrochemistry2018/04/18

Detail

Venue:Tokyo

Fabrication of plasmon sensor with Ag@TiO 2 core-shell nanoparticles for surface-enhanced Raman scattering

Y. Kashimata ,Y. Sato ,M. Kunimoto ,M. Yanagisawa ,T. Homma

22nd Topical Meeting of the International Society of Electrochemistry2018/04/18

Detail

Venue:Tokyo

First-Principles Study of Reaction Mechanism of Reducing Agents on Ni and Cu in Electroless Deposition Processes

Y. Onabuta ,M. Kunimoto ,H. Nakai ,T. Homma

22nd Topical Meeting of the International Society of Electrochemistry2018/04/18

Detail

Venue:Tokyo

Effect of Metal Additives on Electrodeposited Bi-Sb- Te Films for Micro Thermoelectric Devices

M. Sugie ,M. Saito ,H. Takahashi ,I. Terasaki ,T. Homma

22nd Topical Meeting of the International Society of Electrochemistry2018/04/18

Detail

Venue:Tokyo

In-situ analysis for interaction of additives for electrodeposition in through silicon via using surface enhanced Raman scattering

T. Yasuda ,F. Yamaguchi ,M. Kunimoto ,M. Yanagisawa ,T. Homma

22nd Topical Meeting of the International Society of Electrochemistry2018/04/18

Detail

Venue:Tokyo

Morphology Control of Electrodeposited ZnO Patterns for Micro Thermoelectric Devices

K. Yoshitoku ,H. Matsuo ,M. Saito ,H. Takahashi ,I. Terasaki ,T. Homma

22nd Topical Meeting of the International Society of Electrochemistry2018/04/18

Detail

Venue:Tokyo

Effect of electrolyte flow on the evolution of microsteps during zinc electrodeposition

Y. Masuda ,T. Otani ,Y. Fukunaka ,T. Homma

22nd Topical Meeting of the International Society of Electrochemistry2018/04/16

Detail

Venue:Tokyo

Influences of ZnO Formation on Morphological Evolution of Zn Negative Electrode

T. Otani ,M. Nagata ,Y. Fukunaka ,T. Homma

22nd Topical Meeting of the International Society of Electrochemistry2018/04/16

Detail

Venue:Tokyo

Optimization of flow type reactor for efficient extraction of B for production of high purity silica のin situ SERS 解析

Yelchur Venkata Akash, M. Mimura, M. Kunimoto, Y. Fukunaka, T. Homma

The 98th CSJ Annual Meeting (2018)2018/03/21

Detail

Venue:Funabashi

表面増強ラマン計測による電極界面水素イオン濃度のin situ解析

吉田悟, 國本雅宏, 柳沢雅広, 本間敬之

表面技術協会第137回講演大会2018/03/13

Detail

Venue:東京

Si 電析プロセスにおける還元反応機構に及ぼす微量水分 の影響の理論的解析

大貫浩介, 真田歩, 國本雅宏, 中井 浩巳, 本間敬之

表面技術協会第137回講演大会2018/03/13

Detail

Venue:東京

N型及びp型酸化物電析膜を用いたマイクロ熱電変換素子 の作製

井尻博之, 松尾日向子, 吉徳光一朗, 斎藤美紀子, 高橋英史, 寺崎一郎, 本間敬之

表面技術協会第137回講演大会2018/03/12

Detail

Venue:東京

イオン液体中におけるAlおよびPドープSi薄膜電析と電気特性評価

渡貫修永, 露木康博, 高井秀典, 福中康博, 本間敬之

表面技術協会第137回講演大会2018/03/12

Detail

Venue:東京

透過型プラズモンセンサを用いた電極界面水素イオン濃度 のin situ SERS 解析

佐藤祐太, 國本雅宏, 柳沢雅広, 本間敬之

電気化学会第85回大会2018/03/10

Detail

Venue:東京

Effect of metal additives on molphological evolution of zinc electrodeposition

大谷智博, 福中康博, 本間敬之

第4回分科会ワークショップ『革新的エナジー・ハーべスティングに向けた材料・デバイス技術』2018/03/09

Detail

Venue:東京

水電解反応における気泡成長挙動に着目した触媒電極形成とその解析

藤村樹, 引間稚菜, 福中康博, 本間敬之

第4回分科会ワークショップ『革新的エナジー・ハーべスティングに向けた材料・デバイス技術』2018/03/09

Detail

Venue:東京

マイクロパターン電極を用いた水素電極反応への表面濡れ性の影響の解析

引間稚菜, 藤村樹, 福中康博, 本間敬之

電気化学会第85回大会2018/03/09

Detail

Venue:東京

宇宙用電池における微小重力下での安全評価手法開発のための電気化学界面現象の究明

本間敬之, 福中康博, 曽根理嗣, 高橋哲哉, 國本雅宏, ヴォダルツジギー, ロッソマイケル, フランシアーヤン, アルカイアーリチャード

第37回宇宙エネルギーシンポジウムプログラム2018/03/05

Detail

Venue:神奈川

充放電操作と固液界面現象

本間敬之, 福中康博, 國本雅宏, ヴォダルツジギー

第 32 回 宇宙環境利用シンポジウム プログラム2018/01/15

Detail

Venue:神奈川県相模原市

ZnO電解析出を用いたマイクロ熱電変換素子の作製

松尾日向子, 吉徳光一朗, 齋藤美紀子, 園部義明, 高橋英史, 寺崎一郎, 本間敬之

早稲田大学ナノテクノロジーフォーラム 第 3 回分科会ワークショップ『環境問題と対策技術の最前線』2017/12/19

Detail

Venue:東京

ELECTRODEPOSITION OF SI THIN FILMS IN IONIC LIQUID WITH GROWTH CONTROL FROM INITIAL STAGES

高井秀典, 露木康博, 藤村樹, 國本雅宏, 福中康博, P. Pianetta, 本間敬之

早稲田大学ナノテクノロジーフォーラム 第 3 回分科会ワークショップ『環境問題と対策技術の最前線』2017/12/19

Detail

Venue:東京

プラズモンセンサ素子を用いた電極表面反応の解析

國本雅宏, 柳沢雅広, 本間敬之

表面技術協会 関東支部 第93回講演会Invitation Yes2017/12/15

Detail

Venue:長野

Fabrication of Channel Type Mixing Devices for Efficient Solvent Extraction for High Purity Silica Production

Yelchur Venkata Akash, M. Mimura, M. Kunimoto, Y. Fukunaka, T. Homma

5th DGIST-Waseda Workshop on Electrochemistry 20172017/12/12

Detail

Venue:Tokyo

Electrodeposition of ZnO from Acetate Bath for Thermoelectric Devices

H. Matsuo, Y. Koichiro, D. Furuyama, M. Saito, T. Homma

5th DGIST-Waseda Workshop on Electrochemistry 20172017/12/12

Detail

Venue:Tokyo

Effect of metal additives on molphological evolution of zinc electrodeposition

T. Otani, Y. Fukunaka, T. Homma

5th DGIST-Waseda Workshop on Electrochemistry 20172017/12/12

Detail

Venue:Tokyo

Electrodeposition of Si Thin Films ㏌ Ionic Liquid with Growth Control from Initial Stages

H. Takai, Y. Tsuyuki, T. Fujimura, M. Kunimoto, Y. Fukunaka, P. Pianetta, T. Homma

5th DGIST-Waseda Workshop on Electrochemistry 20172017/12/12

Detail

Venue:Tokyo

溶融CaCl2 中における液体Zn 陰極上でのSiO2 電解還元反応

安田幸司, 馬元嘉, 井戸彬文, 萩原理加, 野平俊之, 本間敬之

第41回電解技術討論会-ソーダ工業技術討論会-2017/11/21

Detail

Venue:京都

ELECTRODEPOSITION OF SI THIN FILMS IN IONIC LIQUID WITH GROWTH CONTROL FROM INITIAL STAGES

H. Takai, Y. Tsuyuki, T. Fujimura, M. Kunimoto, Y. Fukunaka, P. Pianetta, T. Homma

27 th International Photovoltaic Science and Engineering Conference (PVSEC-27)2017/11/14

Detail

Venue:Shiga

Znアノード反応におけるZnO形成と充放電挙動の解析

永田雅人, 大谷智博, 福中康博, 本間敬之

第7回CSJ化学フェスタ20172017/10/19

Detail

Venue:東京

ZnO電解析出を用いたマイクロ熱電変換素子の作製

松尾日向子, 吉徳光一朗, 齋藤美紀子, 園部義明, 高橋英史, 寺崎一郎, 本間敬之

第7回CSJ化学フェスタ20172017/10/19

Detail

Venue:東京

水電解反応における気泡成長挙動に着目した触媒電極形成とその解析

藤村樹, 引間稚菜, 福中康博, 本間敬之

第7回CSJ化学フェスタ20172017/10/17

Detail

Venue:東京

Surface Reactivity of a Tin Electrode in Organic Carbonate Electrolytes

I. Hasa, I. Hasa, T. Otani, T. Homma, P. N. Ross, R. Kostecki

232 nd ECS Meeting2017/10/04

Detail

Venue:National Harbor

SERS Analysis on Interfacial Reaction of Rechargeable Battery Electrode using Plasmonic Sensor Element – SEI Formation at Graphite Electrode Surface

M. Kunimoto, Y.Sun, M. Yanagisawa, T. Homma

232 nd ECS Meeting2017/10/03

Detail

Venue:National Harbor

Gravitational Level Effects on the Coupling Phenomena between Mass Transfer and Morphorogical Variation Rate

T. Nishida, K. Nishikawa, H. Matsushima, T. Homma, M. Rosso, Y. Fukunaka

232 nd ECS Meeting2017/10/03

Detail

Venue:National Harbor

Fabrication of Channel Type Mixing Devices for Efficient Solvent Extraction for High Purity Silica Production

Yelchur Venkata Akash, M. Mimura, M. Kunimoto, Y. Fukunaka, T. Homma

232 nd ECS Meeting2017/10/03

Detail

Venue:National Harbor

Effect of Cu Addition and Annealing on Electrodeposited Bi-Te Films for Micro Thermoelectric Devices

M. Sugie, D. Furuyama, M. Saito, Y. Sonobe, H. Takahashi, I. Terasaki, T. Homma

232 nd ECS Meeting2017/10/03

Detail

Venue:National Harbor

Preparation of Solar Grade Silicon by Interfacial and Electrochemical Processes

T. Homma, M. Kunimoto, Y. Fukunaka, T. Nohira

International Conference on Materials and Systems for Sustainability (ICMaSS2017)Invitation Yes2017/09/30

Detail

Venue:Nagoya

酢酸浴によるZnOの電析条件の検討と熱電変換素子への応用

吉徳光一朗, 松尾日向子, 齋藤美紀子, 本間敬之

表面技術協会第136回講演大会2017/09/15

Detail

Venue:石川

Si電析プロセスにおける還元種と有機溶媒の相互作用の理論的解析

真田歩, 國本雅宏, 露木康博, 福中康博, 中井浩巳, 本間敬之

2017年電気化学秋季大会2017/09/10

Detail

Venue:長崎

Analysis on Growth Process of Irregular Shaped Zn Electrodeposits and Roles of Metal Additives

T. Otani, Y. Masuda, Y. Fukunaka, T. Homma

68 th Annual Meeting of the International Society of Electrochemistry2017/08/31

Detail

Venue:Providence, Rhode Island

Dendrite Growth Rate of Li Electrodeposited in PC and Ionic Liquid

Y. Fukunaka, T. Nishida, K. Nishikawa, T. Homma

68 th Annual Meeting of the International Society of ElectrochemistryInvitation Yes2017/08/29

Detail

Venue:Providence, Rhode Island

Connecting Anodic Gas Evolution in Aqueous and High Temperature Molten Electrolyte Systems Via the Current Interrupt Technique

B. Chmielowiec, T. Fujimura, T. Otani, K. Aoyama, T. Nohira, T. Homma, A. Allanore

68 th Annual Meeting of the International Society of Electrochemistry2017/08/28

Detail

Venue:Providence, Rhode Island

ENHANCEMENT OF L10 ORDERING IN ELECTRODEPOSITED FePt NANODOT ARRAYS

S. Wodarz, S. Hashimoto, M. Kambe, G. Zangari, T. Homma

The 28th Magnetic Recording Conference (TMRC 2017)2017/08/02

Detail

Venue:Tsukubn

電解析出法によるFePtナノドットアレイのL1 0 規則化の促進及び微細構造解析

神戸茉奈, ヴォダルツジギー, 橋本尚吾, GiovanniZangari, 本間敬之

磁気記録・ストレージ研究会2017/07/07

Detail

Venue:東京

無電解めっきプロセスの理論的・実験的解析

本間敬之, 國本雅宏, 柳沢雅広

ナノプレーティング研究会 第62回例会Invitation Yes2017/06/29

Detail

Venue:神奈川

電解・無電解めっきの基礎

本間敬之

表面処理基礎講座(I)Invitation Yes2017/06/28

Detail

Venue:東京

Electrochemical nano/micro Fabrication and Processing for Functional Structures, Devices and Materials - Process Development and Mechanistic Understanding

T. Homma

11 th European Symposium on Electrochemical EngineeringInvitation Yes2017/06/07

Detail

Venue:Prague

Analysis of Cathodic Reaction Process of SiCl4 in Ionic Liquids

Y. Tsuyuki, T. Fujimura, M. Kunimoto, Y. Fukunka, P. Pianetta, T. Homma

231 st ECS Meeting2017/05/30

Detail

Venue:New Orleans

Theoretical Analysis of SiCl4 Reaction Mechanism for Si Electrodeposition Process in TMHA-TFSI as Ionic Liquids

T. Fujimura, Y. Tsuyuki, M. Kunimoto, Y. Fukunka, T. Homma

231 st ECS Meeting2017/05/30

Detail

Venue:New Orleans

透過型表面増強ラマンセンサを用いた埋もれた界面測定解析

柳沢雅広, 齋藤美紀子, 國本雅宏, 本間敬之

平成 29 年度日本分光学会年次講演会2017/05/25

Detail

Venue:東京

ラマン分光法を用いたトライボロジーのオペランド観察:液体潤滑

柳沢雅広, 國本雅宏, 齋藤美紀子, 本間敬之

トライボロジー会議 2017春 東京2017/05/17

Detail

Venue:東京

ラマン分光法を用いたトライボロジーのオペランド観察:ドライ摩擦

柳沢雅広, 國本雅宏, 齋藤美紀子, 本間敬之

トライボロジー会議 2017春 東京2017/05/17

Detail

Venue:東京

ラマン分光法を用いた接触摺動界面の観察

柳沢雅広, 國本雅宏, 齋藤美紀子, 本間敬之

トライボロジー会議 2017春 東京2017/05/17

Detail

Venue:東京

ラマン分光法を用いた炭素系ヘッド保護膜の耐熱性観察

柳沢雅広, 國本雅宏, 齋藤美紀子, 本間敬之

トライボロジー会議 2017春 東京2017/05/17

Detail

Venue:東京

テラワット級太陽光発電のためのプロセス技術革新

本間敬之

早稲田応用化学会 先進研究講演会 「応用化学最前線-教員からのメッセージ」Invitation Yes2017/04/22

Detail

Venue:東京

溶融CaCl2中のSiO2直接電解還元で製造したSiの純度およびライフタイム測定

鍾明, 安田幸司, 野平俊之, 本間敬之

電気化学会第84回大会2017/03/25

Detail

Venue:東京

パルス電析法を用いたFePtナノドットアレイ形成および微細構造解析

神戸茉奈, ヴォダルツジギー, 齋藤学, 橋本尚吾, Giovanni Zangari, 本間敬之

電気化学会第84回大会2017/03/25

Detail

Venue:東京

銅埋め込み電析における添加剤の拡散・吸着挙動のin situ顕微ラマン分光法による解析

安田哲也, 山口楓太, 國本雅宏, 柳沢正広, 本間敬之

電気化学会第84回大会2017/03/25

Detail

Venue:東京

金属種添加効果に注目したZn mossy構造の電析過程の解析

増田雄太, 大谷智博, 福中康博, 本間敬之

電気化学会第84回大会2017/03/25

Detail

Venue:東京

CHO-k1生細胞の透過型プラズモンセンサを用いた表面増強ラマン分光計測の試み

荒原涼人, Morten Bertz, 柳沢雅宏, 本間敬之

電気化学会第84回大会2017/03/25

Detail

Venue:東京

有機溶媒を用いたp型Si薄膜電析の検討

岩田祥子, 露木康博, 続木南, 福中康博, 本間敬之

電気化学会第84回大会2017/03/25

Detail

Venue:東京

無電解めっきプロセスの理論的・実験的解析

本間敬之

日本金属学会2017年春期(第160回)講演大会Invitation Yes2017/03/16

Detail

Venue:東京

無電解Cu析出プロセスにおけるホルムアルデヒドとチオ尿素の相互作用の理論的解析

女部田勇介, 國本雅宏, 中井浩巳, 本間敬之

表面技術協会第135回講演大会2017/03/10

Detail

Venue:埼玉

Bi-Te系電析膜に対するアニール処理の影響の解析および熱電変換素子への応用

杉江美紗貴, 古山大貴, 齋藤美紀子, 園部義明, 高橋英史, 寺崎一郎, 本間敬之

表面技術協会第135回講演大会2017/03/09

Detail

Venue:埼玉

酢酸イオン存在下でのZnO薄膜の電析と熱電変換材料への応用

吉徳光一朗, 松尾日向子, 齋藤美紀子, 本間敬之

表面技術協会第135回講演大会2017/03/09

Detail

Venue:埼玉

イオン液体を用いたSi電析プロセスにおけるSiCl4反応機構の理論的解析

藤村樹, 内藤健博, 露木康博, 國本雅宏, 福中康博, 本間敬之

早稲田大学ナノテクノロジーフォーラム 第2回分科会ワークショップ 「エネルギー利用と蓄電池に関して」2017/03/07

Detail

Venue:東京

Reduction Mechanism Analysis of SiCl4 during Si Electrodeposition in Ionic Liquids

露木康博, 藤村樹, 國本雅宏, 福中康博, P. Pianetta, 本間敬之

早稲田大学ナノテクノロジーフォーラム 第2回分科会ワークショップ 「エネルギー利用と蓄電池に関して」2017/03/07

Detail

Venue:東京

Modeling and Spectroscopic Analysis of the Liquid-liquid Extraction of Boric Acid in Micro Channel Devices

M. Kunimoto,

The 15 th Japanese-German International Workshop on Mathematical Fluid Dynamics(第15回日独流体数学国際研究集会)Invitation Yes2017/01/10

Detail

Venue:Tokyo

Electrochemical nano/micro fablication processes for functional structures and devices - Process development and mecchanistic understanding

T. Homma

International Conference on Material Sciences (SCICON' 16)Invitation Yes2016/12/19

Detail

Venue:Coimbatore

ラマン分光法を用いた動的機械物性と化学構造の同時測定: トライボロジー解析(第1報)

柳沢雅広, 斎藤美紀子, 國本雅宏, 本間敬之

第36回表面科学学術講演会2016/11/29

Detail

Venue:愛知

2,2,4-Trimethyl-1,3-pentanediol (TMPD)を用いたホウ素の溶媒抽出反応における液液界面状態の解析

鈴木隆, 國本雅宏, 福中康博, 本間敬之

第6回CSJ化学フェスタ20162016/11/16

Detail

Venue:東京

新しいラマン分光法を用いたトライボロジー特性と化学構造の同時測定

柳沢雅広, 斎藤美紀子, 國本雅宏, 本間敬之

トライボロジー会議2016秋 新潟2016/10/12

Detail

Venue:新潟

プラズモンセンサによる潤滑膜およびダイヤモンドカーボン膜の加熱挙動の観察

柳沢雅広, 斎藤美紀子, 國本雅宏, 本間敬之

トライボロジー会議2016秋 新潟2016/10/12

Detail

Venue:新潟

Kinetic Studies on Direct Electrolytic Reduction of SiO2 Granules in Molten CaCl2

M. Zhong, X. Yang, K. Yasuda, T. Nohira, T. Homma

PRiME 2016 (230th Meeting of The Electrochemical Society, 2016 Fall Meeting of The Electrochemical Society of Japan)2016/10/07

Detail

Venue:Honolulu, Hawai

Structural Control of Electrodeposited L10-FePt Nanodot Arrays Towards Reduction of Ordering Temperature

S. Wodarz, S. Hashimoto, M. Saitou, G. Zangari, T. Homma

PRiME 2016 (230th Meeting of The Electrochemical Society, 2016 Fall Meeting of The Electrochemical Society of Japan)Invitation Yes2016/10/06

Detail

Venue:Honolulu, Hawai

Electrochemical Synthesis and Characterization of Fe-Ni-Pt Alloy Films

S. Ge, S. Wodarz, S. Hashimoto, M. Saitou, T. Homma, G. Zangari

PRiME 2016 (230th Meeting of The Electrochemical Society, 2016 Fall Meeting of The Electrochemical Society of Japan)2016/10/06

Detail

Venue:Honolulu, Hawai

Electrodeposition of Si Film from Water-Soluble KF-KCl Molten Salt and Gaseous SiCl4

K. Yasuda, K. Saeki, K. Maeda, T. Nohira, R. Hagiwara, T. Homma

PRiME 2016 (230th Meeting of The Electrochemical Society, 2016 Fall Meeting of The Electrochemical Society of Japan)2016/10/06

Detail

Venue:Honolulu, Hawai

The Effect of Bath Condition on The Composition of Si thin Films Electrodeposited in Non-aqueous Solvents

Y. Tsuyuki, M. Tsuzuki, Y. Fukunaka, T. Homma

PRiME 2016 (230th Meeting of The Electrochemical Society, 2016 Fall Meeting of The Electrochemical Society of Japan)2016/10/05

Detail

Venue:Honolulu, Hawai

In-situ Raman Spectroscopy Study on the Preferential Adsorption of Electrolyte Species on Electrode Surface of Lithium Ion Battery

Y. Sun, M. Yanagisawa, T. Homma

PRiME 2016 (230th Meeting of The Electrochemical Society, 2016 Fall Meeting of The Electrochemical Society of Japan)2016/10/05

Detail

Venue:Honolulu, Hawai

Formation of Nanoporous Electrode on Aligned CNT Films Using Dealloying

M. Saito, J. Mizuno, M. Kusunoki, H. Nishikawa

PRiME 2016 (230th Meeting of The Electrochemical Society, 2016 Fall Meeting of The Electrochemical Society of Japan)2016/10/05

Detail

Venue:Honolulu, Hawai

Growth Behavior of ZnO during Discharge of Zinc Negative Electrode

T. Otani, M. Nagata, Y. Fukunaka, T. Homma

PRiME 2016 (230th Meeting of The Electrochemical Society, 2016 Fall Meeting of The Electrochemical Society of Japan)2016/10/04

Detail

Venue:Honolulu, Hawai

Electrodeposition of ZnO from Acetate Bath for Thermoelectric Devices

H. Matsuo, K. Yoshitoku, D. Furuyama, M. Saito, T. Homma

PRiME 2016 (230th Meeting of The Electrochemical Society, 2016 Fall Meeting of The Electrochemical Society of Japan)2016/10/04

Detail

Venue:Honolulu, Hawai

A New Electrolytic Production Process of Silicon Using Liquid Zn Alloy Cathode in Molten Salt

T. Nohira, A. Ido, T. Shimao, X. Yang, K. Yasuda, R. Hagiwara, T. Homma

PRiME 2016 (230th Meeting of The Electrochemical Society, 2016 Fall Meeting of The Electrochemical Society of Japan)2016/10/03

Detail

Venue:Honolulu, Hawai

Development of Novel Process for Producing High-Purity Silicon through Designing Solid/Liquid Interfacial Reactions (2011-2016)

T. Homma

Nucleation & Growth Research Conference -international Workshop of Electrochemical/Materials Processong for Renewable Energy-2016/09/29

Detail

Venue:Kyoto

Computational and Spectroscopic Study of Boron Extraction Reaction at Liquid-Liquid Interface

M. Kunimoto, Y. Fukunaka, T. Homma

Nucleation & Growth Research Conference -international Workshop of Electrochemical/Materials Processong for Renewable Energy-2016/09/27

Detail

Venue:Kyoto

Electrodeposition of Crystalline Silicon Films from Water-soluble KF-KCl Molten Salts

T. Nohira, K. Saeki, K. Yasuda, R. Hagiwara, T. Homma

Nucleation & Growth Research Conference -international Workshop of Electrochemical/Materials Processong for Renewable Energy-2016/09/27

Detail

Venue:Kyoto

Carbothermic Reduction Path of a Silica-Silicon Carbide Pellet Irradiated by Laser Beam

Y. V. Akash, M. Kunimoto, T. Ishikawa, Y. Fukunaka, T. Homma

Nucleation & Growth Research Conference -international Workshop of Electrochemical/Materials Processong for Renewable Energy-2016/09/27

Detail

Venue:Kyoto

Electrodeposition of Crystalline Silicon Films in Water-soluble KF-KCl Molten Salt

K. Saeki, K. Yasuda, T. Nohira, R. Hagiwara, T. Homma

Nucleation & Growth Research Conference -international Workshop of Electrochemical/Materials Processong for Renewable Energy-2016/09/27

Detail

Venue:Kyoto

Bahavior of Direct Electrolytic Reduction of SiO2 in Molten CaCl2

A. Ido, X. Yang, K. Yasuda, T. Nohira, R. Hagiwara, T. Homma

Nucleation & Growth Research Conference -international Workshop of Electrochemical/Materials Processong for Renewable Energy-2016/09/27

Detail

Venue:Kyoto

The Kinetic Study on the Direct Electrolytic Reduction of SiO2 Powder in Molten CaCl2

M. Zhong, X. Yang, K. Yasuda, T. Nohira, T. Homma

Nucleation & Growth Research Conference -international Workshop of Electrochemical/Materials Processong for Renewable Energy-2016/09/27

Detail

Venue:Kyoto

Effects of Metal Additives on Morphological Evolution of Zinc Electrodeposition

T. Otani, Y. Fukunaka, T. Homma

Nucleation & Growth Research Conference -international Workshop of Electrochemical/Materials Processong for Renewable Energy-2016/09/27

Detail

Venue:Kyoto

Reduction Mechanism Analysis of SiCl4 during Si Electrodeposition in Ionic Liquids

Y. Tsuyuki, T. Fujimura, M. Kunimoto, Y. Fukunaka, P. Pianetta, T. Homma

Nucleation & Growth Research Conference -international Workshop of Electrochemical/Materials Processong for Renewable Energy-2016/09/27

Detail

Venue:Kyoto

Theoretical Analysis of SiCl4 Reaction Mechanism for Si Electrodeposition Process in Ionic Liquids

T. Fujimura, M. Kunimoto, T. Homma

Nucleation & Growth Research Conference -international Workshop of Electrochemical/Materials Processong for Renewable Energy-2016/09/27

Detail

Venue:Kyoto

無電解Cu析出プロセスにおけるチオ尿素作用機構のSERSによる解析

吉田悟, 國本雅宏, 柳沢雅広, 本間敬之

表面技術協会第134回講演大会2016/09/01

Detail

Venue:宮城

DFT and SERS Study on the Effect of Thiourea for Electroless Cu Deposition Process

M. Kunimoto, S. Yoshida, M. Yanagisawa, T. Homma

EMNT20162016/08/17

Detail

Venue:Brussels

Analysis on electrodeposition process of mossy shaped zinc

T. Otani, M. Nagata, Y. Fukunaka, T. Homma

EMNT20162016/08/17

Detail

Venue:Brussels

Theoretical and In Situ SERS Analysis on the Electrochemical Micro/Nano Fabrication Processes

T. Homma

The 5th International Symposium on Materials Science Surface Technology 2016 (MSST2016)Invitation Yes2016/08/03

Detail

Venue:Yokohama

電解析出法による多層構造を有したFePtナノドットアレイの低温L10規則化の検討

齋藤学, 橋本尚吾, ヴォダルツジギー, G. Zangari, 本間敬之

磁気記録・情報ストレージ研究会(MR)2016/07/08

Detail

Venue:東京

電解・無電解めっきの基礎

本間敬之

表面技術協会 夏季セミナー「表面処理基礎講座(Ⅰ)」Invitation Yes2016/06/28

Detail

Venue:東京

Life Estimation of Carbon Overcoat on Magnetic Media for Heat-Assisted Magnetic Recording Using Novel Raman Spectroscopy

M. Yanagisawa, T. Homma, M. Kunimoto

ASME 2016 Conference on Information Storage and Processing Systems (ISPS2016)2016/06/20

Detail

Venue:Santa Clara, CA

Depth Profile Analysis of Chemical Structures Around Lubricant/Overcoat Interface Using Plasmonic Sensor

M. Yanagisawa, T. Homma, M. Kunimoto

ASME 2016 Conference on Information Storage and Processing Systems (ISPS2016)2016/06/20

Detail

Venue:Santa Clara, CA

Preparation of Solar-Grade Silicon By Chemical and Electrochemical Processes

T. Homma, M. Kunimoto, X. Yang, K. Yasuda, Y. Fukunaka, T. Nohira,

229th Meeting of the Electrochemical Society2016/06/01

Detail

Venue:San Diego

DLC薄膜のレーザー加熱温度と熱劣化の同時測定および寿命推定

國本雅宏, 本間敬之

トライボロジー会議2016春 東京2016/05/23

Detail

Venue:東京

Theoretical and Experimental Analyses of Additive Effects in Electrochemical Deposition Processes

M. Kunimoto, T. Homma

3rd DGIST-WASEDA Workshop on electrochemistry2015/12/11

Detail

Venue:Tokyo

Analysis of Initial Deposition Stage of Co-Pt Nanodot Arrays

S. Wodarz, T. Homma

3rd DGIST-WASEDA Workshop on electrochemistry2015/12/10

Detail

Venue:Tokyo

Electrodeposition of Si Thin Films in Ionic Liquids for Solar Cell Applications

Y. Tsuyuki, M. Tsuzuki, Y. Fukunaka, T. Homma

3rd DGIST-WASEDA Workshop on electrochemistry2015/12/10

Detail

Venue:Tokyo

電解・無電解めっきの基礎 (Ⅱ)-反応メカニズムの理論的解析と機能特性・ナノ構造制御

本間敬之

表面技術協会 冬季セミナー 「表面処理基礎講座(Ⅱ)」Invitation Yes2015/11/25

Detail

Venue:東京

Study on chemical structure inside APTES SAMs by using SERS: depth profile and phase transition process

Y. Sun, M. Yanagisawa, M. Kunimoto, M. Nakamura, T. Homma

第5回CSJ化学フェスタ20152015/10/14

Detail

Venue:東京

高純度シリカ精製のための酸洗浄におけるpHの不純物除去率への影響

中嶋一輝, 堀江舜介, 國本雅宏, 福中康博, 本間敬之

第5回CSJ化学フェスタ20152015/10/13

Detail

Venue:東京

高純度シリカ精製にむけた溶液処理プロセスにおける塩基性溶液の影響

堀江舜介, 中嶋一輝, 國本雅宏, 福中康博, 本間敬之

第5回CSJ化学フェスタ20152015/10/13

Detail

Venue:東京

Carbothermic Reduction Path of a Silica-Silicon Carbide Pellet Irradiated by Laser Beam

Y. Akash, M. Kunimoto, T. Ishikawa, Y. Fukunaka, T. Homma

第5回CSJ化学フェスタ20152015/10/13

Detail

Venue:東京

Coupling Phenomena Between Micromorphological Evolution and Ionic Mass Transfer Rate during Ag Electrodeposition in AgNO3 Aqueous Solution

Y. Fukunaka, T. Wakatsuki, T. Homma

228th Meeting of The Electrochemical Society (ECS)2015/10/12

Detail

Venue:Arizona

Preparation of Transparent-Type Plasmonic Sensors By the Sol-Gel Process and Electrodeposition

M. Saito, M. Mita, M. Yanagisawa, T. Homma

228th Meeting of The Electrochemical Society (ECS)2015/10/12

Detail

Venue:Arizona

有機溶媒中での電析Si薄膜の作製と組成評価

続木南, 露木康博, P. Anh, 福中康博, 本間敬之

2015年電気化学秋季大会2015/09/12

Detail

Venue:埼玉

電解析出法によるFePtナノドットアレイの超高密度化に向けた形成プロセスの検討

齋藤学, 西家大貴, ヴォダルツジギー, G. Zangari, 本間敬之

2015年電気化学秋季大会2015/09/12

Detail

Venue:埼玉

表面増強ラマン測定による電極界面水素イオン濃度解析

佐々木萌, 花井智也, 國本雅宏, 柳沢雅広, 本間敬之

2015年電気化学秋季大会2015/09/11

Detail

Venue:埼玉

電極界面におけるpH測定系の開発に向けた理論的検討

花井智也, 佐々木萌, 國本雅宏, 柳沢雅広, 中井浩己, 本間敬之

表面技術協会第132回講演大会2015/09/10

Detail

Venue:長野

Electrodeposition of p-type Bi-Sb-Te alloys and fabrication of Π-structured micro-thermoelectric device

D. Furuyama, K. Uda, M. Saito, Y. Sonobe, H. Takahashi, I. Terasaki, T. Homma

The 6th NIMS/MANA-Waseda University International Symposium2015/07/29

Detail

Venue:Tokyo

パルス電析法を用いたFePtナノドットアレイの高保磁力化の検討

西家大貴, ヴォダルツジギー, 謝承達, 齋藤学, 阿部純也, G. Zangari, 本間敬之

磁気記録・情報ストレージ研究会2015/07/10

Detail

Venue:東京

電解・無電解めっきの基礎

本間敬之

表面技術協会 夏季セミナー 「表面処理基礎講座(Ⅰ)」Invitation Yes2015/06/18

Detail

Venue:東京

Growth Control of Electrodeposited Co-Pt Nanodot Arrays

S. Wodarz, J. Abe, T. Homma

13th International Fischer Symposium2015/06/08

Detail

Venue:Lübeck

Computational and Spectroscopic Study for Reaction Mechanism of Boric Acid Extraction in Micro-Channel Device

M. Kunimoto, R. Tamura, T. Oyanagi, N. Matsuo, Y. Fukunaka, H. Nakai, T. Homma

227th Meeting of The Electrochemical Society2015/05/26

Detail

Venue:Chicago, IL

Gravitational Level Effects on Coupling phenomena Between Morphological variations of Electrodeposited Film of ZnO and Mass Transfer Rates

H. Osaki, T. Wakatsuki, T. Homma, Y. Fukunaka

227th Meeting of The Electrochemical Society2015/05/25

Detail

Venue:Chicago, IL

流路型リアクターを用いたホウ素抽出過程のラマン分光法によるin situ解析

小柳高宏, 國本雅宏, 松尾伸史, 福中康博, 本間敬之

電気化学会第82回大会2015/03/16

Detail

Venue:神奈川

シリカ溶液精製プロセスにおけるホウ素抽出反応機構の理論的解析

田村理沙, 國本雅宏, 福中康博, 中井浩巳, 本間敬之

電気化学会第82回大会2015/03/16

Detail

Venue:神奈川

新規な電気化学的ナノ構造形成プロセスの開拓と実践

本間敬之

電気化学会第82回大会Invitation Yes2015/03/15

Detail

Venue:神奈川

溶融CaCl2中における液体Si-Zn合金からのSi析出挙動

安田幸司, 島尾武征, 楊肖, 野平俊之, 萩原理加, 一坪幸輝, 増田賢太, 本間敬之

電気化学会第82回大会2015/03/15

Detail

Venue:神奈川

ゾルゲル法と電解析出法による透過型プラズモンセンサの作製

齋藤美紀子, 三田正弘, 柳沢雅広, 本間敬之

表面技術協会第131回講演大会2015/03/04

Detail

Venue:神奈川

水素電極反応に対するナトリウムの影響の理論的解析の試み

横道拓哉, 國本雅宏, 中井浩巳, 本間敬之

表面技術協会第131回講演大会2015/03/04

Detail

Venue:神奈川

初期析出過程に着目した亜鉛電析挙動の解析

大谷智博, 福中康博, 本間敬之

表面技術協会第131回講演大会2015/03/04

Detail

Venue:神奈川

p型Bi-Sb-Te薄膜のパターン電析および熱電変換素子作製

古山大貴, 宇田和布, 齋藤美紀子, 園部義明, 高橋英史, 寺崎一郎, 本間敬之

表面技術協会第131回講演大会2015/03/04

Detail

Venue:神奈川

Growth Process of Electrodeposited Si Thin Films in Ionic Liquid for Solar Cell Applications

Y. Tsuyuki, T. Anh Pham H., J. Komadina, Y. Fukunaka, T. Homma

The 6th World Conference on Photovoltaic Energy Conversion2014/11/25

Detail

Venue:Kyoto

Depth profiling of APTES self-assembled monolayer using Surface-enhanced Confocal Raman Microspectroscopy

Y. Sun, 柳沢雅広, 國本雅宏, 中村雅俊, 本間敬之

第34回表面科学学術講演会2014/11/07

Detail

Venue:島根

In-situ temperature measurements on the phase change point of monolayer APTES by Surface-enhanced anti-Stokes and Stokes Raman scattering

Y. Sun, M. Yanagisawa, M. Kunimoto, M. Nakamura, T. Homma

The 7th International Symposium
on Surface Science2014/11/06

Detail

Venue:Shimane

EQCM and XPS Analysis of SiCl4 Reduction in Ionic Liquids

Y. Tsuyuki, T. Anh Pham H., J. Komadina, Y. Fukunaka, T. Homma

10th International Symposium on Electrochemical Micro & Nanosystem Technology (EMNT2014)2014/11/06

Detail

Venue:Okinawa

Theoretical Analysis of Additive Effect of Heavy Metals in Au Electrodeposition

M. Kunimoto, T. Yokomich, H. Nakai, T. Homma

10th International Symposium on Electrochemical Micro & Nanosystem Technology (EMNT2014)2014/11/06

Detail

Venue:Okinawa

Analysis of the Initial Stage of Co-Pt Electrodeposition Process at Nanopatterned Substrate

S. Wodarz, T. Otani, H. Hagiwara, T. Homma

10th International Symposium on Electrochemical Micro & Nanosystem Technology (EMNT2014)2014/11/06

Detail

Venue:Okinawa

高純度シリカ生成に向けた溶液処理による軽元素除去プロセスの検討

石原貴史, 中嶋一輝, 松尾伸史, 福中康博, 本間敬之

第4回CSJ化学フェスタ20142014/10/16

Detail

Venue:東京

In Situ Surface Enhanced Raman Spectroscopy Analysis of the Electrochemical Deposition Processes Using Plasmon Antenna Sensors

T. Homma, T. Yamamoto, M. Nakamura, M. Kunimoto, M. Saito, M. Yanagisawa

2014 ECS & SMEQ Joint International MeetingInvitation Yes2014/10/08

Detail

Venue:Cancun

Reaction Mechanism of Thiourea as Suppressor in Electroless Cu Deposition Process

M. Kunimoto, T. Naito, H. Nakai, T. Homma

2014 ECS & SMEQ Joint International Meeting2014/10/08

Detail

Venue:Cancun

A New Electrodeposition Process of Crystalline Silicon Utilizing Water-Soluble KF–KCl Molten Salt

K. Maeda, K. Yasuda, T. Nohira, R. Hagiwara, T. Homma

2014 ECS & SMEQ Joint International Meeting2014/10/07

Detail

Venue:Cancun

Elimination of Boron from Soluble Silica Via Solvent Extraction with 2,2,4-Trimethyl-1,3-Pentanediol Using a Multistage Flow-Type Reactor

N. Matsuo, T. Ishihara, T. Oyanagi, K. Nakajima , Y. Fukunaka, T. Homma

2014 ECS & SMEQ Joint International Meeting2014/10/07

Detail

Venue:Cancun

The Study of Electrodeposition of Si in Tmhatfsi-SiCl4 analyzed by EQCM Method

Y. Tsuyuki, T. Anh Pham H., J. Komadina, Y. Fukunaka, T. Homma

2014 ECS & SMEQ Joint International Meeting2014/10/07

Detail

Venue:Cancun

Characterization of Electrodeposited Co-Pt Nano-Dot Array at Initial Deposition Stage

S. Wodarz, T. Otani, H. Hagiwara, T. Homma

2014 ECS & SMEQ Joint International Meeting2014/10/07

Detail

Venue:Cancun

Fabrication of FePt and CoPt Magnetic Nanodot Arrays by Electrodeposition Process

T. Homma, S. Wodarz, D. Nishiie, T. Otani

2014 ECS & SMEQ Joint International MeetingInvitation Yes2014/10/06

Detail

Venue:Cancun

銅埋め込み電析における添加剤分布のin situ測定手法の開発

中村雅俊, 柳沢雅広, 本間敬之

2014年電気化学秋季大会2014/09/27

Detail

Venue:札幌

フッ化物-塩化物高温溶融塩を用いたシリコンの電気めっき法

安田幸司, 前田一真, 野平俊之, 萩原理加, 本間敬之

表面技術協会第130回講演大会2014/09/23

Detail

Venue:京都

Bi-Te電析膜の微細構造制御およびマイクロ熱電変換素子への応用

宇田和布, 古山大貴, 齋藤美紀子, 園部義明, 寺崎一郎, 本間敬之

表面技術協会第130回講演大会2014/09/22

Detail

Venue:京都

CoPt電析プロセスにおける錯体の作用の理論的解析

定岡佑典, 國本雅宏, 中井浩巳, 本間敬之

表面技術協会第130回講演大会2014/09/22

Detail

Venue:京都

Coupling Phenomena between Micromorphological Evolution and Ionic Mass Transfer Rate during Ag Electrodeposition in AgNO3 Aqueous Solution

Y. Fukunaka, T. Wakatsuki, T. Homma

65th International Society of Electrochemistry (ISE)2014/09/03

Detail

Venue:Lausanne

High Purity Silicon Materials Prepared Through Wet-chemical and Electrochemical Approaches

T. Homma, Y. Fukunaka, T. Nohira

65th International Society of Electrochemistry (ISE)Invitation Yes2014/09/02

Detail

Venue:Lausanne

Redox Reaction Current on Multi-microdisc Electrode

Y. Yamamoto , K. Fushimi, T. Nakanishi, Y. Hasegawa, M. Saito, T. Homma

65th International Society of Electrochemistry (ISE)2014/09/01

Detail

Venue:Lausanne

電析初期過程の解析に基づく超高記録密度ナノドットアレイの形成および高保磁力化

萩原弘規, ヴォダルツジギー, 大谷智博, 西家大貴, G. Zangari, 本間敬之

磁気記録・情報ストレージ研究会2014/07/17

Detail

Venue:東京

Chemical Analysis of Ultra-thin DLC Films and Lubricant/DLC Interface using Plasmonic Sensors

M. Yanagisawa, M. Kunimoto, T. Homma

ASME 2014 Conference on Information Storage and Processing Systems (ISPS2014)2014/06/23

Detail

Venue:Santa Clara, CA

DFT Analysis of Catalytic Reaction of H2PO2- as a Reductant for Electroless Deposition Process

M. Kunimoto, H. Nakai, T. Homma

Post-symposium of TOCAT7 (The 7th Tokyo Conference on Advanced Catalytic Science and Technology)Invitation Yes2014/06/07

Detail

Venue:Tokyo

Gravitational Effects on the Initial Stage of Cu Electrodeposition

H. Inari, Y. Konishi, R. Alkire, T. Homma, Y. Fukunaka

225th Meeting of The Electrochemical Society (ECS)2014/05/13

Detail

Venue:Orlando, FL

SiC基板上の高密度・高配向CNTへの電析膜の形成

斎藤美紀子, 藤田隼, 楠美智子, 本間敬之, 川原田洋

電気化学会第81回大会2014/03/29

Detail

Venue:大阪

電析CoPtナノドットアレイの初期析出制御と磁気特性解析

大谷智博, ヴォダルツジギー, 萩原弘規, 本間敬之

電気化学会第81回大会2014/03/29

Detail

Venue:大阪

強磁性FePt電析膜の高保磁力化及び高密度ナノドットアレイの形成

西家大貴, 間庭佑太, G. Zangari, 本間敬之

電気化学会第81回大会2014/03/29

Detail

Venue:大阪

流路型デバイスを用いた2,2,4-Trimethyl-1,3-pentanediolによるシリカからの高効率ホウ素除去の検討

小柳高宏, 松井雄希, 松尾伸史, 福中康博, 本間敬之

電気化学会第81回大会2014/03/29

Detail

Venue:大阪

導波モードセンサによる水中鉛イオンの高感度検出

山下幸太, 國本雅宏, 本間敬之, 大木義路, 藤巻真, 粟津浩一

電気化学会第81回大会2014/03/29

Detail

Venue:大阪

Elimination of Boron from Silica with Solvent Extraction Using a Multistage Microchannel Device for High-Purity Source for Solar-Grade Silicon

松尾伸史, 松井雄希, 石原貴史, 福中康博, 本間敬之

NIMS-早稲田 ジョイントシンポジウム2014/03/24

Detail

Venue:東京

無電解Ni-P めっき反応に対するチオ尿素の促進効果の理論的解析

関健司, 國本雅宏, 中井浩巳, 本間敬之

表面技術協会第129回講演大会2014/03/13

Detail

Venue:千葉

無電解Cu めっき反応に対するチオ尿素の添加効果の解析

内藤健博, 國本雅宏, 中井浩巳, 本間敬之

表面技術協会第129回講演大会2014/03/13

Detail

Venue:千葉

多チャンネル微小電極アレイの作製とその電極特性評価

山本悠大, 伏見公志, 中西貴之, 長谷川靖哉, 齋藤美紀子, 本間敬之

表面技術協会第129回講演大会2014/03/13

Detail

Venue:千葉

Electrodeposition Conditions of ZnO Thin Films from Zinc Acetate Bath for Thermo Electronic Devices

A. A. Akhmaddireja, 齋藤美紀子, 福中康博, 本間敬之

表面技術協会第129回講演大会2014/03/13

Detail

Venue:千葉

Elimination of incorporated boron in silica with precipitation control and solvent extraction using a microchannel device for high-purity source of solar-grade silicon

N. Matsuo, Y. Matsui, T. Ishihara, Y. Fukunaka, T. Homma

International Symposium on Integration of Chemistry and Bioscience2014/01/15

Detail

Venue:Tokyo

電解・無電解めっきの基礎〈上級編〉 -反応メカニズムの理論的解析と機能特性・ナノ構造制御

本間敬之

2013年冬季セミナー  表面処理基礎講座〈上級編〉Invitation Yes2013/11/28

Detail

Venue:東京

電気化学的手法による超高記録密度強磁性ナノドットアレイの形成及び析出挙動の解析

ヴォダルツジギー, 間庭佑太, 萩原弘規, 大谷智博, 西家大貴, G. Zangari, 本間敬之

磁気記録・情報ストレージ研究会2013/11/15

Detail

Venue:東京

Electrochemical Reduction Behavior of Granular SiO2 in Molten CaCl2

X. Yang, K. Yasuda, T. Nohira, R. Hagiwara, K. Ichitsubo, K. Matsuda, T. Homma

224th Meeting of the Electrochemical Society (ECS)2013/10/31

Detail

Venue:San Francisco, CA

Electrolyte-Electrode Interfacial Study for Si Electrodeposition in Ionic Liquid

J. Komadina, Y. Ishibashi, Y. Tsuyuki, Y. Zhang, Y. Fukunaka, P. A. Pianetta, T. Homma

224th Meeting of the Electrochemical Society (ECS)2013/10/31

Detail

Venue:San Francisco, CA

DFT Analysis On Cathodic Reaction of Au Thiosulfate Complex At Au(111) Surface

M. Kunimoto, H. Nakai, T. Homma

224th Meeting of the Electrochemical Society (ECS)2013/10/30

Detail

Venue:San Francisco, CA

Electrochemical Fabrication of Magnetic Nanostructures- Analysis, Control, and Design of Deposition Processes

T. Homma, S. Wodarz, B. Jiang, M. Kunimoto, M. Yanagisawa

224th Meeting of the Electrochemical Society (ECS)Invitation Yes2013/10/29

Detail

Venue:San Francisco, CA

Influence of Incorporated Light Elements On Refining Process for High-Purity Silica Using Microchannel Device

N. Matsuo, Y. Matsui, T. Ishihara, Y. Fukunaka, T. Homma

224th Meeting of the Electrochemical Society (ECS)2013/10/29

Detail

Venue:San Francisco, CA

電解析出法を用いた高保磁力Fe-Pt ナノドットパターンの形成

間庭佑太, 萩原弘規, G. Zangari, 本間敬之

第3回CSJ化学フェスタ 20132013/10/23

Detail

Venue:東京

流路型デバイスを用いたシリカ中からの軽元素除去プロセスの高効率化

松井雄希, 石原貴史, 松尾伸史, 福中康博, 本間敬之

2013年電気化学秋季大会2013/09/28

Detail

Venue:東京

室温イオン液体を用いた電析法によるSiナノ構造体の作製

石橋瑶子, 露木康博, J. Komadina, 福中康博, 本間敬之

2013年電気化学秋季大会2013/09/27

Detail

Venue:東京

顕微ラマン分光法によるスルーホール内部における添加剤の挙動の観察

加藤晃, 柳澤雅広, 本間敬之

表面技術協会第128回講演大会2013/09/25

Detail

Venue:福岡

金電析過程における重金属添加効果の理論的解析

横道拓哉, 國本雅宏, 中井浩巳, 本間敬之

表面技術協会第128回講演大会2013/09/24

Detail

Venue:福岡

電気化学的手法により形成した超高記録密度強磁性ナノドットアレイの初期析出過程の解析及び特性評価

ヴォダルツジギー, 間庭佑太, 萩原弘規, 本間敬之

磁気記録・情報ストレージ研究会2013/07/12

Detail

Venue:東京

Πstructured Bi-Te micro-thermoelectric device fabricated by electrodeposition process

K. Uda, Y. Seki, M. Saito, Y. Sonobe, Y. Hsieh, H. Takahashi, I. Terasaki, T. Homma

The 32nd International Conference on Thermoelectrics2013/07/02

Detail

Venue:Kobe

Electrolyte-Electrode Interface and Si Deposition in Ionic Liquid

J. Komadina, T. Akiyoshi, Y. Ishibashi, Y. Fukunaka, P. Pianetta, T. Homma

223rd Meeting of The Electrochemical Society (ECS)2013/05/15

Detail

Venue:Toronto, Ontario

Electrodeposition process to form patterned Si nanostructures

T. Homma, Y. Fukunaka, Y. Ishibashi, J. Komadina

The 13th Topical Meeting of the International Society of ElectrochemistryInvitation Yes2013/04/09

Detail

Venue:Pretoria

p 型Bi-Te 系薄膜の電析および熱電変換素子の作製

宇田和布, 関佑太, 齋藤美紀子, 園部義明, 謝育秦, 高橋英史, 寺崎一郎, 本間敬之

第60回応用物理学会学術講演会2013/03/29

Detail

Venue:神奈川

イオン液体からのSi電析薄膜の析出過程および形成状態の解析

露木康博, 石橋瑶子, 秋吉貴裕, J. Komadina, 福中康博, 本間敬之

電気化学会第80回大会2013/03/29

Detail

Venue:宮城

マイクロ流路を用いた2-ethyl-hexanediolによるシリカからのホウ素抽出プロセスの検討

石原貴史, 松井雄希, 松尾伸史, 福中康博, 本間敬之

電気化学会第80回大会2013/03/29

Detail

Venue:宮城

ナノドットパターンに対するCoPt電析初期過程の解析

ヴォダルツジギー, 萩原弘規, 高見淳, 本間敬之

電気化学会第80回大会2013/03/29

Detail

Venue:宮城

電析浴組成制御による高保磁力CoPtナノドットアレイ精密形成の検討

萩原弘規, ヴォダルツジギー, 高見淳, 本間敬之

電気化学会第80回大会2013/03/29

Detail

Venue:宮城

高保磁力Fe-Pt電析膜の薄膜化及びナノドットアレイの形成

間庭佑太, 高見淳, G. Zangari, 本間敬之

電気化学会第80回大会2013/03/29

Detail

Venue:宮城

Nanoindentation analysis for mechanical properties of electroless NiP imprinting mold replicated from self-assembled monolayer modified patterns

林政平, 齋藤美紀子, 本間敬之

電気化学会第80回大会2013/03/29

Detail

Venue:宮城

酸性無電解NiPめっき浴におけるチオ尿素の作用機構の理論的解析

関健司, 國本雅宏, 中井浩巳, 本間敬之

表面技術協会第127回講演大会2013/03/18

Detail

Venue:埼玉

Theoretical Analysis of the Solvation Effect on the Adsorption of Hypophosphite Ion on Pd and Cu Surfaces

K. Seki, M. Kunimoto, H. Nakai, T. Homma

The 5th International Workshop on Advanced Electrochemical Power Sources (WAEPS-5)2012/11/17

Detail

Venue:Kumamoto

電気化学的手法による超高密度強磁性ナノドットアレイの形成及び特性評価

高見淳, 間庭佑太, ヴォダルツジギー, 萩原弘規, 本間敬之

磁気記録・情報ストレージ研究会(MR)2012/11/16

Detail

Venue:東京

Fundamental Study of Li Dendrite Growth in Ionic Liquid

T. Nishida, K. Nishikawa, T. Homma, Y. Fukunaka, M. Rosso

PRiME 2012 (222nd Meeting of The Electrochemical Society, 2012 Fall Meeting of The Electrochemical Society of Japan)2012/10/10

Detail

Venue:Honolulu, Hawaii

Silicon Bonding State in Films Electrodeposited from SiCl4 in Ionic Liquid

J. Komadina, T. Akiyoshi, Y. Ishibashi, X. Wang, Y. Fukunaka, P. Pianetta, T. Homma

PRiME 2012 (222nd Meeting of The Electrochemical Society, 2012 Fall Meeting of The Electrochemical Society of Japan)2012/10/10

Detail

Venue:Honolulu, Hawaii

Theoretical Analysis of the Solvent Effect on Hypophosphite Ion Adsorption on Pd and Cu Surfaces

M. Kunimoto, K. Seki, H. Nakai, T. Homma

PRiME 2012 (222nd Meeting of The Electrochemical Society, 2012 Fall Meeting of The Electrochemical Society of Japan)2012/10/09

Detail

Venue:Honolulu, Hawaii

Raman and DFT Study of Reductant Adsorption on Metal Surfaces in Electroless Deposition Process

B. Jiang, M. Kunimoto, M. Yanagisawa, T. Homma

PRiME 2012 (222nd Meeting of The Electrochemical Society, 2012 Fall Meeting of The Electrochemical Society of Japan)2012/10/09

Detail

Venue:Honolulu, Hawaii

Fundamental Study on Reduction Rate for Electrolytic Reduction of SiO2 Powder in Molten CaCl2

T. Toba, K. Yasuda, T. Nohira, R. Hagiwara, K. Ichitsubo, K. Masuda, T. Homma

PRiME 2012 (222nd Meeting of The Electrochemical Society, 2012 Fall Meeting of The Electrochemical Society of Japan)2012/10/08

Detail

Venue:Honolulu, Hawaii

Solvent Extraction Using Microchannel System for High Purification of Silica

N. Matsuo, Y. Matsui, Y. Fukunaka, T. Homma

PRiME 2012 (222nd Meeting of The Electrochemical Society, 2012 Fall Meeting of The Electrochemical Society of Japan)2012/10/08

Detail

Venue:Honolulu, Hawaii

The Effect of the Deposition Conditions on the Electrodeposition of Si Nanopillars in TMHATFSI

Y. Ishibashi, T. Akiyoshi, J. Komadina, Y. Fukunaka, T. Homma

PRiME 2012 (222nd Meeting of The Electrochemical Society, 2012 Fall Meeting of The Electrochemical Society of Japan)2012/10/08

Detail

Venue:Honolulu, Hawaii

マイクロ流路を用いた溶媒抽出法によるシリカ精製プロセスに関する検討

松井雄希, 松尾伸史, 福中康博, 本間敬之

表面技術協会第126回講演大会2012/09/28

Detail

Venue:北海道

金表面におけるチオ硫酸錯体のカソード反応の理論的解析

國本雅宏, 島照人, 中井浩巳, 本間敬之

表面技術協会第126回講演大会2012/09/27

Detail

Venue:北海道

室温イオン液体からのSi電析薄膜形成プロセスの検討

秋吉貴裕, 石橋瑶子, J. Komadina, 福中康博, 本間敬之

表面技術協会第126回講演大会2012/09/27

Detail

Venue:北海道

Electrodeposition of Si nanopatterns from ionic liquid

T. Homma

9th International Symposium on Electrochemical Micro & Nanosystem Technology (EMNT2012)Invitation Yes2012/08/16

Detail

Venue:Linz

Theoretical Analysis of the Effect of Surface Defects on the Reaction of Hypophosphite Ion as a Reducing Agent for Electroless Deposition Process

M. Kunimoto, H. Nakai, T. Homma

9th International Symposium on Electrochemical Micro & Nanosystem Technology (EMNT2012)2012/08/16

Detail

Venue:Linz

電析法によるL10規則化Fe-Pt磁性薄膜の作製及びナノドットパターンの形成

間庭佑太, 高見淳, G. Zangari, 本間敬之

東北大通研-早大ナノ機構 第2回研究会2012/07/13

Detail

Venue:東京

Electrochemical Fabrication of Magnetic Nanodot Arrays - analysis and design of deposition processes

T. Homma, A. Takami, M. Kunimoto

12th International Fischer SymposiumInvitation Yes2012/06/04

Detail

Venue:Lübeck

Optical Observation of Li Dendrite Growth in Ionic Liquid

T. Nishida , K. Nishikawa, T. Homma, Y. Fukunaka

221st Meeting of The Electrochemical Society (ECS)2012/05/08

Detail

Venue:Seattle, WA

Progress in Nanowire Growth and Mechanistic Analysis of Silicon Electrodeposition in Ionic Liquid 

J. Komadina, T. Akiyoshi, Y. Ishibashi, Y. Fukunaka, P. Pianetta, T. Homma

221st Meeting of The Electrochemical Society (ECS)2012/05/07

Detail

Venue:Seattle, WA

溶融CaCl2中での粉末状SiO2の電解還元における還元速度向上の検討

鳥羽哲也, 安田幸司, 野平俊之, 萩原理加, 一坪幸輝, 増田賢太, 本間敬之

電気化学会第79回大会2012/03/31

Detail

Venue:浜松

二種還元剤を用いた無電解析出反応系のSERS法による解析

ヴォダルツジギー, 嶋野直史, 大友彬, 國本雅広, 柳沢雅宏, 本間敬之

電気化学会第79回大会2012/03/29

Detail

Venue:浜松

ラテラル方向への金めっき優先成長に添加剤が与える影響の検討

加藤晃, 小林千秋, 齋藤美紀子, 本間敬之

電気化学会第79回大会2012/03/29

Detail

Venue:浜松

電析法によるL10規則化Fe-Pt磁性薄膜の作製及びナノドットパターン形成

間庭佑太, 小西洋平, Giovanni Zangari, 本間敬之

電気化学会第79回大会2012/03/29

Detail

Venue:浜松

ナノギャップ電極を用いたポリジアセチレン超分子の電気特性解析

天野諭, 松尾伸史, Y. Choi, D.-J. Ahn, 本間敬之

電気化学会第79回大会2012/03/29

Detail

Venue:浜松

金属ナノ粒子電解生成における微細構造制御

齋藤美紀子, 石井智紘, 藤原英道, 本間敬之

電気化学会第79回大会2012/03/29

Detail

Venue:浜松

電解析出法によるBiTe系熱電変換素子形成プロセスの検討

関佑太, 富田元紀, 山本智之, 齋藤美紀子, 園部義明, 高橋英史, 寺崎一郎, 本間敬之

第59回応用物理学関係連合講演会2012/03/16

Detail

Venue:東京

金表面におけるチオ硫酸の錯解離性の理論的解析

島照人, 國本雅宏, 中井浩巳, 本間敬之

表面技術協会第125回講演大会2012/03/14

Detail

Venue:東京

Cu表面におけるヒドラジンの酸化反応に対する次亜リン酸の影響の理論的解析

大友彬, 嶋野直史, 國本雅宏, 中井浩巳, 本間敬之

表面技術協会第125回講演大会2012/03/14

Detail

Venue:東京

無電解析出プロセスにおける次亜リン酸の金属表面吸着に対する溶媒効果の理論的解析

関健司, 國本雅宏, 中井浩巳, 本間敬之

表面技術協会第125回講演大会2012/03/14

Detail

Venue:東京

ウェットプロセスによるナノ・マイクロ構造の形成

本間敬之

4大学ナノ・マイクロファブリケーションコンソーシアム拠点形成シンポジウムInvitation Yes2012/03/08

Detail

Venue:川崎

機能ナノ構造・デバイス形成のためのめっき技術

本間敬之

神奈川科学技術アカデミー教育講座Invitation Yes2012/01/26

Detail

Venue:川崎

ラテラル方向へのめっき成長促進と分子ワイヤの特性評価への応用

小林千秋, 青山裕, 若山裕, 齋藤美紀子, 本間敬之

第1回CSJ化学フェスタ2011/11/15

Detail

Venue:東京

Fabrication of 80 nm-scale imprinting mold by detaching electroless-deposited NiP from SAM modified SiO2 master mold

C.-P. Lin, 齋藤美紀子, 本間敬之

第1回CSJ化学フェスタ2011/11/15

Detail

Venue:東京

Templated electrodeposition of Si nanowires from ionic liquid

T. Homma, J. Komadina, Y. Nakano, T. Akiyoshi, Y. Ishibashi, Y. Nishimura, T. Nishida, Y. Fukunaka

220th Meeting of The Electrochemical Society (ECS)Invitation Yes2011/10/10

Detail

Venue:Boston, MA

無電解析出反応における還元剤水素化ホウ素の反応活性発現のための分子-表面間軌道相互作用の解析

國本雅宏, 中井浩巳, 本間敬之

表面技術協会第124回講演大会2011/09/22

Detail

Venue:愛知

Electrochemical Fabrication of Functional Micro/Nano Structures

T. Homma, J. Komadina, M.Kunimoto, Y. Fukunaka

International Symposium on Renewable Energy & Materials Tailoring (REMT2011) 2011/09/19

Detail

Venue:Kyoto

Observation of reductants on copper surface in electroless deposition process with nano-scale resolution using surface enhanced raman spectroscopy

B.-Jiang, N. Shimano, T. Ouchi, M. Yanagisawa, T. Homma

International Symposium on Renewable Energy & Materials Tailoring (REMT2011) 2011/09/18

Detail

Venue:Kyoto

Theoretical study of additive effects on reactions in electroless deposition processes

M. Kunimoto, H. Nakai, T. Homma

International Symposium on Renewable Energy & Materials Tailoring (REMT2011) 2011/09/18

Detail

Venue:Kyoto

DFT Analysis on Orbital Interaction between Hypophosphite Ion and Metal Surfaces in Electroless Deposition Process

M. Kunimoto, H. Nakai, T. Homma

International Society of Electrochemistry (ISE, 62nd Annual Meeting)2011/09/14

Detail

Venue:Nigata

High Coercivity Magnetic Thin Films Deposited from Simplified Electroless Bath System

T. Homma, T. Ouchi, N. Shimano

International Society of Electrochemistry (ISE, 62nd Annual Meeting)Invitation Yes2011/09/12

Detail

Venue:Nigata

Fabrication and initial deposition analysis of electroless Ni alloy nanoimprinting mold replicated from SAM modified nanopatterns

C.-P. Lin, M. Saito, T. Homma

International Society of Electrochemistry (ISE, 62nd Annual Meeting)2011/09/12

Detail

Venue:Nigata

Fabrication of electrodeposited Co-Pt nano dot arrays and analysis of its initial deposition process

Y. Konishi, A. Takami, T. Ouchi, T. Homma

International Society of Electrochemistry (ISE, 62nd Annual Meeting)2011/09/12

Detail

Venue:Nigata

I-V Characterization of Molecular Architecture Change in Polydiacetylene Supermolecules

N. Matsuo, Y. Choi, C. Kobayashi, C. Cui, D.-J. Ahn, T. Homma

International Society of Electrochemistry (ISE, 62nd Annual Meeting)2011/09/12

Detail

Venue:Nigata

ラテラル方向へのめっき優先成長を用いた分子ワイヤー特性評価法の検討

青山裕, 小林千秋, 若山裕, 齋藤美紀子, 本間敬之

2011年電気化学秋季大会(第52回化学センサ研究発表会)2011/09/10

Detail

Venue:新潟

Theoretical Study on Catalytic Activity of Metal Surfaces on P-H Bond Cleavage of Hypophosphite Ion

M. Kunimoto, H. Nakai, T. Homma

7th Congress of the International Society for Theoretical Physics (ISTCP-VII)2011/09/04

Detail

Venue:Tokyo

Mechanical properties and initial deposition analysis of electroless Ni alloy nanoimprinting mold replicated from SAM modified nanopatterns

C.-P. Lin, M. Saito, T. Homma

(STAC5-AMDI2) Joint Conference of The Fifth International Conference on the Science and Technology for Advanced Ceramics2011/06/22

Detail

Venue:Yokohama

Investigation of Effects on Organic Additives for Laterally-Enhanced Growth of Au Electrodeposition Presenters

C. Kobayashi, S. Yoshida, M. Saito, T. Homma

219th Meeting of The Electrochemical Society (ECS)2011/05/02

Detail

Venue:Montreal, QC

Patent

Reference Number:248

パターン形成体の製造方法(日本)

本間 敬之

2003-098617、2004- 6779、4614631

Reference Number:352

マイクロリアクタの製造方法(日本)

本間 敬之, 庄子 習一, 逢坂 哲彌, 佐藤 裕崇

2004- 15141、2005-207901、4356109

Reference Number:480

ナノ構造体の製造方法(日本)

本間 敬之, 齋藤 美紀子

2005- 69804、2006-249535、4762577

Reference Number:587

金—ニッケル系アモルファス合金めっき皮膜、電気めっき液及び電気めっき方法(日本)

逢坂 哲彌, 沖中 裕, 本間 敬之

2006- 24476、2006-241594、4868123

Reference Number:611

電極、金属微粒子の製造装置および金属微粒子の製造方法(日本)

齋藤 美紀子, 水野 潤, 本間 敬之

2006-160466、2007-327117、5064724

Reference Number:1038

金型製造方法およびその方法により形成された金型(日本, PCT, アメリカ, 中華人民共和国)

本間 敬之, 齋藤 美紀子

2010-064194、2011-194720、5665169

Reference Number:1040

金型製造装置(日本)

本間 敬之, 齋藤 美紀子

2010- 64204、2011-194721

Reference Number:1070

金属微粒子の製造方法(日本)

本間 敬之, 齋藤 美紀子

2010-149456、2012- 12653、5566794

Reference Number:1258

金属微粒子の製造方法、及び製造装置(日本)

本間 敬之, 齋藤 美紀子

2011-278015、2013-129859、6004643

Reference Number:1458

めっき装置及びこれを用いたセンサ装置(日本, スイス, フランス, シンガポ-ル, ヨ-ロッパ, 大韓民国, ドイツ, イギリス, アメリカ, イタリア, PCT, 中華人民共和国)

本間 敬之, 柳沢 雅広, 齋藤 美紀子, 山本 智之

2013-169504、2015- 38232、6226229

Reference Number:1470

光学デバイスおよび分析装置(日本)

本間 敬之, 柳沢 雅広, 齋藤 美紀子

2013-246727、2015-105838

Reference Number:1471

光学デバイスおよび分析装置(日本)

本間 敬之, 柳沢 雅広, 齋藤 美紀子

2013-246726、2015-105837

Reference Number:1854

光学デバイス及びその製造方法(日本)

本間 敬之, 柳沢 雅広, 齋藤 美紀子

2016-208580、2018- 72018

Reference Number:1868

金属シリコン製造用アーク炉(日本)

本間 敬之, 國本 雅宏, 福中 康博

2017- 3946、2018-111637

Reference Number:1915

成膜基板、基板、およびそれらの製造方法(日本)

本間 敬之, 齋藤 美紀子

2017-130671、2019- 14922

Reference Number:1971

ラマン分光測定装置及びラマン分光測定方法(日本)

柳沢 雅広, 本間 敬之, 齋藤 美紀子

2017-170631、2019- 45396

Reference Number:292-JP

光学デバイスおよび分析装置(日本)

本間 敬之, 柳沢 雅広, 齋藤 美紀子

2014-553069、6179905

Research Grants & Projects

Grant-in-aids for Scientific Research Adoption Situation

Research Classification:

Establishment of Electrochemical Device Engineering

2008-2012

Allocation Class:¥570440000

Research Classification:

A study on lubrication technology for future magnetic disks using a lubricant flow in a small gap

Allocation Class:¥4420000

Research Classification:

Development of Biological Sample Separation/Extraction and Preparation Microsystems for High Performance Biosensing

Allocation Class:¥50310000

Research Classification:

Development of Novel electrochemical Nanofabrication Processes through Controlling Non-linear Diffusion

Allocation Class:¥3700000

Research Classification:

Analysis and control of the fluids, interfaces of liquid-liquid and liquid-solid in microchannels

Allocation Class:¥26000000

Research Classification:

Studies on sorting and fixing of. Bioiooiecules for high performance micro chemical/biochemical analysis systems

Allocation Class:¥13100000

Research Classification:

Multi-scale, high resolution operando analysis of material destruction processes using mechano-chemical interactive measurements

2018/-0-2021/-0

Allocation Class:¥6240000

Research Classification:

Development of 3-dimensional-structure sensors with molecular-level resolution and their application to solid/liquid interface analysis on biocells.

2014/-0-2017/-0

Allocation Class:¥3900000

Research Classification:

Development of in-situ Electrochemical Imaging Plate for Interfacial Reaction and Its Application to Estimation of Residual Lifetime of Metallic Materials

2013/-0-2016/-0

Allocation Class:¥18720000

Research Classification:

Electrochemical processing of initial nucleation control for large scale energy storage devices

2013/-0-2016/-0

Allocation Class:¥45890000

Research Classification:

Development of in-situ analysis method for solid-liquid interfaces with ultra-high resolution using plasmon antenna sensors

2011/-0-2014/-0

Allocation Class:¥4030000

Research Classification:

Electrochemical tailoring of semiconductor nanowire arrays and their application to photo-energy devices

Allocation Class:¥18200000

On-campus Research System

Special Research Project

高精度マイクロ化学システム構築のための電気化学ナノファブリケーションプロセス

2006

Research Results Outline:本研究は,電気化学的手法によるナノ加工プロセス,特に位置選択的Si電解エッチングによる微細孔配列形成と金属析出形成を中心に,反応プロセスの詳細な解析を本研究は,電気化学的手法によるナノ加工プロセス,特に位置選択的Si電解エッチングによる微細孔配列形成と金属析出形成を中心に,反応プロセスの詳細な解析を進めながら,それらのナノ容量ガラスセルアレイ形成および機能金属ナノ構造体形成への応用,およびマイク...本研究は,電気化学的手法によるナノ加工プロセス,特に位置選択的Si電解エッチングによる微細孔配列形成と金属析出形成を中心に,反応プロセスの詳細な解析を進めながら,それらのナノ容量ガラスセルアレイ形成および機能金属ナノ構造体形成への応用,およびマイクロリアクターへの応用,などの検討を行い,精密に制御可能な電気化学ナノプロセスの設計指針を確立すると共に,これを応用した各種の新規なシステムの構築へと展開することを目的とした. まず,申請者が開発した, Siウェハに位置選択的に微細孔アレイを形成する光照射援用陽極化成プロセスにおいて,より高い精度での微細孔形成を実現するため,照射光の波長・照度,ウェハ厚・比抵抗,表面開口部の径・形状・間隔などについて系統的検討を行った.その結果,光照射条件の制御により,初期開口径に対し,1/1~1/5程度の範囲で形成される孔のサイズを制御可能であることを見出した.また,このプロセスに表面酸化(ガラス化)と選択的エッチングを組み合わせ,高精度でナノ容量ガラスチューブアレイを形成するプロセスを確立すると共に,形成されたガラスチューブアレイに非線形拡散を利用したエッチングプロセスを適用することにより,個々のチューブの先端にnmの精度で均一な径の貫通孔を形成するプロセスを開発した.さらにこのプロセスを用いて形成されたナノノズルのアレイから微小径の還元性ガス気泡(ナノバブル)を吐出させ,液相中の金属イオンの還元析出反応によるナノ粒子合成のためのリアクターシステムを構築した. 一方,複雑な反応系を伴うこのような電気化学反応系を原子レベルから解析するため,上記のように分子種(還元剤)からの電子供給により金属が反応析出する,無電解めっき反応の素過程レベルからの解析とモデル化を進めた.代表的な還元剤や添加剤種の反応機構および作用機構を実験・理論計算両面から解析し,析出金属表面サイトの触媒活性度や添加剤の影響などを定量化したモデルを構築した.これらの成果を基に,今後,種々の精密なナノ構造体形成プロセスおよびそれを利用したシステム形成への展開を進める足がかりを得た.

高次構造を有する複合ナノ粒子の多段チャネルフロー型マイクロリアクタによる一括合成

2007

Research Results Outline:ナノ粒子はバルクでは発現困難な新規な機能を有する材料として,種々の分野への応用が検討されている.特に,触媒,磁性体,ドラッグデリバリーなどの分野で,よナノ粒子はバルクでは発現困難な新規な機能を有する材料として,種々の分野への応用が検討されている.特に,触媒,磁性体,ドラッグデリバリーなどの分野で,より高い機能の発現が期待されている.ナノ粒子の合成には,現在,組成や物性を広範に調整可能である点から...ナノ粒子はバルクでは発現困難な新規な機能を有する材料として,種々の分野への応用が検討されている.特に,触媒,磁性体,ドラッグデリバリーなどの分野で,より高い機能の発現が期待されている.ナノ粒子の合成には,現在,組成や物性を広範に調整可能である点から,液相中における化学的合成手法が広く検討され,逆ミセルを形成させて反応領域を規制する手法などが用いられている.しかしながら,このような方法では析出プロセスの積極的制御は難しいため,所望のナノ粒子を得るには多くの試行錯誤的な検討を重ねなければならず,これらを精密かつ自在に制御可能な手法が強く求められている.本研究では,電気化学反応系をベースにしたマイクロリアクタ-を用い,液液界面および微小気泡表面の気液界面を反応場に利用した金属の無電解析出反応により,微小反応場を利用した,新たなナノ粒子の合成手法の開発を目的とした. まず,チャネルフロー型のマイクロリアクタに金属イオン溶液と還元剤溶液の安定な液液界面を形成し,これをナノ粒子合成の反応場に利用し,さらにその多段接続により,コアシェル型などの高次構造型ナノ粒子の一括合成を目指して検討を行った結果,Cu,Ptなどの系において高次構造を有するナノ粒子を合成可能であることを確認すると同時に,チャネル長や流速といった因子の制御により,精密な合成制御が可能であることを明らかとした.さらに,電気化学微細加工プロセスにより形成したナノノズルアレイを用い,金属イオン種を含む溶液中に還元性気体(CO等)のナノバブルを吐出することにより,気液界面における還元析出反応による金属ナノ粒子の形成を実現した.これらのプロセスは,金属ナノ粒子の無電解析出反応のみならず,表面被覆による高次構造形成など多様な系に適用可能なものであることから,種々のナノ粒子合成への広範な応用展開が期待される.

プラズモン導波を利用した高効率熱アシスト磁気記録媒体の開発

2009Collaborator:柳沢 雅広, 大内 隆成

Research Results Outline: 本研究は,テラビット/平方インチ級の面記録密度を有する次世代型超高記録密度型ハードディスク媒体への適用が期待されている,熱アシスト磁気記録方式を高効 本研究は,テラビット/平方インチ級の面記録密度を有する次世代型超高記録密度型ハードディスク媒体への適用が期待されている,熱アシスト磁気記録方式を高効率で実現させるため,照射光から発生した表面プラズモンを利用する手法の確立を目標としている.今年度は... 本研究は,テラビット/平方インチ級の面記録密度を有する次世代型超高記録密度型ハードディスク媒体への適用が期待されている,熱アシスト磁気記録方式を高効率で実現させるため,照射光から発生した表面プラズモンを利用する手法の確立を目標としている.今年度は,まず強磁性ナノドットアレイ(ビットパターン)の精密形成実現のための要素技術の確立を目標に研究を進めた. ナノスケールのビットパターンの均一形成には精密なパターン基板の形成技術が求められるが,本研究ではまず基礎検討として電子線リソグラフィー法を適用し,8nm径,25nm周期のテラビット級パターンの形成手法を得るとともに,その径や周期を制御しながらパターン形成するための条件を確立した.さらに,実際の生産の際のスループットの面から,より現実的な基板作製手法として期待されているUV-ナノインプリント(UV-NIL)法に着目し,実媒体に適用されるCoZrNb軟磁性下地層を付与したガラスディスク基板に強磁性ナノドットパターンを形成する手法を検討した.その結果,150 nm径,300 nm周期のパターンを安定に形成するプロセスを得ると共に,パターン内に電析法によりCoPt強磁性体の均一に充填させることに成功した.また,下地軟磁性層の表面にCu層を付与することにより,その上に形成されるCoPtナノドットは5.0 kOe以上の保磁力を示し,また断面透過電子顕微鏡観察から,析出初期よりhcp-c軸が垂直配向した柱状晶が成長していることを確認した.このような微細構造が高保磁力の発現の起源であると考えられる.さらに,このCu層の薄層化を検討した結果,2~5nmの極薄膜でも,成膜条件により配向制御効果を得られることを明らかとした.これらの成果を基に,強磁性ナノドットパターンの安定形成およびプラズモン導波へと研究を展開する予定である.

プラズモン導波を利用した超高記録密度熱アシスト磁気記録媒体の開発

2010Collaborator:柳沢 雅広, 大内 隆成

Research Results Outline:次世代のハードディスク型磁気記録デバイスにはテラビット/平方インチレベルの超高記録密度が求められており,これを実現可能な記録媒体系として,ビットパター次世代のハードディスク型磁気記録デバイスにはテラビット/平方インチレベルの超高記録密度が求められており,これを実現可能な記録媒体系として,ビットパターン媒体(BPM)が注目されている.BPMにおける記録再生の一層の向上を図るため,熱アシスト方式が提...次世代のハードディスク型磁気記録デバイスにはテラビット/平方インチレベルの超高記録密度が求められており,これを実現可能な記録媒体系として,ビットパターン媒体(BPM)が注目されている.BPMにおける記録再生の一層の向上を図るため,熱アシスト方式が提案されているが,本研究はその超高効率化の手法として,加熱用照射光から発生する表面プラズモンを利用する新規な手法の検証のため,ナノドットを均一に形成する要素技術の確立を目的とした.これまで我々は,BPM作製手法としてUV-ナノインプリントリソグラフィおよび電子線リソグラフィを用い,微細孔がアレイ状に規則配列したパターン基板を形成し,これに対しCo-Ptを電析法により充填することでCo-Pt強磁性ナノドットアレイを形成するプロセスを提案してきた.特に,記録再生可能な実媒体の形成を念頭に,CoZrNb軟磁性下地層を成膜したガラスディスク基板を用い,Co-Pt結晶配向制御のためCu中間層を付与することで,高い磁気異方性を示す強磁性ナノドットアレイの形成を実現している.この系を基に,数テラビット/平方インチ級のBPM作製に向けて,Cu中間層膜厚のさらなる低減,およびドットアレイの均一形成化を図った.ナノパターン内でのCo-Ptの電析挙動に着目したプロセス設計を試みた.その結果,パターン底部における反応活性を均一化させるプロセスを新規に開発し,これにより1~2nm厚のCu中間層表面からのCo-Ptの均一な核発生を実現した.またこのプロセスを用いて形成した,150 nm径のCo-Ptナノドットアレイにおいて5.4 kOeと高い垂直方向保磁力が得られた.さらに,電子線リソグラフィーにより8 nm径25 nm周期および6 nm径18 nm周期のパターン形成を実現すると共に,これに対するCo-Pt強磁性体のの均一充填を可能とした.これらの成果を基に,プラズモン導波のための構造形成や記録再生試験を進める予定である.

機械-化学融合計測手法による材料破壊過程のマルチスケール高分解能オペランド解析

2017Collaborator:斎藤美紀子, 柳沢雅広, 國本雅宏

Research Results Outline:本研究は材料破壊過程を高精度に解析可能な手法の確立を念頭に、その要素技術の確立を目的に検討を進めた。従来の検討よりプラズモンセンサを用いた高感度・高分本研究は材料破壊過程を高精度に解析可能な手法の確立を念頭に、その要素技術の確立を目的に検討を進めた。従来の検討よりプラズモンセンサを用いた高感度・高分解能な表面増強ラマン散乱分光系を開発している。その更なる高度化を図るため、アレイ状構造を有するセン...本研究は材料破壊過程を高精度に解析可能な手法の確立を念頭に、その要素技術の確立を目的に検討を進めた。従来の検討よりプラズモンセンサを用いた高感度・高分解能な表面増強ラマン散乱分光系を開発している。その更なる高度化を図るため、アレイ状構造を有するセンサの形成手法を開発した。また高精度ピエゾ素子による変位制御/計測機構との組み合わせにより、負荷印加時の応力・歪みなどの力学的状態と化学的変化、さらに温度変化の計測も同時に可能な手法を開発した。一方、固液界面系における解析も重要な課題であることから、その解析に適したモデル実験系についても検討を進め、界面近傍のpHなど化学状態をパッシブな状態で高分解能in situ解析可能な手法を開発した。

ナノ構造エネルギー変換デバイス構築のための非平衡電気化学プロセシング

2017Collaborator:ヴォダルツ ジギー, 齋藤美紀子, 國本雅宏, 福中康博

Research Results Outline:大面積かつ高い生産性を実現するエネルギー変換デバイスの新しい形成プロセスの確立を念頭に、新規な材料およびプロセス系の開発を試みた。まず新しい水素エネル大面積かつ高い生産性を実現するエネルギー変換デバイスの新しい形成プロセスの確立を念頭に、新規な材料およびプロセス系の開発を試みた。まず新しい水素エネルギーキャリア生成システムのための水電解用電極反応系に着目し、表面微細構造制御による水素気泡挙動の解...大面積かつ高い生産性を実現するエネルギー変換デバイスの新しい形成プロセスの確立を念頭に、新規な材料およびプロセス系の開発を試みた。まず新しい水素エネルギーキャリア生成システムのための水電解用電極反応系に着目し、表面微細構造制御による水素気泡挙動の解析を行った。電極表面にマイクロパターンを形成し表面微細構造の影響を定量的に解析する手法を確立し検討を行った結果、表面微小領域の濡れ性およびパターン形状が水素発生効率に影響することを系統的に明らかにした。また新規な薄膜型太陽電池形成プロセスの確立を念頭に、イオン液体からのSi電析プロセスの最適化を試み、光照射などのプロセスの適用により緻密で平滑な薄膜が得られることを見出した。さらに薄膜電気特性をp型およびn型に制御可能な手法を確立した。

ナノ構造エネルギー変換デバイスのための非平衡電気化学プロセシング

2016Collaborator:齋藤美紀子, 國本雅宏

Research Results Outline:非平衡電気化学プロセスによるナノ構造の形成および反応プロセスの解析手法を構築し、これを基に新規なエネルギー変換デバイスの創製を念頭に研究を進めた。まず非平衡電気化学プロセスによるナノ構造の形成および反応プロセスの解析手法を構築し、これを基に新規なエネルギー変換デバイスの創製を念頭に研究を進めた。まず大規模蓄電池への応用を目的とした亜鉛系電極に着目し、充放電による表面形態変化挙動の詳細な解析を行っ...非平衡電気化学プロセスによるナノ構造の形成および反応プロセスの解析手法を構築し、これを基に新規なエネルギー変換デバイスの創製を念頭に研究を進めた。まず大規模蓄電池への応用を目的とした亜鉛系電極に着目し、充放電による表面形態変化挙動の詳細な解析を行った。その結果、層状成長を阻害するような反応種の生成によりフィラメント状析出が生じることを確認した。またこのような表面析出形態はSnおよびPbの添加により制御可能であることを確認した。また二次電池電極の基幹素材である炭素系材料に関する基礎的な検討として、グラフェンに着目し熱変化挙動の解析を試み、欠陥発生や酸化と熱変化挙動の相関に関する知見を得た。

高機能ナノ結晶薄膜成長過程の原子レベル解析

1995

Research Results Outline: 機能薄膜分野において注目され始めている“ナノ結晶薄膜”系においては,個々のナノ結晶の性状のみならず,その集合状態というメゾスコピック領域の構造が特 機能薄膜分野において注目され始めている“ナノ結晶薄膜”系においては,個々のナノ結晶の性状のみならず,その集合状態というメゾスコピック領域の構造が特性発現を左右することが予想されるが,現状ではこの点はほとんど未解明である。そこで本研究ではナノ結晶... 機能薄膜分野において注目され始めている“ナノ結晶薄膜”系においては,個々のナノ結晶の性状のみならず,その集合状態というメゾスコピック領域の構造が特性発現を左右することが予想されるが,現状ではこの点はほとんど未解明である。そこで本研究ではナノ結晶集合体の形成機構の原子レベルからの詳細な解析により,集合体形成に影響を与える諸因子の解明,更に集合状態と機能持性の相関性を明らかにし,このような新しい観点からの材料設計に関する基礎的指針を得ることを目的とした。 まず機能特性が極めて構造敏感なことが従来の検討により確認されている無電解Co系磁性薄膜を対象に,集合体形成に影響を与える諸因子について系統的に検討した。その結果錯化剤として添加されているNH3濃度により磁気特性が大きく変化することが明らかとなった。その起源について透過電子顕微鏡等により微細構造解析を行った結果,遊離NH3が結晶成長サイトに吸着し微結晶の成長が阻害されるためであることが明らかとなった。また個々のナノ微結晶内に極微相分離状態が生じ,これが磁気特性発現に大きく影響していることが示唆された。 次に,微粒子集合体形成過程を定量的に評価するため,原子間力顕微鏡を用いた解析を行った。析出基板表面の触媒化状態(すなわち微結晶集合体形成のための“核”の状態)を種々変化させた系における成長過程のScaling解析結果から,各条件における微結晶集合体形成モードを定量的に評価する手法を確立した。 更に原子レベルでの集合体形成過程を検討するため計算機シミュレーションを行った。既存のRDSD(RandomDeposition with Surface Diffusion)モデルに触媒活性度をポテンシャル関数として与えたモデルを構築し,シミュレーションを行った結果,実験により観察されたような表面微細形態変化を良く再現することが確認され,ナノ粒子集合体形成を左右する“触媒活性度”というパラメータを定量的に解析する端緒が得られた。

電気化学的手法による新規金属ナノ構造体形成プロセスの開発

2002Collaborator:逢坂 哲彌, Chidsey, Christopher E.D. , Pianetta, Piero A., Chemla, Marius, Bertagna, Valerie

Research Results Outline: マイクロシステムは次世代産業の基幹技術と目されているが,その形成プロセスとして,高速形成性・精密制御性・一括形成性に優れた電気化学的手法は中心的な役 マイクロシステムは次世代産業の基幹技術と目されているが,その形成プロセスとして,高速形成性・精密制御性・一括形成性に優れた電気化学的手法は中心的な役割を果たすと期待されている.しかしながら同手法は析出機構などに未だ不明点が多く,新規プロセスは多大... マイクロシステムは次世代産業の基幹技術と目されているが,その形成プロセスとして,高速形成性・精密制御性・一括形成性に優れた電気化学的手法は中心的な役割を果たすと期待されている.しかしながら同手法は析出機構などに未だ不明点が多く,新規プロセスは多大な労力をかけて試行錯誤的に開発されており,析出機構の解明・体系化と,それに基づくプロセス設計指針の確立が切望されている.そこで本研究では,電気化学系,すなわち固液界面における金属析出・ナノ構造形成反応の素過程およびこれに影響する種々の因子の解明および得られた知見の総合的考察から,ナノ構造形成反応の体系化およびプロセス設計指針を確立し,これを基にした新規ナノ構造体形成プロセスの実現を目的とした.種々の系の中でも特にデバイス形成の基本であるシリコン表面に対する金属析出系を中心に検討を進めた. まず,シリコンウェハ表面と金属イオン種の反応に関するこれまでのスタンフォード大学との共同研究の結果から得られている,表面微小欠陥サイトにおいて金属イオン種の還元析出反応が優先的に進行するという知見を基に,任意形状のナノ欠陥をパターン形成することにより,極めて単純な系からCu,Ag,Au,Coなどの金属ナノ構造体を形成可能とするプロセスを開発した.これは,各種の微細導電回路,ナノ磁石アレイなどの形成に適用できるものである. 一方,このようなナノ構造形成反応,あるいはその反応活性を検討するには,表面への金属析出反応および析出した金属量の定量解析が不可欠である.しかしながらその量は極めて微小であることから,通常の解析手法の適用は困難である.そこで,スタンフォード軌道放射光研究所の全反射型蛍光X線解析(SR-TXRF)を用いて検討を行った.その結果,反応機構および析出金属種の性質に対する溶存酸素の影響を明らかにすることが出来た.さらに同研究所のX線吸収端近傍微細構造解析(SR-XANES)から,析出した金属ナノ構造体の酸化過程を定量的に解析することが出来た. さらに,パリ大およびオルレアン大との共同研究研究により,複数の金属イオン種が共存する系からのナノ構造形成について検討を行った,その結果,特にFeの析出に対しCuが触媒的に作用することを明らかにした. 以上の結果から,シリコンウェハ表面への電気化学的手法による新規金属ナノ構造形成プロセスを確立すると共に,その析出反応機構についても明らかにした.なおこれらの内容については引き続き共同研究を進めると共に,米国国立科学財団(NSF)シリコンウェハ工学産学協同研究センターのプロジェクト研究の一部へと展開している.

Lecture Course

Course TitleSchoolYearTerm
Inorganic Chemistry ASchool of Advanced Science and Engineering2019spring semester
Inorganic Chemistry A [S Grade]School of Advanced Science and Engineering2019spring semester
Applied Chemistry : Exercises ASchool of Advanced Science and Engineering2019spring semester
Applied Chemistry : Exercises A [S Grade]School of Advanced Science and Engineering2019spring semester
Inorganic and Analytical Chemistry Laboratory ISchool of Advanced Science and Engineering2019fall semester
Inorganic and Analytical Chemistry Laboratory I [S Grade]School of Advanced Science and Engineering2019fall semester
Physical Chemistry BSchool of Advanced Science and Engineering2019fall semester
Physical Chemistry B [S Grade]School of Advanced Science and Engineering2019fall semester
Applied Chemistry: Exercises DSchool of Advanced Science and Engineering2019fall semester
Applied Chemistry: Exercises D [S Grade]School of Advanced Science and Engineering2019fall semester
Applied Chemistry Laboratory ISchool of Advanced Science and Engineering2019fall semester
Applied Chemistry Laboratory I [S Grade]School of Advanced Science and Engineering2019fall semester
Applied Chemistry: GeneralSchool of Advanced Science and Engineering2019spring semester
Applied Chemistry: General [S Grade]School of Advanced Science and Engineering2019spring semester
Physical Chemistry LaboratorySchool of Advanced Science and Engineering2019spring semester
Physical Chemistry Laboratory [S Grade]School of Advanced Science and Engineering2019spring semester
Applied Chemistry:Course ExercisesSchool of Advanced Science and Engineering2019fall semester
Applied Chemistry:Course Exercises [S Grade]School of Advanced Science and Engineering2019fall semester
Industrial Chemistry Laboratory ISchool of Advanced Science and Engineering2019fall semester
Industrial Chemistry Laboratory I [S Grade]School of Advanced Science and Engineering2019fall semester
Diploma Work (Graduation Thesis)School of Advanced Science and Engineering2019full year
Diploma Work (Graduation Thesis) [S Grade]School of Advanced Science and Engineering2019full year
Industrial Chemistry Laboratory IISchool of Advanced Science and Engineering2019spring semester
Industrial Chemistry Laboratory II [S Grade]School of Advanced Science and Engineering2019spring semester
ElectrochemistrySchool of Advanced Science and Engineering2019spring semester
ElectrochemistrySchool of Advanced Science and Engineering2019spring semester
Advanced Physical Chemistry BSchool of Advanced Science and Engineering2019spring semester
Graduation Thesis ASchool of Advanced Science and Engineering2019fall semester
Graduation Thesis BSchool of Advanced Science and Engineering2019spring semester
Power Resource Optimization IGraduate School of Fundamental Science and Engineering2019an intensive course(spring)
Power Resource Optimization IGraduate School of Creative Science and Engineering2019an intensive course(spring)
Power Resource Optimization IGraduate School of Advanced Science and Engineering2019an intensive course(spring)
Seminar on Power and Energy MaterialsGraduate School of Fundamental Science and Engineering2019an intensive course(spring and fall)
Seminar on Power and Energy MaterialsGraduate School of Creative Science and Engineering2019an intensive course(spring and fall)
Seminar on Power and Energy MaterialsGraduate School of Advanced Science and Engineering2019an intensive course(spring and fall)
Practical Seminar on Technological Excellence I (Energy material)Graduate School of Fundamental Science and Engineering2019an intensive course(spring)
Practical Seminar on Technological Excellence I (Energy material)Graduate School of Creative Science and Engineering2019an intensive course(spring)
Practical Seminar on Technological Excellence I (Energy material)Graduate School of Advanced Science and Engineering2019an intensive course(spring)
Resource Optimization IIGraduate School of Fundamental Science and Engineering2019an intensive course(spring)
Resource Optimization IIGraduate School of Creative Science and Engineering2019an intensive course(spring)
Resource Optimization IIGraduate School of Advanced Science and Engineering2019an intensive course(spring)
Practical Seminar on Technological Excellence II (Energy material)Graduate School of Fundamental Science and Engineering2019an intensive course(spring)
Practical Seminar on Technological Excellence II (Energy material)Graduate School of Creative Science and Engineering2019an intensive course(spring)
Practical Seminar on Technological Excellence II (Energy material)Graduate School of Advanced Science and Engineering2019an intensive course(spring)
Master's Thesis (Department of Applied Chemistry)Graduate School of Advanced Science and Engineering2019full year
Master's Thesis (Department of Nanoscience and Nanoengineering)Graduate School of Advanced Science and Engineering2019full year
Research on Interface ElectrochemistryGraduate School of Advanced Science and Engineering2019full year
Research on Interface ElectrochemistryGraduate School of Advanced Science and Engineering2019full year
Advanced Physical Chemistry BGraduate School of Advanced Science and Engineering2019spring semester
Advanced Physical Chemistry BGraduate School of Advanced Science and Engineering2019spring semester
Advanced Physical Chemistry BGraduate School of Advanced Science and Engineering2019spring semester
Advanced Physical Chemistry BGraduate School of Advanced Science and Engineering2019spring semester
Nanomaterial AnalysisGraduate School of Advanced Science and Engineering2019fall semester
Inorganic Instrumental AnalysisGraduate School of Advanced Science and Engineering2019fall semester
Nanochemical SystemsGraduate School of Advanced Science and Engineering2019fall quarter
Advanced Nanochemical SystemsGraduate School of Advanced Science and Engineering2019fall quarter
Applied Electrochemistry AGraduate School of Advanced Science and Engineering2019fall quarter
Seminar on Laboratory Course for Applied ChemistryGraduate School of Advanced Science and Engineering2019full year
Seminar on Special Topics and Experimental ResultsGraduate School of Advanced Science and Engineering2019full year
Research Ethics in Applied ChemistryGraduate School of Advanced Science and Engineering2019an intensive course(spring)
Research Ethics in Applied ChemistryGraduate School of Advanced Science and Engineering2019an intensive course(spring)
Seminar on Physical Electrochemistry AGraduate School of Advanced Science and Engineering2019spring semester
Physical Electrochemistry A: SeminarGraduate School of Advanced Science and Engineering2019spring semester
Seminar on Physical Electrochemistry BGraduate School of Advanced Science and Engineering2019fall semester
Physical Electrochemistry B: SeminarGraduate School of Advanced Science and Engineering2019fall semester
Research on Surface Chemistry of Nanostructured MaterialsGraduate School of Advanced Science and Engineering2019full year
Research on Surface Chemistry of Nanostructured MaterialsGraduate School of Advanced Science and Engineering2019full year
Experiments in Nanoscience and NanoengineeringGraduate School of Advanced Science and Engineering2019full year
Experiments in Nanoscience and NanoengineeringGraduate School of Advanced Science and Engineering2019full year
Seminar on Nanofunctional Surface Chemistry AGraduate School of Advanced Science and Engineering2019spring semester
Seminar on Nanofunctional Surface Chemistry AGraduate School of Advanced Science and Engineering2019spring semester
Seminar on Nanofunctional Surface Chemistry BGraduate School of Advanced Science and Engineering2019fall semester
Seminar on Nanofunctional Surface Chemistry BGraduate School of Advanced Science and Engineering2019fall semester
Seminar on Nanofunctional Surface Chemistry CGraduate School of Advanced Science and Engineering2019spring semester
Seminar on Nanofunctional Surface Chemistry CGraduate School of Advanced Science and Engineering2019spring semester
Seminar on Nanofunctional Surface Chemistry DGraduate School of Advanced Science and Engineering2019fall semester
Seminar on Nanofunctional Surface Chemistry DGraduate School of Advanced Science and Engineering2019fall semester
Master's Thesis (Department of Applied Chemistry)Graduate School of Advanced Science and Engineering2019full year
Master's Thesis (Department of Nanoscience and Nanoengineering)Graduate School of Advanced Science and Engineering2019full year
Research on Interface ElectrochemistryGraduate School of Advanced Science and Engineering2019full year
Practical Chemical Wisdom: Seminar AGraduate School of Advanced Science and Engineering2019full year
Practical Chemical Wisdom: Seminar BGraduate School of Advanced Science and Engineering2019full year
Research on Surface Chemistry of Nanostructured MaterialsGraduate School of Advanced Science and Engineering2019full year
Research on Nano-Magnetic MaterialsGraduate School of Advanced Science and Engineering2019full year
Research on Applied Chemistry A HOMMA, TakayukiGraduate School of Advanced Science and Engineering2019full year
Research InternshipGraduate School of Advanced Science and Engineering2019full year
Academic Research Practice and Industrial Internship AGraduate School of Advanced Science and Engineering2019full year
Academic Research Practice and Industrial Internship BGraduate School of Advanced Science and Engineering2019full year

Created Textbook And Teaching Material And Reference Book

Modern Electroplating 4th Edition (John Wiley & Sons, INC.)

2000